Issue



Table of Contents

Solid State Technology

Year 2003
Issue 4

DEPARTMENTS

Editorial


There's something important going on under the radar

The dot.com bubble gave technology a bad name. Investors all over the world, but particularly in the US, poured money down what turned out to be a huge black hole.


Letters


Fab automation solution

Your January editorial, "The rocky road to 300mm automated factories," hit the nail on the head with respect to the struggles that the semiconductor industry faces for its data management, consolidation, analysis, and control needs.


World News


World News

January chip sales, tool orders down


Feol


Photolithography using a dual-chamber light source

Future photolithography applications demand that light sources generate narrower and more stable spectral bandwidths to pattern finer chip features.


Tech News


First direct measurement of brain signals, from live

Researchers at Infineon Technologies in Munich, Germany, in cooperation with the Max Planck Institute of Biochemistry, have directly connected a new biosensor IC to living nerve cells in snail brains.


Interconnect


Full via first dual damascene challenges

Copper interconnects combined with low-k dielectrics pose lithography challenges due to material incompatibilities and large aspect-ratio structures.


FEATURES

Cover Article


Better wet bench productivity via a new method of rinse optimization

Rinsing is a ubiquitous step in wet chemistry wafer cleaning. It affects many aspects of wafer processing, including process performance, cycle time, footprint, and water consumption.


Packaging Assembly


Current challenges dictated by today's IC packaging trends

Today, most package proliferation can be attributed to technical and cost demands placed on the package by device and system engineers.


Software


Optimizing fab performance with MES-database active archiving

Increasingly, it is a challenge to manage the large volumes of data being captured and stored inside a fab's manufacturing execution software (MES) database.


Lithography


Mask data preparation using a generic hierarchical engine

Mask data preparation has been identified as a severe bottleneck and data volumes are more than doubling each year as the industry pursues the ITRS roadmap.


Perspectives


200mm vs. 300mm manufacturing

The pursuit of Moore's Law has been the driving force in the semiconductor industry since the law's formulation in 1965.The pursuit of Moore's Law has been the driving force in the semiconductor industry since the law's formulation in 1965.


PRODUCTS

Product News.html


Product News

Product News