Corporate executives load up on stock options, especially in high-tech companies, hoping that future sales of their companies' products — or the company itself — will make them super rich.
In the past year, a great deal of hope has been placed on immersion lithography technology to extend 193nm optical wavelength step-and-scan systems beyond 65nm processes for IC manufacturing.
Alternative dielectric materials that would replace silicon dioxide for applications such as gate-dielectric transistor and integrated passive metal-insulator-metal (MIM) capacitors have to pass the stringent and complex requirements of each application.
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