Tag Archives: Clean Rooms

Laminar flow workstations


October 1, 2008

Larger facilities often require just a few “critical clean” areas, making laminar flow workstations an appropriate solution. It’s often more cost-effective to construct a cleanroom at a lower cleanliness class and supplement it with laminar flow workstations than it is to create a higher-class cleanroom. Here is a representative sampling of laminar flow products and services.

Compiled by Carrie Meadows

Trace contaminant testing for workstations and controlled environments

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Controlled environments are critical for sensitive processes and can include particle and molecular filters for added protection when needed. To keep within spec over time, tests of contamination levels are required for both particles and molecular contaminants. Balazs offers comprehensive services for testing both AMC and SMC on surfaces or substrates in laminar flow workstations, hoods, minienvironments, gloveboxes, purge boxes, tracks, steppers, equipment, and other controlled environments. Trace contamination is analyzed to limits specified for the semiconductor industry in the ITRS. Detection limits down to 10 ppt are available for air sampling. Surface detection limits using ion chromatography, GC-MS, ICP-MS, and other methods range from submonolayer to a millionth of a monolayer. Results can be reported in atoms/cm2, ng/cm2, or other appropriate units. Individual ions, metals, dopants, and organics are identified and quantified. Particles can also contaminate substrates in hoods due to process steps and are identified using SEM-EDX down to 0.1

New Products


October 1, 2008

Steamer for oxidation processes

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The RASIRC Steamer 501 is a safe, compact, and economical system that can deliver a steam flow rate of more than 50 slm, which exceeds the flow capacity of other technologies. The new steamer addresses semiconductor, flat-panel, solar, and optical device applications that utilize oxide film production, wafer cleaning, and other oxidation processes. It consists of two components: a steam generator that converts DI water into high-flow, ultra-high purity (UHP) water vapor, and a purifier assembly that purifies clean steam to UHP steam by selective removal of dissolved gases, metals, and particulates. Unlike torches, which generate steam through combustion of hydrogen and oxygen, the steamer does not use hydrogen or oxygen, increasing safety. The need for compressed air or chilled water for cooling the torch is eliminated, which significantly cuts energy costs. Storage tanks for hydrogen and oxygen are no longer needed. Recent tests in a 450-mm furnace on 300-mm wafers show that the RASIRC Steamer produced uniformity equal to or exceeding films grown by a torch.

RASIRC®
San Diego, CA
www.rasirc.com

GMP sterilizers

The new, enhanced Finn-Aqua GMP Bio Pharma sterilizers include the patented SAMX (steam-air mix) cycle, which allows the processing of liquid-filled flexible containers such as IV bags, blister packs, syringes and plastic vials, and circulates the steam-air mix without moving parts that can wear out. Other enhancements include modularized and standardized piping for similar design and easy maintenance regardless of the size and configuration of the system; both single and double-door configurations; quieter two-stage vacuum pump that reduces water consumption; choice of PLC platforms; and a fully jacketed chamber that meets cGMP requirements for uniform temperature distribution. The Finn-Aqua GMP Bio Pharma units are supported by the company’s service force worldwide. A specialized team of field engineers can respond quickly to assist with complex equipment issues.

STERIS
Mentor, OH
www.steris.com

Ductless fume hoods

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The new Purair 5 ductless fume hoods exceed OSHA, ANSI, and all relevant international standards. The ductless design eliminates installation costs and allows the unit to be positioned over a sink or benchtop apparatus. There are three models available with a choice of 24-, 36-, or 48-in. widths. The units operate at low noise levels and, because they recirculate, they do not exhaust expensive conditioned and/or heated air into the atmosphere. A face velocity of 100 FPM ensures containment of fumes and particulates for operator protection. An alarm alerts the operator when the airflow falls to an unacceptable level. The unit can be placed on any bench top, and an optional polypropylene spillage tray can be provided when required. All mechanisms in the head section are on the clean side of the filter, with the switches and electrical components being isolated from any contamination. The main filter can be selected from 14 different types of carbon, which include specialty media for vapors of organics, solvents, acids, mercury, and formaldehyde. HEPA filters for particulate filtration are also available.

Air Science USA
Fort Myers, FL
www.air-science.com

Continous cleanroom analyzer

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The Tiger-i™ line of analyzers provides cleanroom ambient air monitoring for gas-phase airborne molecular contaminants (AMCs) that compromise manufacturing process quality and yield. The analyzer employs patented continuous-wave cavity ring-down spectroscopy (CW-CRDS). The Tiger-i line measures into parts-per-trillion levels of trace hydrofluoride (HF) and hydrochloride (HCl) gases. The built-in reference cell and automated tune function provide 99.9 percent uptime without calibration, consumables, or maintenance. By enabling manufacturers to quickly and reliably correlate events such as tool issues, chemical spills, material outgassing, and loadlock openings, process yields can be optimized. The Tiger-i cleanroom analyzer is currently available in two platforms: the Tiger-i 1000 and the Tiger-i 2000. The Tiger-i 1000 HF and HCl analyzers employ a split architecture that allows users to place sensor modules up to 50 m away from the central analyzer and is based on the LaserTrace™ line of analyzers. The Tiger-i 2000 HF and HCl analyzers provide a compact, integrated architecture for enhanced analysis with a smaller footprint and are based on the HALO™ line of mini-CRDS analyzers.

