Table of Contents
Solid State Technology
Year 2003 Issue 4
| DEPARTMENTS
Editorial There's something important going on under the radar
The dot.com bubble gave technology a bad name. Investors all over the world, but particularly in the US, poured money down what turned out to be a huge black hole.
Letters Fab automation solution
Your January editorial, "The rocky road to 300mm automated factories," hit the nail on the head with respect to the struggles that the semiconductor industry faces for its data management, consolidation, analysis, and control needs.
World News World News
January chip sales, tool orders down
Feol Photolithography using a dual-chamber light source
Future photolithography applications demand that light sources generate narrower and more stable spectral bandwidths to pattern finer chip features.
Tech News First direct measurement of brain signals, from live
Researchers at Infineon Technologies in Munich, Germany, in cooperation with the Max Planck Institute of Biochemistry, have directly connected a new biosensor IC to living nerve cells in snail brains.
Interconnect Full via first dual damascene challenges
Copper interconnects combined with low-k dielectrics pose lithography challenges due to material incompatibilities and large aspect-ratio structures.
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FEATURES
Cover Article Better wet bench productivity via a new method of rinse optimization
Rinsing is a ubiquitous step in wet chemistry wafer cleaning. It affects many aspects of wafer processing, including process performance, cycle time, footprint, and water consumption.
Packaging Assembly Current challenges dictated by today's IC packaging trends
Today, most package proliferation can be attributed to technical and cost demands placed on the package by device and system engineers.
Software Optimizing fab performance with MES-database active archiving
Increasingly, it is a challenge to manage the large volumes of data being captured and stored inside a fab's manufacturing execution software (MES) database.
Lithography Mask data preparation using a generic hierarchical engine
Mask data preparation has been identified as a severe bottleneck and data volumes are more than doubling each year as the industry pursues the ITRS roadmap.
Perspectives 200mm vs. 300mm manufacturing
The pursuit of Moore's Law has been the driving force in the semiconductor industry since the law's formulation in 1965.The pursuit of Moore's Law has been the driving force in the semiconductor industry since the law's formulation in 1965.
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