Table of Contents
Solid State Technology
Year 2007 Issue 6
| DEPARTMENTS
Editorial Leaving a legacy
When former US Vice President Al Gore testified on climate change before US House and Senate committees this spring, he called on the US to take the lead in reducing the greenhouse gases responsible for global warming.
World News BUSINESS TRENDS
Technology News.html Technology news
New Products Product News
Industry Forum Merging mask design and manufacturing to drive cycle-time improvement
Semiconductor industry observers who think the drive for lower manufacturing costs and cycle time is a recent phenomenon would do well to acquaint themselves with the history of the data handoff between design and manufacturing.
|
FEATURES
Advanced Process Control Implementing a strategy for effective fab data management
IC manufacturing is performed with hundreds of sequential steps, each of which could experience problems leading to yield loss.
Cover Article Improving wafer yields with integrated all-surface inspection
Although backside defects have historically received much less attention than frontside defects, semiconductor manufacturers now realize that backside defectivity can contribute significantly to yield loss.
Lithography A double-line/double-patterning process to extend immersion beyond 45nm
Since the fall of 2003 when immersion lithography produced its first images and began appearing on roadmaps, the technology has made rapid progress towards maturity.
Using Strain Engineering Using strain engineering to improve NVM retention time
Conventional CMOS logic device scaling beyond the 90nm node requires local strain engineering to increase electron and hole mobilities and enhance transistor performance [1-4].
Mems Silicon and WLP enable commercial-grade MEMS resonators
In today’s consumer electronics world, where integrated circuits provide the majority of system functionality, vibrating mechanical devices in the form of quartz crystals are still used as clock sources in most applications.
|