Tiger Optics, LLC
Warrington, PA
www.tigeroptics.com

Protection for valves, assemblies in harsh environments

Customized valve boxes provide protection for all Asahi/America valves and valve assemblies. The fully enclosed boxes are available in polypropylene, HDPE, PVDF, ECTFE (Halar), PVC, or CPVC. Valves are totally encased in the thermoplastic valve box. Valve actuators can also be mounted inside or outside of the box based on application requirements. The valve boxes can be used with Asahi’s single-wall and double-containment piping. They can be constructed with flanged connections for easy installation into existing installs or custom fitted at the factory. By manufacturing the box with the same material as the piping system, the welded joint can be applied directly to the box with no external hardware, creating a more secure enclosure. Clear covers provide visual leak detection and valve position status. When used with leak detection cable, the box acts as a pull box for ease of wire pulls. The leak detection cable can also be installed in box bottom for leak detection purposes.

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Asahi/America Inc.
Malden, MA
www.asahi-america.com

Dual coverall for extra protection in vulnerable areas

DuPont’s Tyvek® Dual coverall features a front and sleeves made entirely from Tyvek® fabric and a back panel made of DuPont’s advanced composite technology (ACT) fabric. In some industries, limited-use coveralls are worn to protect workers from hazards such as water-based liquid splashes, particles, and general dirt. Traditionally, garments offer the same level of protection overall, but in some cases the risk of exposure may be largely frontal, whereas other areas demand high abrasion resistance and robustness. The Tyvek® material offers excellent barrier protection against fine particles and fibers, repels water-based liquids and vapors, and offers breathability; the ultra-high air and water vapor permeability and tactile touch of the patented ACT fabric provide increased levels of comfort. The ergonomically designed ACT panel stretches from the back of the head down to the back of the ankles, reflecting the position of the body’s sweat points. The garment features externally stitched seams and a zipper and zip flaps made of Tyvek® to give increased protection and durability in areas of high stress (such as knees, elbows, zip area, and crotch); elasticized wrist cuffs, ankle, and facial openings form tight seals to help to reduce the risk of penetration from the outside to the inside of the garment.

DuPont
Geneva, Switzerland
www.dpp-europe.com

Total exhaust BSC

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The Thermo Scientific 1300 Series B2 total exhaust biological safety cabinet (BSC) uses advanced DC motor technology, increasing user safety as well as protecting samples from contaminants. The BSC exceeds the highest quality and safety standard recommendations from NSF/ANSI 49 for use of volatile toxic chemical and radionuclides in cell culture applications and meets the current recommendations of the NIOSH Alert for Hazardous Drug Preparation. Available in 4- and 6-ft-wide models, the BSC utilizes HEPA filters to maintain a clean air inflow and downflow across the entire sample area. Hard-ducted to the external environment, the 1300 Series B2 prevents recirculation of any air or gas into the sample chamber. Automatic adjustment of the air downflow during HEPA filter loading improves product safety and increases filter life. The 1300 Series B2 cabinet provides a timed UV light option, which not only reduces the risk of contamination but also prevents frequent bulb replacement and reduces maintenance costs. Cleaning is simplified by the single-piece stainless-steel work tray, which minimizes loss of pipette tips or spills into the drain pan.

Thermo Fisher Scientific Inc.
Milford, MA
www.thermo.com

Liquid-handling QA system

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ARTEL’s Pipette Quality Management System is intended to help labs easily transition to a robust, in-house pipette calibration process for greater control over data quality. As part of the Pipette Quality Management System, ARTEL will install and validate the ARTEL PCS® pipette calibration system to seamlessly and rapidly integrate it into existing laboratory operations. The company will also train laboratory staff on using the PCS and its pipette quality-management software to ensure optimal execution of liquid-handling QA programs. The PCS is a rapid, user-friendly instrument that automatically measures and documents the accuracy and precision of volumes dispensed from single-channel pipettes. It can be used on the bench and calibrates pipettes in minutes.

ARTEL
Westbrook, ME
www.artel-usa.com

Automation system for semiconductor facilities

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Agile Automation is a new approach to automated material handling in semiconductor fabs. It increases fab productivity through modular enhancements to the existing AMHS system, enabling the ability to load and unload several tools in parallel while substantially reducing dependency on OHT vehicles. This results in shorter and more predictable FOUP delivery times and improvements in throughput and tool utilization. New technologies incorporated include the DLT Lifting Loadport™ for OHT-independent tool loading; the Satellite Stocker™; the Velocity™ HTC conveyor; and VAO software, which allows real-time visualization of fab processes and material flow. Fabs can achieve additional savings through reduced floor space requirements, potentially fewer tools, and lower power consumption.

Asyst Technologies, Inc.
Fremont, CA
www.asyst.com

Lightweight, reusable, disposable gloves

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PolyConversions Inc. now offers VR™ gloves as part of its proprietary line of protective apparel. The gloves are odorless and free of vinyl and latex. VR gloves feature an elastic elbow-length cuff impervious to punctures providing cold-crack resistant protection. The gloves are lightweight, reusable, and disposable; the material contains no toxic substances or plasticizers. VR gloves can be safely recycled, land-filled, or incinerated without harming the environment. They have been clinically tested to offer resistance to chemicals such as nitric, sulfuric, hydrochloric, and hydrofluoric acids. Independent tests have demonstrated that the gloves meet Class 100 cleanroom specifications. VR replaces conventional protective wear made of vinyl and other traditional materials intended to safeguard cleanroom and non-cleanroom employees from potential chemical or bio-hazard contamination. The VR line of protective wear also includes aprons, sleeves, gowns, boot covers, shoe covers, rain wear, overalls, and jackets.

