06/27/2000  SAN DIEGO, Calif.--June 22, 2000--Cymer has received additional funding from International SEMATECH to develop of production-worthy lasers for lithography applications.

06/22/2000  JUPITER, FL--June 20, 2000--Photronics and ASML are developing reticles for 0.10-?m imaging technologies.

06/20/2000  Veldhoven, Netherlands--June 20, 2000--TSMC has just received an ASM Lithography 300-mm platform. This is ASM's first order received for this new technology.

06/16/2000  WILMINGTON, Del.--June 16, 2000--HD MicroSystems has introduced a photodefinable polyimide developed for single mask, stress buffer passivation applications on DRAMs, SRAMs, logic devices, and microprocessors.

06/13/2000  SAN DIEGO, CA--June 12, 2000--Cymer announced last week the shipment of its first ELX-6500F₂ laser to Ultratech Stepper.

05/31/2000  MUNICH, Germany--May 30, 2000--International SEMATECH, Carl Zeiss, and the EUV LLC announced a program to demonstrate advanced optics for extreme ultraviolet lithography.

05/11/2000  WILTON, CONN--May 11, 2000--Semiconductor manufacturers can now use one platform as they convert to 300 mm with a product designed to evolve lithography from 248 nm to 193 nm to 157 nm. Silicon Valley Group's Micrascan supports a variety of optical trains accommodating the adjustment in technology without requiring changes in tools or in the fab itself, says a company official.

05/01/2000  Capitalizing on advanced intellectual property (IP) delivery and rapid silicon prototyping tools (two of the major dividends that resulted from its recent acquisition of VLSI Technology), Philips Semiconductors has launched a design methodology that will allow the vast pool of IP to be used quickly and effectively.

04/26/2000  Intel has announced a Fall volume production of its Advanced+ Boot Block flash chip, the company's first flash memory product on 0.18-?m lithography.

04/24/2000  Ultratech Stepper has closed its UltraBeam Lithography business.

04/19/2000  Texas Instruments reaped the rewards of the Internet-backed bandwidth push last quarter with revenues of $2.653 billion. The technology giant cited digital signal processor (DSP) deals with Cisco and Sony that pushed revenues up 27 percent from 1999's first quarter and up 4 percent sequentially.

03/15/2000  Photronics sees its international ties strengthen with its acquisition of Taiwan's Precision Semiconductor Mask Corp.

03/13/2000  Silterra's purchase of $150 million in equipment for its new foundry will support the startup's plan to increase production to 30,000 8-inch wafers per month by 2002, officials say. One purchase already made by the company is Asyst Technology Inc.'s SMIF-LPT product line. Silterra has also contracted with ASM Lithography (ASML) as its lithography supplier.

02/17/2000  Hoping to catch the e-business wave crashing over the chip industry, business-to-business network provider AvantCom Network wants to link semiconductor fabs with their tool suppliers, with the goal of allowing equipment firms to retrieve real-time tool status and parametric data from their installed tool base.

02/11/2000  In an effort to enhance its lithography module control offerings, KLA-Tencor plans to acquire FINLE Technologies, a 10-year old developer of lithography simulation and data analysis software.

02/10/2000  In yet another boost to capital spending, Japan chipmaker Hitachi said it will invest 150 billion yen (about US$1.4 billion) in the semiconductor field in fiscal year 2000.

11/02/1999  Advantest, Hitachi, and Japanese R&D consortia are developing cell-projection e-beam lithography, whereas US manufacturers are emphasizing EUV and SCALPEL, both of which require potentially expensive masks.

11/01/1999  Syringe Body Handling Device...Fume Hood Control System...Mobile Ion Contamination Cure...Cleanroom Ceiling Bracket and Fastener...Cleanroom Mask...Disk Storage Device...Garment Fabric

11/01/1999  While a wafer backside and back edge can be hermetically sealed and protected from copper contamination during electroplating, the front-side exclusion zone and beveled edge are still vulnerable because clamping during electroplating is not a totally effective mask.

08/05/1999  With the bulk of lithography equipment users searching for effective methods to push the resolution limits of their steppers, a test reticle that implements patented phase-shift technology is making it possible to rapidly and accurately analyze focus-related anomalies, characterize system and lens performance, and extend system capabilities to enhance overall tool performance.