Porous dielectric films made by both spin-on and CVD processes have long been promoted as the solution for the industry's needs for ultralow-k (ULK) performance given the lack of viable alternatives.
Cleaning at the gate transistor and SAC modules with conventional downstream plasmas and wet cleans has been improved with dual plasma dry-clean processing.
Production solutions are established using a cassette-to-cassette system with an enhanced set of processes tailored for volume production, including a signal-processing approach that can provide...
Microelectromechanical systems — also commonly referred to in Europe as microsystem technologies — are currently undergoing what can only be termed a revolution.
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