Table of Contents
Solid State Technology
Year 2000 Issue 3
| DEPARTMENTS
Editorial Fab Trends: Are Europe and Asia leading the way?
Not too long ago, most semiconductor fabricating plants made a family of standard chips or discretes.
World News World News
Worldwide Highlights; USA; Japan; Asia Pacific; and Europe
Tech News Technology News
Lithography's nemesis exposed; Practical in situ FTIR for CVD yields revised TEOS-O3 model; Powerful simulation yields perovskite transistors; Low noise microchannels developed; Sub-0.1-µm filtration for 248nm resists; and Tech Briefs
Literature New Literature
Cleanroom material brochure; CD-ROM metals and materials catalog; Online vacuum components catalog; and Vacuum e-business site
Product News Product News
SEM with 3-D imaging; Coat/develop cluster system; Surface topography measurement; Spray etch processor; and more.
Eurofocus EuroFocus
European boom led by telecom, automotive, smart cards; 1000+ exhibitors expected at Europa; Smart card market zooms
Market Watch Market Watch: European market roundup: Continued growth predicted through 2001
After maintaining relative stability in the face of the 1996-1998 IC industry downturn, the European market grew to $28.2 billion in 1999, a 10% increase over 1998's $25.5 billion in revenue.
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FEATURES
Gas Handling Gas flow & handling: Requirements for next-generation gas-flow components
Working down from anticipated device trends over the next five years to deposition and etch process needs, we can derive a comprehensive list of specification advances needed for mass flow control and other gas components.
Lithography Lithography: The challenges in materials design for 157nm photoresists
Developing 157nm lithography capability in time for production requires the solution to several daunting materials challenges.
Industry Insights System-on-a-chip: What industry needs to do
The integration of system functions and even entire systems onto a single chip is now feasible.
Cmp CMP: Spin-etch planarization for dual damascene interconnect structures
Dielectric erosion is an existing issue for copper damascene chemical mechanical planarization even when hard dielectric materials such as dense SiO2 are used.
Deposition Deposition: Pentacene organic thin-film transistors and ICs
Using the organic semiconductor pentacene as the active material, we have fabricated high-performance organic thin-film transistors and the fastest ICs using organic transistors reported to date.
Advanced Rampd Cmos How Advanced R&D: CMOS: How far can it go?
European research into the limits of CMOS technology, which comes from the demand for low voltage, low power and high performance, stems from strong cooperation between device and materials efforts.
Metrology Test Metrology: EFTEM provides elemental mapping at nanometer resolution
Energy-filtering transmission electron microscopy is becoming an important nanoanalysis technique in materials science. Its main advantage comes from the two-dimensional chemical information or "elemental maps" at nanometer resolution extracted quickly from large sample areas.
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