Table of Contents
Solid State Technology
Year 2003 Issue 9
| DEPARTMENTS
Editorial Let's keep a wary eye on China
In recent times, the semiconductor process tool industry has viewed China as the one shining light in a very gloomy market. Limitations on advanced tools for China appear to be rapidly being relaxed or ignored while new foundries and fabs there gear up to compete in the world semiconductor market.
World News World News
Tech News Technology News
Feol Optimizing processing equipment using virtual prototyping
The model begins with a geometric representation of the equipment to be analyzed.
Interconnect Advanced devices using low-temperature NiSi formation
Low-temperature (<500°C) formation of electrodes with low contact resistance is one of the key technical challenges in fabricating advanced devices with small features — particularly for conventional lamp-based RTP systems.
Tap Signs of progress with packaging Cu low-k chips
The industry-wide struggles to integrate copper low-k processes with the rest of the semiconductor manufacturing flow have been thoroughly documented [1].
Semicon West Attendees C Semicon West: Attendees choose
For the first time, attendees at the Semicon West exhibition and conference in July got to choose the best products in three different categories as Solid State Technology (SST) debuted the first annual Attendees' Choice Awards at the show.
Product News Product News
Perspectives Factory integration
Solid State Technology asked industry automation professionals to discuss what is needed to resolve equipment-to-factory integration issues.
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FEATURES
E Manufacturing Breakthrough factory productivity using e-Manufacturing
To meet the needs of customers and manufacturing partners, IC makers must get new products to market quicker, support shorter customer cancellation windows, and meet the complexities of multicompany joint ventures.
E Diagnostics Success using e-Diagnostics at LSI Logic
LSI Logic and INFICON have worked together to develop and integrate e-Diagnostics capabilities over six-to-nine months at the LSI Logic facility in Gresham, OR.
Cover Article Yield enhancement from wafer backside inspection
Backside defects have been largely ignored for several reasons, including the lack of suitable equipment and methods for backside inspection and the lack of awareness about the impact of backside defects on semiconductor manufacturing, particularly on yield [1–4]; yield improvement was never directly correlated to backside defect reduction in any of these references.
Metrology Exploring the link between nanotechnology and metrology
The future of microelectronics and nanotechnology are intimately tied together. The smallest feature sizes on today's ICs are already falling below 50nm.
Wafer Level Test Challenges in advanced wafer test probing
As Moore's Law continues to shrink device features, the rapidly increasing volume of transistors/chip creates a constant rise in the pin count/chip.
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