FEATURES
Implantation
How to verify incident implant angles on medium current implants
Results can depend on the properties of the wafers used, the conditions of the implant, the conditions of the anneal process, and even the measurement technique.
450mm
450mm higher gas flows pose opportunities
The move to 4500mm wafers will likely result in gas flow increased on process vacuum and abatement equipment.
450mm
450mm higher gas flows pose opportunities
The move to 4500mm wafers will likely result in gas flow increased on process vacuum and abatement equipment.
Management
Managing legacy fabs and the role of secondary equipment
The choice between buying new systems from OEMs or fully capable refurbished gear from qualified used equipment vendors is examined.
Economics
Will 2014 be the Next Golden Year?
Some unexpected underdogs spur spending spree.
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