PolyConversions, Inc.
Rantoul, IL
www.polycousa.com

Overseal capping machine

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The VRK overseal capping machines are designed for continuous operation. They feature filling volumes ranging from 2 to 500 mL and an output of up to 600 units/min. A combination of laminar flow (LF) design and the gentle capping principle together with an extraction device close to the capping area meet the requirements of the latest EU guidelines of Annex 1 to produce sterile medical products. The separate sealing of substructure and capping unit facilitates isolator integration. The modular machine concept allows for customized configuration of container entry and discharge. An optical stopper recognition unit identifies misplaced or missing stoppers and sorts the containers prior to entering the capping assembly. The feeding wheel ensures precise orientation of containers within the capping unit. To achieve consistent capping, containers are placed in a bracket by applying a preset pressure and continuously rotated. The overseal capping is applied to the rotating containers using spring-loaded rollers. All recorded process parameters are retained and are retrievable for validation purposes.

Bosch Packaging Technology
Waiblingen, Germany
www.boschpackaging.com

By George Miller

To some consumers, it’s becoming a rock-vs.-hard-place choice in food safety: Risk Salmonella and other types of microorganism contamination or choose irradiation as a means to protect against it.

But for food producers, importers, shippers, and regulators, another option involves the use of more sophisticated risk-based techniques to identify problem areas in the food supply chain, monitor them closely, and eliminate the problems at their source. Successful risk-based systems should eliminate the need for lengthy, complicated, and expensive trace-back efforts when contaminated food begins making people sick.

“At the food processor level, we believe in risk-based programs,” says Tom Chestnut, vice president for supply chain, food safety, and quality programs at NSF International (Ann Arbor, MI). NSF is a not-for-profit organization that writes standards for food, water, and consumer goods protection.

“For example, the import system for seafood safety inspections in the U.S. looks at about 2 percent of imports,” he says. “But they use risk-based systems to determine where to look.”

Reactive efforts involve testing at the port of entry or further down the chain, according to Chestnut. However, in the approach developed by NSF and the Global Food Safety Initiative (GFSI), “We’re trying to be proactive, to work with suppliers to ensure safety before the product is shipped.”

GFSI is a retail-led network coordinated by CIES

By Carrie Meadows

In July, ATMI, Inc. (Danbury, CT) announced the launch of four High Productivity Development Centers in the United States and Asia, which the materials, process, and handling company plans to utilize to support customers integrating new semiconductor development and manufacturing processes.

At centers located in Connecticut, California, Taiwan, and Japan, ATMI personnel conduct experiments designed in collaboration with customers that can evaluate up to 192 different test chemistries at once, using fewer wafer materials.

By making it possible to assess large numbers of precisely varied chemical formulations concurrently, the technology generates large amounts of meaningful data in a very short period of time, explains Doug Neugold, CEO of ATMI.

“New materials are being introduced into manufacturing processes at an unprecedented pace

Safe & Sterile


October 1, 2008

Dedicated equipment, minimal operator intervention, and single-use technologies are just a few keys to success in the aseptic processing of biopharmaceuticals.

By Bruce Flickinger

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Although biological products and their potential contaminants are fickle entities, the manufacture of sterile biopharmaceuticals has matured into a well-characterized, industrialized endeavor. Much of the uncertainty is gone, the constraints and opportunities are largely understood, and incidents of compromised products reaching consumers are relatively rare. These facts speak volumes about the technologies, training, processes, and ongoing research involved in bringing aseptically processed drug products to market

Ultra-trace bulk analysis of polysilicon helps meet production demands for high-purity silicon in solar-cell market

By J.D. Robertson, M.D. Glascock, and H. Newcomb, University of Missouri Research Reactor Center

The rapid growth in solar cell production has fueled demand for high-purity silicon. About 90 percent of the current solar cell market is based on solar cells using silicon, and the majority of the raw material for the process is derived from polycrystalline silicon. The demand for polysilicon from the solar industry is growing at up to 40 percent annually and it is anticipated that the use of polysilicon for solar cells will be three to four times that of the semiconductor industry in about 10 years.1 The projected global demands for polysilicon are such that the two largest polysilicon producers have announced plans to increase their production capacities to more than 58,000 metric tons in the next three years, and several other companies, with no prior polysilicon experience, are constructing facilities to enter the market.1

Although the purity requirements of silicon for solar cells (five to seven 9s) are lower than those for semiconductors (nine 9s), the power conversion efficiency of solar cells is largely dependent on impurity levels in the silicon raw materials. Measurement of element concentrations in the polysilicon raw material and the process wafers is therefore essential as new polysilicon production technologies are developed to lower solar-cell production costs and for the maintenance of quality control during the manufacturing of solar cells. The quality control of the polysilicon is especially important as new producers of this high-purity material enter the market. Since it was first applied in 1960 for the analysis of tantalum,2 instrumental neutron activation analysis (INAA) continues to be one of the most sensitive and accurate techniques for meeting industries’ needs for the trace element analysis of high-purity silicon. In keeping with the industry expansion, the demand for INAA of high-purity silicon at the University of Missouri Research Reactor Center (MURR) has more than doubled over the last three years. This article presents a brief overview of INAA of high-purity silicon.

INAA technique

The idea of using neutrons as an analytical probe for elemental analysis was first proposed and demonstrated by Von Hevesy and Levi for the analysis of trace quantities of rare earths in geological materials in 1936. Since then, the sensitivity, selectivity, and precision of INAA have made it a versatile and widely employed elemental analysis techniques. Because most materials are “transparent” to both the probe (neutrons) and the signal (gamma rays), there are few matrix effects associated with the analysis, and standardization of the measurement is simple and straightforward. Moreover, because little, if any, sample manipulation is required, INAA is a highly sensitive technique that can be applied to bulk samples and is relatively free of reagent and laboratory contamination.

