Issue



Table of Contents

Solid State Technology

Year 2005
Issue 5

DEPARTMENTS

Editorial


The changing concept of ‘adding value’

There are many ways to “add value” to an enterprise. As companies grow, and industries and technologies mature, the focus may shift dramatically.


World News


World News


Tech News


Technology News


Materials


Gaining synergy with strained silicon

Strained silicon is one of the key technology boosters identified by the International Technology Roadmap for Semiconductors (ITRS) as being essential to the continuation of classical scaling.


Nanotechnology


Material challenges for silicon nanoelectronics

IC manufacturing technology entered the era of nanotechnology in 2000, when circuits were produced with a minimum feature size <100nm.


Product News


Product News


Perspectives


Standard Si processes drive economies of scale

Solid State Technology invited executives from the compound semiconductor and MEMS industries to discuss how they are benefiting from economies of scale similar to those in traditional IC manufacturing.


FEATURES

Wafer Cleaning


Single-wafer polymer removal on DRAM structures using inorganic chemicals

A collaborative effort between a memory manufacturer and a semiconductor tool supplier focuses on optimizing inorganic chemicals for polymer removal from DRAM device structures using single-wafer spin processors, instead of hydroxylamine-based stripper in batch wetbenches.


Metrology


Controlling CMP by optically monitoring wafer stresses

The application of a new coherent gradient sensing interferometer that characterizes single- and double-layer copper damascene processing of 200 and 300mm wafers - using low-k dielectric films - is demonstrated.


Vacuum Technology


Chamber matching and on-tool MFC adjustment achieve process repeatability

To ensure process transparency when replacing mass flow controllers (MFC) or when employing new types of MFCs in a particular process, it is often desired to have the flow rate of the replacement unit match the flow rate of the previously installed MFC.


Mems


Plasma sources for high-rate etching of SiC

SiC has become an attractive material for the semiconductor industry for both electronic devices and microelectromechanical systems (MEMS).


Lithography


High-volume manufacturing requirements drive EUV source development

Extreme-ultraviolet (EUV) light source development has regularly been characterized as one of the critical issues facing the viability of EUV lithography.