02/20/2003  The first generation of tools for molding tiny devices with nanoimprint lithography is on its way to market. NIL encompasses a variety of methods for stamping ultrasmall patterns and structures onto a surface. It could also serve as a low-cost alternative to the photolithography processes currently used to carve out MEMS devices, microfluidic systems and computer chips.

02/12/2003  FEB. 12--HENDERSON, Nevada--Emergency Filtration Products Inc. has received preliminary results from the testing of its nanotechnology-enhanced 2H Technology filtration system that will be integrated into an environmental isolation mask.

02/11/2003  FEB. 11--MARLBORO, Mass.--Shipley Company, LLC., has opened its Advanced Technology Center (ATC), a facility dedicated to the development of lithography, interconnect, low-k dielectric and other critical materials needed to produce new generations of microelectronic devices.

02/05/2003  Feb. 5, 2003 - Marlborough, MA - Shipley Company LLC, has opened its Advanced Technology Center (ATC), a facility dedicated to the development of lithography, interconnect, low-k dielectric and other critical materials.

01/29/2003  JAN. 29--WOODBURY, N.Y.--Veeco Instruments Inc. has signed a joint agreement with International SEMATECH (ISMT) to utilize Veeco's NEXUS Low Defect Density (LDD) Ion Beam Deposition (IBD) System for the development of certain advanced manufacturing technologies required to fabricate next generation extreme ultraviolet (EUV) photomask technology.

01/29/2003  JAN. 29--ALBANY, N.Y.--The University at Albany (UAlbany) and International SEMATECH (ISMT), the global consortium of semiconductor manufacturers, have completed negotiations on a joint five-year program to accelerate the development of next generation lithography.

01/28/2003  Jan. 28, 2003 - Leuven, Belgium - IMEC's board of directors has announced the construction of a new 300mm cleanroom.

01/28/2003  Jan. 28, 2003 - Austin, TX, and Albany, NY - The U. at Albany (UAlbany) and International SEMATECH (ISMT), a global consortium of semiconductor manufacturers, have completed negotiations on a joint five-year program to accelerate the development of next generation lithography.

01/28/2003  JAN. 28--LEUVEN, Belgium--IMEC's board of directors says the company will move ahead with the construction of a new 300 mm cleanroom.

01/21/2003 

01/20/2003  Jan. 20, 2003 - Tokyo, Japan - Seiko Instruments Inc. will join the LEEPL Technology Consortium, formed by a group of companies from Japan and overseas to develop technology for a next-generation stepper that uses an electron beam as the light source for lithography.

01/13/2003  A small Wisconsin company is gearing up to become a big supplier of microscopic components for nanotech research and design. Its CEO estimates the market at $74 million per year, with an additional $35-million-per-year market in semiconductor chip lithography. Newer markets in nanotechnology for life sciences and defense hold additional promise.

Positive versus negative resist

01/10/2003  T.A. Brunner, C. Fonseca, IBM SRDC, Hopewell Junction, NY

Simulations imply that narrow resist lines print best with a positive tone resist process while narrow trench geometries are best with a negative tone process, even if the resist performance parameters are unequal. Simple development bias models appear to capture... MORE

01/08/2003  Centrex Inc. and Emergency Filtration Products Inc. have teamed up to make and sell a complete biological detection system.

01/07/2003  Jan. 7, 2003 - Syracuse, NY and Zurich, Switzerland - INFICON Holding AG, a manufacturer of vacuum instrumentation and process control software, has acquired the privately held company, New Vision Systems, a provider of APC and lithography analysis for semiconductor manufacturing.

12/18/2002  Dec. 18, 2002 - Austin, TX - More than 100 of the world's top lithography experts attending an International SEMATECH (ISMT) workshop to review the state of immersion lithography technology urged the consortium to help coordinate and accelerate a feasibility study on the technology.

12/18/2002  Dec. 18, 2002 - Veldhoven, Netherlands - Chip equipment maker ASML has announced that it will cut 1,450 jobs and sell or close loss-making US businesses, as it strives to reach break-even in the chip industry's worst-ever slump.

12/17/2002  Dec. 17, 2002 - San Jose, CA - Numerical Technologies Inc., the provider of subwavelength lithography-enabling technology to the semiconductor industry, today announced that Samsung Electronics Co. Ltd. has signed an agreement to license Numerical's phase-shifting technology for the production of its newest and most advanced SRAM product.

12/17/2002  Dec. 17, 2002 - Veldhoven, Netherlands - Lithography equipment supplier ASML Holding NV will shortly unveil details of a large restructuring program, according to a person close to the company.

12/13/2002  DEC. 13--HENDERSON, NEV.--Emergency Filtration Products Inc. (EFP) has received favorable preliminary results from the testing of its nanotechnology-enhanced 2H Technology filtration system, which will be incorporated into an Environmental Isolation Mask.