In INAA, stable nuclei in the sample undergo neutron-induced nuclear reactions when the sample is exposed to a flux of neutrons. The most common neutron reaction is neutron capture by a stable nucleus (AZ) that produces a radioactive nucleus (A+1Z). The “neutron-rich” radioactive nucleus then decays, with a unique half-life, by the emission of a beta particle. In the vast majority of cases, gamma rays are also emitted in the beta decay process and a high-resolution gamma-ray spectrometer is used to detect these “delayed” gamma rays from the artificially induced radioactivity in the sample for both qualitative and quantitative analysis. A schematic illustration of the neutron capture INAA process is given in Fig. 1.

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The energies of the delayed gamma rays are used to determine which elements are present in the sample, and the number of gamma rays of a specific energy is used to determine the amount of an element in the sample. For example, when a sample that contains iron is irradiated, a fraction of the 58Fe atoms in the sample will capture a thermal (or low energy) neutron and become 59Fe. The 59Fe atoms are radioactive and have a half-life of 44.5 days. When the 59Fe atoms beta decay to 59Co, a 1,099-keV gamma ray is emitted 56 percent of the time. The amount of iron in the original sample can be determined by measuring the number of 1,099-keV gamma rays emitted from the sample in a given time interval after the sample has been exposed to a flux of neutrons. A description of the procedures used to quantify an analyte in INAA is beyond the scope of this article. The physical principles of the analysis are so well understood that neutron activation analysis is one of the primary techniques used by the National Institute of Standards and Technology (NIST) to certify the concentration of elements in standard reference materials.

Although there are few matrix effects in INAA, direct and indirect interferences are possible. A direct interference occurs when the radioactive species or gamma ray of interest is produced by multiple nuclear reactions. For example, measurement of 28Al that is produced by thermal neutron capture on 27Al is frequently used to quantify trace amounts of aluminum in a sample. However, in polysilicon, 28Al is also produced in significant quantities through a high-energy neutron absorption reaction followed by proton emission on 28Si. To quantify aluminum in a high silicon matrix, one must account for the alternate production of 28Al by this reaction. A direct interference can also occur when the same energy gamma ray is emitted by two different isotopes. This spectral interference can be easily accounted for by the difference in half lives between the two isotopes and/or by monitoring multiple gamma rays from each isotope. An indirect interference occurs when the activity generated by a dominant species in the sample impacts the signal-to-noise ratio of the analyte of interest by changing the background in the gamma ray spectrum. A detailed description of how direct and indirect interferences are resolved in the application of INAA to solar-grade silicon can be found in an article by Revel et al.3


Figure 2. Silicon samples for irradiation. Photo courtesy of University of Missouri Research Reactor Center.
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Scientists at MURR have been performing trace element INAA of silicon samples for more than 30 years. A complete description of our analytical protocol can be found in an article by Herrera et al.4 The most common samples are semiconductor silicon, polished wafers, ingot chunks, polysilicon blocks, and polysilicon beads. Samples with masses typically ranging from 10 to 80 g are loaded into individual graphite containers (Fig. 2). These containers are then bundled and placed in a reactor irradiation position where the samples are exposed to a neutron flux for 54 hours. After a decay period of 48 hours, the samples are either cleaned with deionized water in an ultrasonic bath or subjected to a mild or harsh etching procedure. The mild etch is used when a light surface cleaning of the sample is required by the client, and the harsh etch procedure is employed when the client requests that the entire sample surface be removed. After the cleaning/etching procedure, the samples are dried, weighed, placed in plastic containers, and counted on low-background, high-resolution gamma-ray spectrometers. Two counts are performed on each sample. The first 30-minute count is performed immediately after the cleaning/etching and is used to measure radionuclides having half-lives in the range of 12 to 48 hours. The second six-hour count is performed after a minimum decay of 14 days and is used to measure the longer-lived radionuclides. The sensitivities able to be obtained for 40 elements in high-purity silicon using INAA at MURR are given in the table.


Table 1: INAA limits of detection for high-purity silicon
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Advantages and disadvantages of INAA

The major advantage of INAA is that it provides accurate results for large, bulk samples (tens of grams) without having to dissolve or digest the sample. Moreover, by employing an appropriate surface etch procedure, it is possible to ensure that the trace elements observed in the INAA measurement are coming from the bulk material and are not a result of surface contamination at the production facility or in the analytical lab

The inherent cleanliness and properties of stainless steel enhanced by preparation processes make it the material of choice for critical applications

By Ken Sullivan, PB Power

Stainless steel has historically been the material of choice for the pharmaceutical industry due to its unique metallurgical composition, which is inherently hygienic and chemically resistant. The objective of this article will be to review pharmaceutical quality requirements and examine some of stainless steel’s intrinsic properties and the benefits that make this material well suited for pharmaceutical water systems. The focus will be on 304, 316, and 316L AISI stainless-steel pipes as they apply to high-purity (HP) water systems used for critical applications.

Pharmaceutical water is one of the most important of all pharmaceutical utilities and is an essential component in most pharmaceutical processes, used in preparations, products, processing, and cleaning.

There are two basic grades of pharmaceutical water commonly used: purified water (USP) and water for injection (WFI), which is the most purified water. USP water is used in the preparation of non-sterile products and as feed water in the preparation of WFI and pharmaceutical-grade pure steam; it cannot be used for preparations intended for injections. It is also used for rinsing purposes (cleaning of containers) and for preparing cleaning solutions. WFI is used to dissolve or dilute other drugs, which may be delivered intravenously. The primary difference between these grades is the absence of bacterial endotoxin requirements for USP water, degree of system control, and final purification techniques for bacterial removal. Water quality standards for USP water have been established by a number of professional organizations. The standards that the pharmaceutical industry must comply with are the United States Pharmacopeia (USP), the official public standards-setting authority for all prescription and over-the-counter medicines, dietary supplements, and other health-care products manufactured and sold in the United States.

