Issue

Cleanroom devices are mostly thought of as modular laminar-flow systems, also called benches.

The Institute of Environmental Sciences and Technology (IEST) has published an updated recommended practice (RP): IEST-RP-CC021.

In semiconductor fabrication manufacturing, minimization of particle contamination on semiconductor wafers is getting increasingly important as the integrated circuit (IC) devices on the wafers decrease in size.

The response to my editorial in the June issue, “Immediate action required for CSPs,” touched off much more of a response than I expected, but certainly not more than the issue deserves.

I just wanted to give you some feedback regarding your editorial on CSPs. It seems as though you have not done much research regarding the subject.

Smaller than today’s 65-nanometer state-of-the-art manufacturing, the 45 nm semiconductor processing node looms just a few years ahead.

The Institute of Environmental Sciences and Technology (IEST) recently announced that the International Organization for Standardization (ISO) has published ISO 14644-8, Cleanrooms and associated controlled environments - Part 8: Classification of airborne molecular contamination.

GW Plastics (Bethel, Vt.; www.GWPlastcs.com), a high-precision injection molding provider, recently hosted Mexico President Vincente Fox.

According to a recent announcement by Andrew C. von Eschenbach, acting commissioner of the Food and Drug Administration, the FDA will establish a new nanotechnology task force to examine the agency’s regulatory approaches with regard to nanomaterials used in FDA-regulated products.

News snippets from the world of contamination control

DuPont Personal Protection recently introduced its new line of apparel for controlled environments.

It’s been 10 years since Factory Mutual, or FM Global as they are now known, substantially revised and reissued their loss prevention guideline for semiconductor manufacturing fabrication facilities.

As both the quality and quantity requirements for contaminant-free water increase, the demands for innovative technologies and improved system designs are creating challenges and opportunities for the multitude of industries that require ultrapure water.

Ionizers, remote sensors, monitoring, and material choices all contribute to control

Each month, CleanRooms brings you a collection of the latest product innovations in the contamination-control industry.

From pumps to complete central vac systems, vacuum technology is an important element in cleanroom or clean-processing applications. This month’s spotlight features the latest vacuum accessories, tools and systems for your contamination-sensitive operations.