Issue



Table of Contents

Solid State Technology

Year 2003
Issue 12

DEPARTMENTS

Editorial


Are we forever blowing bubbles?

Recently, I looked for an upscale, Wi Fi-ready notebook computer at a major computer store.


World News


World News


Tech News


Technology news


Feol


Alternating-aperture masks ready for dense patterns

Alternating-aperture phase-shifting masks (alt-PSM) rely on the fact that photoresists are insensitive to the phase of the light exposing them.


Interconnect


The case for nonporous low-k dielectrics

Porous dielectric films made by both spin-on and CVD processes have long been promoted as the solution for the industry's needs for ultralow-k (ULK) performance given the lack of viable alternatives.


People


People


Perspectives


More responsibility for equipment suppliers?

Solid State Technology asked former industry executives to comment on equipment manufacturers operating and servicing tools inside the fab.


FEATURES

Cover Article


Increase device yield with FEOL dry-clean processes

Cleaning at the gate transistor and SAC modules with conventional downstream plasmas and wet cleans has been improved with dual plasma dry-clean processing.


Mems


Meeting deep silicon etch challenges for silicon MEMS devices

Production solutions are established using a cassette-to-cassette system with an enhanced set of processes tailored for volume production, including a signal-processing approach that can provide...


Mems


Defined film thickness leads to more MEMS on SOI

Microelectromechanical systems — also commonly referred to in Europe as microsystem technologies — are currently undergoing what can only be termed a revolution.


Etching


Targeting gate CD using feedforward APC and voltage control

A method of power delivery has been developed that reduces chamber-to-chamber CD variation by controlling the ...


PRODUCTS

Top Products Of 2003.htm


Top Products of 2003