All in the family

In metallurgy, stainless steel is defined as an iron-carbon alloy with a minimum of 10 percent chromium by weight.1 It is the addition of chromium that gives stainless steel excellent resistance to corrosion and good strength at high temperature and pressure. The three main classes of stainless steels, designated in accordance with their metallurgical structure, include martensitic, ferritic, and austenitic; however, all are not suitable for pharmaceutical-grade water systems.

The austenitic family of stainless-steel alloys includes more than 70 percent of the total stainless-steel production. It generally has much greater toughness than the ferritic type, such as the 400 series, which cannot be hardened by heat treatment. While martensitic types are not as corrosion resistant as the other two grades, they are extremely durable as well as highly machinable and can be hardened by heat treatment. Because austenitic stainless-steel pipes are excellent in terms of mechanical strength and abrasion and heat resistance, they are the preferred choice for pharmaceutical water systems.

The 300 series of austenitic stainless steels is an iron-based, low-carbon alloy that is non-magnetic and owes its very high corrosion resistance to its chromium content. Nickel is required to stabilize the austenite, which forms at elevated temperatures so that it can be retained when cooled to room temperature. The basic composition of the 300 series is 18 percent chromium, 8 percent nickel alloy, and 0.10 percent carbon (commonly known as 18/8 stainless). The nickel and chromium content can be increased to improve corrosion resistance; in addition manganese, nitrogen, and molybdenum can also be added to further enhance the corrosion resistance properties. A lower carbon content reduces carbide precipitation during welding.

These steels cannot be hardened by heat treatment although cold work will cause an increase in both hardness and strength. After cold working, the material is annealed to preserve the structural integrity. Also, if any carbon precipitate occurs while slow cooling (sensitization) from a high temperature, they may be reheated and quenched to re-dissolve the carbon and keep it in solution. These steels exhibit excellent structural integrity and thermal stability.

The 300 Series consists of the following types of austenitic chromium-nickel alloys:

  • Type 304 is also known as “surgical stainless steel.” The most common grade is the classic 18/8 stainless steel with excellent strength, formability, fabricability, and ductility. 304 stainless steel is typically used in brewery, dairy, food, and pharmaceutical production equipment applications. 304 costs less than 316 stainless steel.
  • Type 304L is similar to 304 grade but specially modified for welding and fabricability.
  • Type 316 contains molybdenum and a higher nickel content (10 percent) than 304. Molybdenum, in conjunction with chromium, provides superior resistance to attack by most chemicals and an increased resistance to chloride corrosion compared to type 304. The additional nickel content aids in repassivation of the passive layer in case of damage.
  • Type 316L is the most common material used in the pharmaceutical industry. The corrosion resistance of 316L is the same as standard 316. However, low-carbon “L” grade is used to avoid possible sensitization corrosion in welding.

The phenomenon of passivity

Historically, pharmaceutical companies have chosen high-polished stainless-steel for pure water piping systems because of its inherent hygienic properties that render it non-reactive, non-additive, non-absorptive and non-corrosive (see Fig. 1). Their goal is to choose a material that will not release contaminants and thus lower the water purity. The way stainless steel achieves this is the chromium content of the steel combines with oxygen in the atmosphere to form a thin, invisible film of chrome-containing oxide, called the passive layer. The sizes of the chromium atoms and their oxides are similar, so they pack tightly together on the surface of the metal, forming a stable layer only a few atoms thick.


Figure 1. Pharmaceutical companies have typically chosen high-polished stainless-steel for pure water piping systems because of its inherent hygienic properties that render it non-reactive, non-additive, non-absorptive, and non-corrosive. Photo courtesy of Plymouth Tube Co.
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The protective layer is too thin to be visible, meaning the surface appears glossy. If the metal is cut or scratched and the passive film is disrupted, more oxide will quickly form and recover the exposed surface, protecting it from oxidation corrosion. This phenomenon is called passivation by materials scientists and is similar to the oxide layer on aluminum. However, high steam velocities, vibration, and thermal shock all can have adverse effects on the film’s continuity.

Corrosion resistance

Corrosion is a primary concern for HP water systems because its presence contaminates the water quality. That is why stainless steel is used more often in place of other available materials. Because pharmaceutical water is so pure, deionized or “ion hungry,” a concentration gradient is established between the de-mineralized water and the stainless steel with only the passive layer preventing the diffusion or leaching of minerals (free iron) from the pipe into the water. This contamination could be potentially dangerous to the process or the final product. The types of corrosion that can occur include general, concentration cell (crevice), pitting, intergranular, stress, de-alloying, erosion, and microbial-induced corrosion.

Stainless steels perform best under fully aerated or oxidizing conditions, which enhance the passive layer. The lower alloyed grades of stainless steel resist corrosion in atmospheric and pure water environments, while high-alloyed grades can resist corrosion in most acids, alkaline solutions, and chlorine-bearing environments, properties which are utilized in the process industries. Fortunately, the corrosion-resistant properties of stainless steel can be further enhanced to meet the requirements of the pharmaceutical industry by increasing the chromium content and the addition of other elements such as molybdenum, nickel, and nitrogen.

Stainless-steel piping is susceptible to “rouging,” an extremely fine rust that produces a red/brown discoloration on the internal, wetted surfaces of the pipe, which results from the aggressive action of hot (typically above 65°C) pure water on the ferrite content of the stainless steel, breaking it down. This condition is typical for hot/purified/WFI/clean-in-place systems where less dissolved air is carried by the water. For rouging to occur, it may be assumed that either the protective chromium oxide layer has either not been established or that it may have been disrupted. Water systems that operate at ambient temperatures do not typically exhibit any rouge formation in their lifetime.

