Issue



Table of Contents

Solid State Technology

Year 2002
Issue 6

DEPARTMENTS

Editorial


It's really not so hard being green...

It's widely believed that protecting the environment is a costly exercise for industry, requiring expensive add-ons such as scrubbers and retreatment plants.


World News


Worldwide Highlights

Articles from around the world.


Tech News


128 test tubes on Infineon biochip

Corporate Research at Infineon Technologies, Munich, Germany, has demonstrated the combination of electronic circuitry for test analyses with biochemical test sites on a single silicon chip — a so-called biochip.


Mrs Report


MRS spring fling: Organics, nanowires, CMP

Beginning a presentation at MRS' Spring Conference with a photo of rat bone tissue may seem a bit unorthodox, but Paul Calvert, professor of materials science and engineering at the University of Arizona, did have a point.


Show Report


SPIE Report, Part 2: Progress in chromeless phase litho, NGLs, 157nm reported at Microlith Symposium

Challenges presented by low-k1 lithography were explored at the recent Microlithography Symposium in a session chaired by Tony Yen of Sematech.


Asiafocus


Will Japan's semiconductor industry recover?*

Engineers at Japan's big chipmakers — including Hitachi, NEC, and Toshiba — are worried their companies might not make it through another year.


Market Watch


Foundry forecast: Bottoms up to a 2002 recovery!

Total foundry wafer demand declined by 39% in 2001. That's a far cry from the 40% growth foundry players experienced in 2000, but Semico Research Corp. is still bullish on their continued growth.


Industry Insights


Complex masks: A problem or a solution?

The challenges of maskmaking have broadened in scope and deepened in complexity in the last decade as the industry forges ahead with the mantra "faster, denser, cheaper."


New Products


New Products


FEATURES

Cover Article


For DRAM and logic: CVD low-k dielectric integration

Issues associated with the integration of CVD low-k dielectrics for 100nm technology node applications are described, including key film properties and factors determining successful integration into advanced DRAM and logic interconnect schemes.


Lithography


Manufacturing at k1 = 0.2 with chromeless phase lithography

Reticle structures comprising properly spaced pairs of chromeless phase edges with 100% transmission regions between can project very fine circuit images using high-numerical-aperture exposure tools equipped with off-axis illumination.


Lithography


Higher NA, complex RET are stretching optical lithography to the limit

Forecasting which technology will be used to accomplish feature shrinks is a challenge that has humbled many of the best minds in our industry.


Deposition


Shallow and abrupt junction formation: Paradigm shift at 65-70nm

The low-temperature (550-750°C) solid phase epitaxial method of forming shallow junctions is an attractive activation technique for the 65-70nm node and beyond.


Wafer Level Test


Reducing costs with wafer-level test and burn-in

Integrated device manufacturers continually seek ways to lower costs in every segment of the manufacturing cycle.


Vacuum Technology


Emerging process requirements demand point-of-use dry pumps

Advanced-design point-of-use dry pumps are cleaner, quieter, and more efficient than traditional dry pumps.


Metrology


Applying a methodology for microtensile analysis of thin films

A microtensile method, used to evaluate material properties of thin films, features test specimens designed and produced using common wafer-processing steps.


Packaging Assembly


Some fundamentals of wafer-level packaging

Wafer-level packaging is gaining popularity because it reduces the size of a package to that of the IC itself, and it lowers package costs by allowing the fabrication of the package in a batch process.