07/01/1998  DuPont Photomasks (DPI) has chosen a site for a photomask production facility in Singapore. Expected to be operational in 1999, the facility will produce advanced photomasks for use with I-line and deep ultraviolet (DUV) lithography steppers, enabling production of semiconductor devices with sub-0.35 micron feature sizes. The facility represents DPI`s fourth such facility in the Asia-Pacific region, an area where the company plans to invest $50 million over the next five years. -- SES

07/01/1998  Leuven, Belgium -- IMEC, a large independent research center in the worldwide field of microelectronics, is positioning itself to play a larger role in developing processing tech nologies. IMEC will focus on better integrating single steps in the manufacturing chain to create more simplified overall process technologies for the next generation of chips, optoelectronic components, microsystems, solar cells and sensors.

07/01/1998  The Isoflow technology series gas regulators dispense high-purity gases at high flow rates for multiple applications, including high-flow purging, semiconductor manufacturing, manifold and line regulation and laboratory research. Standard features include four inlet gauge selections, four outlet pressure ranges from 0 to 15 psig through 0 to 200 psig, a chrome-plated, die-cast zinc bonnet, and a captive hand knob with adjustable pressure limit. Available in brass barstock and stainless steel bar

07/01/1998  After successfully completing evaluations in the customer`s fab, FSI International Inc.`s Surface Conditioning Division received an order for $1.9 million for its Aries CryoKinetic and Excalibur Vapor wafer cleaning systems. The customer will be utilizing the systems in a single-etch process for advanced capacitor formation on its semiconductor devices.

07/01/1998  The ACM+ is an air composition monitor that detects multipoint toxic and hazardous gases in the low ppm to sub-ppm range in semiconductor manufacturing facilities. According to the manufacturer, it features a proprietary manifold assembly that can speed response time to 20 seconds per sampling port for 13 gases at a time; FTIR spectropscopy detection to prevent false alarms; and a mechanical backup pump to ensure system reliability.

07/01/1998  The High Flow OLT series ultrafiltration module is made for ultraclean, advanced water systems frequently used throughout the semiconductor manufacturing process. It features hollow fiber membranes with a smooth skin on both the inside and outside of the fibers that helps remove contaminants. The filter module has a 6,000 molecular cut-off rating and provides a clean permeate flux of 70 gpm. An outside-to-inside flow path produces ultraclean water and eliminates stagnant areas on the permeate si

07/01/1998  This 300-mm pod door opener load port is modular and allows all drive and control modules to be replaced in 15 minutes or less without disturbing minienvironments, according to the manufacturer. It can be removed and replaced without realignment or adjustments. Options include wafer mapping, E23 communications and rotating kinematic coupling.

07/01/1998  MEMC Electronic Materials Inc. modeled its 300-mm wafer pilot line in St. Peters, MO, after some of the best cleanrooms in the world -- those run by its own customers.

06/01/1998  Strasbaugh is integrating its symphony-CMP chemical mechanical planarizer with OnTrak Systems` synergy integra CMP wafer cleaning system to allow automated dry-wafer-in, dry-wafer-out CMP processing. Officials say the combined system will provide chip makers with high wafer throughput and a fully characterized CMP process as well as make better use of cleanroom space than the standalone system approach. Terms of a formal OEM agreement hold Strasbaugh responsible for sales and marketing and CMP t

05/01/1998  These acrylic dispensers are used for distributing critical cleanroom items like booties, face masks, gloves and bouffant hats. Also available from the manufacturer are chemical transport carts for cleanrooms and polypropylene acid corrosive chemical storage cabinets.

05/01/1998  According to the manufacturer, this line of products is fabricated for multiple cleanroom uses. It includes wet process stations, fume hoods, bottle wash stations, quartz tube carriers, quartz tube storage cabinets, wafer transport carts, chemical transport carts, storage cabinets and racks, pass-through cabinets, desiccated cabinets, dry boxes, tool carts and custom mini-environments.

05/01/1998  This portable wire stocker basket, vertical computer workstation and vertical wafer storage system is suited for Class 1 cleanroom applications in the semiconductor industry. According to the manufacturer, the workstation is configured to maximize fab space and the wafer storage system features an all-rod structure on each sliding shelf for better airflow.

05/01/1998  Editor`s Note: This is the fifth in a series of articles celebrating the accomplishments of the distinguished members of the CleanRooms Hall of Fame.

05/01/1998  The semiconductor industry`s first factory-wide, back-end auto mation system could have a far-reaching impact on cleanroom manufacturing, according to its developers, PRI Automation, Inc. and Kulicke & Soffa Industries.

05/01/1998  Micronova Manufacturing Inc. recently introduced a decontaminating procedure that the company says drastically reduces the ionic contaminant levels in its vinyl and polyethylene cleanroom tape. Testing, which was validated over several months through the Balazs Analytical Laboratory, resulted in sodium counts on processed vinyl tape as low as 3 parts per billion, and chloride counts as low as 5.6 parts per billion. An unprocessed roll of vinyl tape may have sodium and chloride readings as high a

04/01/1998  Spiraltek rolled filters from Osmonics are designed to reduce chip failure by removing agglomerations from chemical mechanical planarization (CMP) slurry, making polishing slurries more effective. Unlike conventional filters, Spiraltek filters utilize tangential flow and retain gelatinous material to prevent premature plugging. Agglomerations cause destructive scratches and gouges on wafer surfaces, resulting in failed chips. These agglomerations are swept from the filtering surface and held ins

04/01/1998  Micronova Manufacturing Inc. recently introduced a decontaminating procedure that the company says drastically reduces the ionic contaminant levels in its vinyl and polyethylene cleanroom tape. Testing, which was validated over several months through the Balazs Analytical Laboratory, resulted in sodium counts on processed vinyl tape as low as 3 parts per billion, and chloride counts as low as 5.6 parts per billion. An unprocessed roll of vinyl tape may have sodium and chloride readings as high a

03/01/1998  Traditional change room designs do not control contamination but merely dilute the concentration levels in the area.

03/01/1998  When a new high-technology facility is completed ahead of schedule, is under budget and everything works, what`s left to brag about? Plenty, claim company officials from Input/Output, Inc., the owners of a new 110,00-square-foot seismic tool manufacturing center in Stafford, TX. Lepco, Inc., a Houston-based firm providing turnkey construction, engineering, testing and service support for advanced technology facilities, finished the $12 million building in a scant 11 months.

03/01/1998  Two contracts to design and build new cleanroom facilities have been awarded to Lepco Inc. MicroDisplay Corp. is adding 3,500 square feet of cleanroom space from Class 10 through Class 10,000 where it will manufacture miniature information displays for portable consumer electronics devices. It will be humidity controlled at 45 percent RH ± 5 percent, and maintained at 68 degrees Fahrenheit ± 3 degrees. A second facility will be constructed at Millipore Corp. This facility will house 20,0