Hygiene

The easy cleaning ability of stainless steel makes it the first choice for strict hygiene conditions. Keeping the alloy surface clean and free from contamination helps eliminate concentration cells that might cause pitting.

Organisms exist in water systems either as free floating or attached to the walls of the pipe where they can grow in the rough pipe surfaces or crevices. When they attach themselves to the pipe walls they are known as biofilm. The pipe surface finish is often cited as one of the critical factors in the proliferation of bacteria colonies; the smoother the finish is, the more difficult it is for biofilm to attach to the pipe’s internal surface. Hygienic design factors such as maintaining a constant turbulent (3 to 5 ft/s) flow, smooth pipe-joining methods, and minimizing deadlegs and air pockets will all reduce the risk associated with bacterial growth and contamination.

The presence of biofilm on the pipe surface leads to microbially induced corrosion (MIC) and occurs when microbes create colonies and remove pipe material, forming deep pits with small pinhole openings on the interior of the pipe. Microbial contamination can result in the loss of millions of dollars in pharmaceutical products.

Finish

The corrosion resistance of the stainless steel is affected by the roughness of the pipe surface. Roughness average (Ra) indicates the average distance between the microscopic peaks and valleys on the surface of the stainless steel: the lower the value, the smoother the finish.

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There are two surface finish conditions used for these systems: mechanical polishing and electropolishing. Mechanically polished surfaces retain the basic alloy composition with only slight depletion of the other alloy elements, whereas electropolished surfaces contain essentially only chromium and iron.

In a mechanical polishing process, the internal diameter of the tube is polished by a number of progressively finer abrasives passed through the tube via a pneumatic bellows. For the initial pass a coarse grit is used to remove surface imperfections such as weld splatter and slag formations. Finer grits are used for the final passes to enhance the finish.

The surface irregularities of stainless steel can be improved by electropolishing, which is an electrochemical method of polishing stainless steel in which surface iron is removed by anodic dissolution, a chemical reaction that removes surface metal, more simply electroplating in reverse. By removing these peaks and surface contaminates, electropolishing will improve and smooth the surface finish and restore the passive layer.

Electropolishing is required for the pharmaceutical industry because surface smoothness, with fewer sites for trapping impurities, means a purer product without the danger of bacteria growing in surface defects. Oxygen is a critical component in creating the special properties of electropolished surfaces, both to increase the depth of the passive layer and to produce a true passive layer (see Fig. 2).

The rougher the pipe surface, the easier it is for bacteria to adhere to it and resist flushing; a smoother finish allows for easier sanitization. A smooth internal surface finish would be a 20-Ra average and 25-Ra maximum. Similarly, the outside diameter of the pipe is polished to meet cleanroom standards.

Following electropolishing, the tubes are water-rinsed then further passivated in hot nitric acid. This additional passivation is necessary to remove any residual nickel sulfite and to improve the surface ratio of chromium to iron. Following passivation, tubes are rinsed with process water, placed in hot deionized water, dried, and packaged. If cleanroom packaging is required, the tubes are further rinsed in deionized water until a specified conductivity is met then dried with hot nitrogen gas before packaging.

Pipe joints

There are two types of fitting joints commonly used in hygienic piping systems: fusion-welded butt joints and sanitary tri-clamp connections. Prior to the advent of CIP systems, manual cleaning of piping systems and equipment required disassembly of the piping system and reassembly after internal cleaning. Potential issues have arisen associated with gasket extrusion’s effect on drainability and flow turbulence. Hygienic design requires that pipe joints should not trap impurities that might allow microbial growth and contaminate the process, such as threaded joints or even sanitary clamps; therefore, the preferred pipe-joining method is fusion butt-welding.

The 300 series stainless steels have a high degree of weldability; with a higher expansion rate and a lower thermal conductivity than plain carbon steel, the heat is not dissipated as fast from the weld region, which reduces the required welding current. The austenitic stainless steels are susceptible to intergranular corrosion at welding temperatures between 800° and 1,600°F because of carbide precipitation in the grain boundaries. This phenomenon is known as sensitization and occurs from the absence of chromium at a region immediately adjacent to the grain boundaries. Chromium and carbon, originally distributed through the austenitic structure, combine to form chromium carbide. These chromium carbides are not as corrosion resistant as the base austenitic structure. The sensitization can rapidly occur at temperatures of about 1,200°F; at higher temperatures the process is reversed and the precipitate is re-dissolved and kept in solution. The time when precipitation can occur is dependent on the amount of carbon present; low-carbon, 316L-grade stainless steel increases resistance to sensitization and is the material of choice for welded pipe systems.


Figure 3. Orbital welding ensures full penetration welds with no overheating occurring that could undermine the corrosion resistance of the weld zone. Note the pulsed arc finish on the weld surface. Photo courtesy of Pro-Fusion Technologies Inc.
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Pharmaceutical process piping is orbitally/autogenously welded in place, a fusion-welding process using heat without the addition of filler metal to join two pieces of the same metal (see Fig. 3). This welding is fast and avoids the crevices and potential for corrosion common with mechanical couplings where bacteria can grow and contaminate the system.

After welding, the “sensitized” steel should be annealed to re-dissolve the carbide and rapidly cooled through the sensitizing range. The heating causes the carbides to go back into solid solution and the quenching stabilizes the structure. Water quenching is important in order to pass through the sensitization temperature range (1,800° to 8,000°F) as rapidly as possible.

Orbital welding results in an area within which the alloy chemistry is not balanced for optimum corrosion resistance. Passivation is necessary to remove the manganese and to boost the chromium/iron ratio. Unless this is done, there will be an area where accelerated corrosion can occur, and in those environments containing electrolytes galvanic corrosion may also take place.

