Metrology

METROLOGY ARTICLES



APC is evolving: Etch to CMP to litho

11/28/2001  What can the semiconductor industry learn from the petrochemical folks? A lot, when it comes to the evolution of advanced process control (APC). In the early days of APC in the petrochem industry, process and instrumentation technologies were considered totally unrelated issues by operating companies.

Analog Devices uses Applied Materials' epi systems to build silicon and SiGe bipolar chips

11/15/2001  November 15, 2001 - Santa Clara, CA - Applied Materials, a provider of epitaxial (epi) deposition technology to the semiconductor industry, has installed its Epi Centura systems at Analog Devices' fabs in MA, and CA, where they are being used for next-generation bipolar device production using silicon (Si) and silicon germanium (SiGe) technologies.

Rudolph Technologies and Therma-Wave reach settlement

09/28/2001  September 28, 2001 - Flanders, NJ - Rudolph Technologies and Therma-Wave, Inc., today announced that they have reached a settlement in their Patent Interference proceeding.

New Japanese government research project to make its own tools

08/30/2001  Japan's latest government-funded industry research initiative for 50nm generation technology plans to start by designing and developing its own new semiconductor production tools. Japanese press reports said Intel researchers would also participate, but Intel sources could not confirm this before press time.

Photronics breaks ground to expand Connecticut facility

08/09/2001  August 9, 2001 - Brookfield, CT - Photronics Inc. is breaking ground for a 13,000-square-foot addition to its existing 40,000-square-foot manufacturing operation in Brookfield, Connecticut.

Nanometrics opens its doors in Korea

05/31/2001  May 31, 2001 - Milpitas, CA - Nanometrics Korea, a subsidiary of Nanometrics Inc., supplier of advanced integrated and standalone metrology equipment, announced the opening of its new support and manufacturing facility in Pyungtaek City, Korea.

KLA-Tencor to buy Phase Metrics

04/13/2001  April 13, 2001 - San Jose, CA - KLA-Tencor Corp. has signed an agreement to purchase Phase Metrics, a top supplier of inspection/certification technologies to the data storage industry.

Thomas West increases capacity, expands manufacturing space

03/14/2001  March 14, 2001--Sunnyvale, California--Thomas West Inc. (TWI) today announced a major capital expansion and upgrade of its applications lab and manufacturing facilities as part of an ongoing investment to provide its customers with the most advanced CMP materials and technology for semiconductor manufacturing. The increased capacity and expansion is in direct response to increased customer demand for the company's advanced CMP pads.

KLA-Tencor unveils 'Precice'

03/07/2001  March 7, 2001--San Jose, California--KLA-Tencor Corp. has introduced Precice, a production-worthy in-situ film thickness and end-point control system for copper CMP.

Boin GmbH releases software development kit for metrology equipment

03/01/2001  March 1, 2001--Tomerdingen, Germany--Boin GmbH, a metrology software manufacturer for the semiconductor industry, has released a new software development kit for metrology equipment manufacturers.

KLA-Tencor makes addition to its suite of optical metrology overlay tools

02/22/2001  February 22, 2001--San Jose, California--KLA-Tencor Corp. today introduced the Archer 10, the latest in its suite of optical metrology overlay tools. Incorporating several significant improvements in automation, throughput, productivity, and precision over previous generation systems, the Archer 10 is one of the industry's most competitive cost-of-ownership overlay solutions for 300mm manufacturing at the sub-0.13-micron node.

Boin, TePla sign OEM agreement

02/13/2001  February 12, 2001--Tomerdingen, Germany--Boin GmbH, a metrology software manufacturer for the semiconductor industry, has entered into an OEM agreement with TePla AG, a manufacturer of metrology tools and low pressure plasma systems. TePla will use Boin's WAFERMAP metrology software on its TWIN SC measurement tool to support the visualization and interpretation of measurement results.

Photronics broadens 130-nm node production capabilities

02/12/2001  FEB. 12 Jupiter, Florida--Photronics, Inc., a leading photomask supplier, announced today that it has signed a multi-system purchase agreement with Toshiba Machine Co., Ltd. for its EBM-3500 vector scanning electron beam photomask lithography system.

Corning buys Tropel

01/23/2001  Corning, New York--Corning Inc. announced today that it has reached an agreement to acquire 100% of the stock of Tropel Corp., a Fairport, NY-based world leader in precision optics and metrology instruments for the semiconductor industry, in a transaction valued at approximately $190 million, based on the closing price of Corning common stock on January 22, 2001.

300mm automation interface compliance looms,Therma-Wave opts for GW package

12/11/2000  With the first production 300mm fabs scheduled for ramp up next year, chipmakers want tools to arrive at the fab site automation-friendly, though full supplier compliance to new 300mm software standards is unclear, say participants of a recent workshop on 300mm software requirements for automated manufacturing in Austin, TX.

Therma-Wave Says Orders Pass Record Levels

09/07/2000  FREMONT, Calif. - Sept. 7, 2000 - Therma-Wave, Inc., a manufacturer of process control metrology systems used in the manufacture of semiconductors, today reported that orders for the first two months of the second quarter of fiscal year 2001 have already exceeded the record $61.9 million mark of the first quarter ended June 30, 2000.

Step 8: Package Inspection

09/01/2000  With the trend toward smaller packages and tighter tolerances, the role of total package inspection is becoming more vital to the assurance of final product quality. At the same time, the drive for cost reduction and flexibility dictates that all inspection requirements be satisfied by a single, integrated, high-throughput inspection platform.

SEMATECH to Evaluate Metrology Tools

08/18/2000  AUSTIN, Texas--Aug. 18, 2000--Research consortium International SEMATECH today announced the launch of a Metrology/Yield Management Tool Initiative to develop and evaluate new measurement technologies for advanced semiconductor manufacturing processes.

Therma-Wave Introduces New Metrology Products

08/02/2000  FREMONT, Calif.--August 1, 2000--Designed to expand its process control metrology systems business, Therma-Wave unveiled new products for use in metrology for metal films, critical dimension metrology, and a line of integrated metrology systems.

Applied to Add Therma-Wave Metrology Systems

07/27/2000  FREMONT, Calif.--July 25, 2000--Therma-Wave Inc. will develop and supply advanced metrology solutions that integrate with Applied Materials' process systems and modules.




WEBCASTS



Environment, Safety & Health

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The semiconductor industry is an acknowledged global leader in promoting environmental sustainability in the design, manufacture, and use of its products, as well as the health and safety of its operations and impacts on workers in semiconductor facilities (fabs). We will examine trends and concerns related to emissions, chemical use, energy consumption and worker safety and health.

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Wafer Processing

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As the industry moves to 10nm and 7nm nodes, advances in wafer processing – etch, deposition, planarization, implant, cleaning, annealing, epitaxy among others – will be required. Manufacturers are looking for new solutions for sustained strain engineering, FinFETs, FDSOI and multi-gate technologies, 3D NAND, and high mobility transistors.

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