Table of Contents
Solid State Technology
Year 2004 Issue 6
| DEPARTMENTS
Editorial DFM needs new collaborative mindset
In recent years, companies in the semiconductor industry have been collaborating much more than in the past.
World News World News
Tech News Technology News
Nanotechnology Nanoengineered electronic materials get real with directed self-assembly
Three decades of technological progress have provided exponential gains in IC performance over time and led to feature sizes in the tens of nanometers.
Interconnect Solutions-based approach to developing next-generation CVD precursors
Providers of new low-k technologies have typically attempted to develop a complete integrated solution on their own by using proprietary technology and hoping for universal adoption in the market.
Tap System-in-package update
Nearly every product and component roadmap in the electronics industry is driven by miniaturization.
Perspectives 300mm: Friend or foe?
Solid State Technology asked industry experts to weigh in on what the rise of 300mm manufacturing means to the industry.
Products Product News
|
FEATURES
Cover Article Using laser ellipsometry and DUV reflectometry for SiON arc materials; Metrology Series: Part I
Laser ellipsometry (LE) and DUV reflectometry (DUVR) are now being used to monitor etch processes and reduce nonuniformities that had affected yield.
Etch Advanced etch applications using tool-level data
Semiconductor-manufacturing process control has historically relied on the dual approach of fixed statistical process-control (SPC) limits and limited metrology sampling.
Mems Advanced techniques for 3D devices in wafer-bonding processes
Wafer bonding is one of the most powerful processing techniques used in the fabrication and packaging of MEMS devices, which usually have three-dimensional architectures.
Photoresists Taking the wet-developable route to applying BARC in implant layers
Traditionally, bottom antireflective coatings (BARC) have mainly been used in critical layers for gates and contacts, but the application of BARC in implant layers also has become more desirable as device feature sizes shrink.
Contamination Control Concern grows over AMC in lithography bays
There is increasing awareness about the growing sensitivity of 193nm optics to acidic, basic, and condensable organic species in lithography bay environments.
Chemical Handling Optimized dispense recipes and 20nm filtration for reducing resist defects
Point-of-use chemical filtration for 193nm photoresists and bottom antireflective coating (BARC) formulations has become a crucial issue as semiconductor manufacturers struggle with defect densities in next-generation processes.
Vacuum Technology The changing art of measuring vacuum pressure
Semiconductor manufacturing applications require measurement of a wide range of pressures to ensure proper vacuum conditions.
Fab Management Minifab operations for SoC production
A growing trend in broadband-networked digital consumer electronics has led to a paradigm shift in semiconductor manufacturing toward more rapid ramp-up, shorter cycle time, and high mix and low-volume "minifab" operations involving SoC production.
|