Cleaning

The final operation after fabrication or heat treatment is cleaning to remove surface contamination and restore corrosion resistance of the exposed surfaces. Degreasing to remove cutting oils, grease, crayon markings, fingerprints, dirt, grime, and other organic residues is the first step. When degreasing, only non-chlorinated solvents should be used in order to avoid leaving residues of chloride ions in crevices and other locations where they can initiate crevice attack, pitting, and/or stress corrosion later on when the system is placed in service. And only deionized water at 1,800°F should be used as a final flushing and sanitizing rinse.

Conclusion

Pharmaceutical piping systems deliver high-purity water to their processes and this requires high-quality materials that ensure a source of water that is free of bacteria, rust, or other contaminants. Stainless steel’s inherent hygienic properties and the ability to enhance these features with electropolishing and passivation have made it the leading material for pharmaceutical water systems. The main advantages of stainless-steel systems are mechanical strength within a wide temperature range and a low coefficient of thermal expansion. This simplifies equipment and piping design and allows for sanitization of the piping system. Potential disadvantages for consideration are the high cost of sanitary stainless-steel components, susceptibility to rouging, and the need for periodic chemical passivation to restore the oxide film that provides stainless steel with its corrosion resistance.


Ken Sullivan is a senior engineer with PB Power (www.pbworld.com), a division of Parsons Brinckerhoff NYC. He has 30 years of industry experience in design and construction of mechanical systems for research and industrial facilities including laboratories, cleanrooms, and pharmaceutical facilities, and has managed capital projects with an international cosmetics manufacturer. He is a graduate of Farmingdale State University and Dowling College, and is currently teaching at the Institute of Design & Construction in Brooklyn, NY.

Reference

  1. Steel Glossary, American Iron and Steel Institute (AISI).

Chemical air filtration combined with on-site analytical evaluation of filtered area and filter solution provides cost reduction by optimizing filter lifetime.

By Jürgen M. Lobert and Joseph R. Wildgoose, Entegris, Inc

Airborne molecular contamination (AMC) control in semiconductor manufacturing process bays has historically been applied to unique problems such as unwanted doping or corrosion control on metal films. With the advent of the 65- and 45-nm technology nodes and their highly energetic ultraviolet (UV) light, the impact of AMC on exposure and metrology tool optics and photomasks has increased with decreasing exposure wavelengths. Increasing beam intensity at each node drives sensitivity to contaminants, causing issues such as yield, reduction, optics degradation, and reticle haze. As a result, AMC control has increasingly become necessary for photolithography cleanrooms, but until recently most of these chemical filtration solutions were targeted to individual tools or tool clusters.

Most new fabs are now being designed and built with provisions for using AMC filters in the ceiling grid, and existing fabs are upgrading to these filters by retrofitting air handlers. Cleanroom operators considering use of chemical HVAC filters can help optimize the chemical and physical performance by working closely with filter vendors to understand and define performance parameters and AMC reduction requirements by monitoring both over time.

One approach for such cooperation is the combination of high-performance AMC analysis to determine the cleanroom’s air chemistry and filter performance with the customization of filter media to optimize filter life, removal efficiency, and pressure drop. Off-the-shelf filtration solutions rarely satisfy AMC requirements and facility operator expectations in state-of-the-art semiconductor cleanrooms. With thousands of filters installed in modern photobays, cost reductions are becoming an integral part of semiconductor manufacturing. In addition, increasing competitive pressures require a comprehensive understanding of cleanroom AMC levels and filter performance.

Cutting-edge technology

Semiconductor processing requires UV light to create the smallest of features on silicon wafers for powerful processors and memory chips used in modern computers and consumer electronics. The latest generation of semiconductor exposure tools employs 193-nm wavelength UV lasers. The energy content of this light can easily split molecules into reactive fragments, which can trigger chemical reactions and adhere to optical surfaces that can cost as much as $5 million, as well as $10,000 per hour in downtime in cleaning or replacement. In addition, corrosion of surfaces by acidic compounds and the buildup of haze through chemical reactions, such as acid-base combinations, have always been problematic, even in older technology nodes.


Figure 1. Typical HVAC chemical filter installation in a ceiling grid. Photo courtesy of Sam Lin/Entegris.
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Traditionally, chemical filtration to remove AMC was applied through specific tool solutions such as filtration cabinets for lithography exposure tools, tool-top filters for coat/develop tracks, and a multitude of point-of-use purifiers for targeted purging of critical cavities and surfaces. With maturing technology nodes, cost reduction becomes crucial in lithography cleanroom operation. Tool operators want to extend the lifetime of costly high-end tool filters; any maintenance they have to perform causes tool downtime, a significant expense in semiconductor manufacturing. The use of HVAC filters for the entire cleanroom (Figs. 1 and 2) can prolong the life of such tool filters, cut down on maintenance, and reduce the risks involved with ambient exposure of sensitive products.

Separating the good from the bad and the ugly

There are numerous chemical air filter products on the market today, many of which claim to be high-performing and suitable for the protection of advanced semiconductor processes. However, not all product performance documentation is based on the same test conditions, making the selection of proper chemical air filters a daunting task for end users or the engineering firms hired to make such decisions. Compounding this dilemma is the lack of an industry standard for filter performance testing that would aid end users in the selection of a system best tailored to meet their needs.


Figure 2. Typical two-layer HVAC chemical filter for comprehensive removal of acids, bases, and organic AMC.
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As a general guideline, the initial step in qualifying a chemical air filter should begin with vendor performance data generated from a full-scale laboratory system, showing low parts-per-billion (one molecule in 1 billion air molecules, 10-9) challenge concentrations of the critical compound(s) of interest, or a representative compound when the actual target compound is toxic or unstable. Testing smaller samples of filter media may be quicker and less expensive but extrapolating the results to full-scale performance is often non-representative for the actual filter. Requiring all vendors to submit full-scale test data expressed in standard units will provide the end user with a method for accurate and concise comparison of products.

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The next step in filter selection should include a list of reference installations from a similar facility with similar processes. Additionally, those references should be accompanied by data collected over time from an actual installation that characterizes the product’s initial removal efficiency at commissioning as well as its long-term performance to demonstrate the useful service life (Fig. 3).

A major trend in filtration for many newer IC fabs is the desire to capture several categories of AMCs in a single, easy-to-use filter. This trend is based in part on the need to lower the cost of initial purchase, simplify installation and maintenance, minimize inventory, and save on electrical operating costs due to the lower pressure drop of a single filter. There are single-filter options available that target and remove acids, bases, and organic compounds, but not all are of equal value. It is important that a product has a balance in performance for all AMC categories so that the maximum lifetime for each is achieved when the filter is exhausted. A filter lasting four months for organics and 12 months for acids and bases will not provide a good return on investment. In this case, the “ink-jet cartridge” effect occurs: eight months of acid and base filtration capacity would be lost due to the need to replace filters for organic protection.

Facility managers should also determine if the chosen filter technology has the flexibility to provide different chemistry formulations that can evolve with the chemistry changes in the cleanroom. The AMC composition in a fab can change over time, as will the sensitivity of the manufacturing processes and tool OEM specifications for ambient cleanliness. Ideally, the filter media formulation is configurable to meet the customer’s future AMC needs with a cost-effective product that fits into the same installation footprint.

Finally, it is vital to gauge filter performance and cleanroom chemistry changes and to optimize filter lifetime. Facility managers and tool owners need reliable, pre- and post-installation AMC data, without which the integrity of the performance results is in question.

One in a trillion

Measurement of AMC in semiconductor cleanrooms has been commonplace for more than 10 years. Determination of ammonia levels that affect wafer surfaces (T-topping) started with 248-nm technology and its increasingly sensitive resists. With the advent of 193-nm UV exposure of wafers, other AMC issues and a larger number of compounds of concern have cropped up. Speciated measurements of acids, bases, and organics became necessary and, in fact, were soon mandated by tool OEMs. AMC classes and measurement requirements were defined by SEMI and implemented into technology roadmaps by the International Technology Roadmap for Semiconductors. They typically consist of acids (A), bases (B), condensable organic compounds (C or O), dopants (D), and metals (M). C-class compounds also contain so-called refractory components (molecules containing Si, P, S, etc.), which can cause severe and irreversible degradation of optical components by changing the refractive index of the optics.

Whereas health issues are typically defined in the parts-per-million concentration range (one molecule in 1 million air molecules, 10-6), AMC was found to affect processes and tools in the parts-per-billion range, 1,000 times less concentrated than typical OSHA requirements. With humans emitting parts-per-million-level ammonia, benign hand lotions being made of silicon-containing compounds, and a suite of process chemicals in use, cleanroom AMC concentrations increase over time if they are not exchanged or filtered.

Modern AMC requirements for cleanroom ambient air has been as low as 0.1 ppb or 100 parts per trillion (molecules in 1 trillion gas molecules, 10-12)–the equivalent of less than one person out of Earth’s entire population! Some purge gas specifications are now as low as 10 ppt for any one AMC class, making it a true challenge for analytical solutions to measure this concentration level. Suddenly, analytical laboratory environments are too dirty, chemically speaking, and most materials touching the sample gas can cause artifacts that are as large as or larger than the AMC to be measured. Human breath, human perspiration, particles from fabrics, the pipette touching the (supposedly clean) counter surface, the quality of chemical supplies, and the leaching of vial materials become obstacles in achieving detection limits that are necessary for confident results.

OEMs require low-level measurements of AMC throughout the wafer process due to the ever-increasing sensitivity of resists and chip features, as well as staggering losses for every hour of process downtime. To meet these requirements, filter performance needs to be verified, AMC levels of compressed gases need to be checked, and cleanroom ambient AMC levels need to conform to minimum standards–standards that are tightened year after year as the number of compounds to be measured expands. Considering these risks, the tool engineers’ desire to measure AMC levels and see the results in real time is understandable.

Whereas online measurement is possible for a few compounds, such as ammonia and perhaps a few volatile and non-reactive organic components, nature has placed constraints on our ability to measure everything in real time, or at a low cost with minimal complexity. Sticky molecules, the surface area of sample tubing, reactions in the sample path, interferences, and low concentrations prevent us from measuring many, if not most, compounds in real time using simple means. Strong acids (SO2, HCl) don’t work that way, nor do organic molecules of the highest interest (i.e., molecular weight). Thus far, we have not come up with a technology that measures it all in real time and with minimal effort. Plus, the most reliable instruments for parts-per-trillion-level analysis still require the most capable operators, yet running multiple gas chromatography-mass spectrometry (GC-MS) systems with 24/7 advanced degree operation is cost prohibitive.

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The current solution to these challenges is to measure the important compounds infrequently through grab sampling to generate a data set (Fig. 4). Adsorbent traps such as Tenax TA, Carbotrap, and Anasorb are commonly used to capture organic AMC, while deionized water impingers/bubblers are used to capture all soluble compounds like acids and bases in cleanroom air or supply gases. These devices draw a large amount of air through them to concentrate the AMC on the traps–the air passes through, very much like an AMC filter–then analyze what has been captured with modern analytical machinery. Detection limits are inversely proportional to the amount of air collected; concentrations of 10 ppt can be achieved by collecting 30