Wafer Processing

WAFER PROCESSING ARTICLES



SUSS Microtec launches high-volume temporary wafer bonder with 1st install

12/05/2011 

SUSS MicroTec launched the XBS300 temporary bonder for high-volume wafer manufacturing. The Bond Cluster is configured to temporarily bond 200mm and 300mm wafers for 3D integration applications as well as other processes that require thin wafer handling.

EVG doubles process module space in XT Frame platform

12/05/2011 

EV Group (EVG), wafer bonding and lithography equipment supplier, introduced the XT Frame equipment platform for better process throughput and tool functionality. The platform will be used for all high-volume manufacturing tool offerings.

Crossing Automation FOUP buffer improves wafer movement and storage

12/05/2011 

Crossing Automation Inc., semiconductor fab automation product provider, introduced the Dynamic Access Recirculating Transport and Storage (DARTS) FOUP buffer to improve wafer movement and storage.

Innolas wins 450mm wafer handling order

12/02/2011 

Innolas Semiconductor GmbH, wafer sorting and laser marking system maker, received its first contract for a 450mm wafer handling system.

ULVAC CVD-Co, -Ni system suits 3D gate, MEMS fab

12/01/2011 

ULVAC Inc. developed the ENTRONTM-EX2 W300 CVD-Ni/CVD-Co system for CVD-Ni and CVD-Co silicidation of 3D semiconductor gates and MEMS. The system is a response to a semiconductor industry transition from PVD to CVD in advanced 3D gate structure film step coverage, ULVAC reports.

Dainippon Screen single-wafer clean tool boasts 800 WPH

12/01/2011 

Dainippon Screen Mfg. Co., Ltd. has developed a scrubber-type SS-3200 single wafer cleaning system with up to 800 wafers per hour capacity and highly stable processing.

GLOBALFOUNDRIES names CFO from ATIC

11/30/2011 

Under new CEO Ajit Monocha's realignment plan, GLOBALFOUNDRIES named new CFO, CTO, and customer engineering and quality leaders. The CTO position is a new one at the semiconductor foundry. The moves are meant to separate technology strategy from technology development.

Nvidia's ConFab keynote will portray "the virtual IDM"

11/29/2011 

Dr. John Chen, VP of technology and foundry operations at Nvidia, and Thomas Jefferson, ISMI's 450mm project manager, are among the updated speaking roster of ConFab 2012, which will address the economics of semiconductor manufacturing and associated industries (LEDs, MEMS, displays).

Applied Materials' Onyx treatment restores lost carbon, strengthens film structure

11/29/2011 

Applied Materials released a new film treatment, Applied Producer Onyx, that reduces the power consumption in semiconductor chips while increasing mechanical strength. The product targets the challenges associated with 3D packaging applications and technologies.

Diamond films no longer in the rough with AKHAN Technologies launch

11/28/2011 

AKHAN Technologies has developed a shallow n-type diamond material over silicon that has characteristics such as a shallow ionization energy, high carrier mobility, and no graphitic phases. Adam Khan, president of AKHAN Technologies, says that the bottleneck in development of diamond films has always been the fabrication of n-type diamond.

SUSS MicroTec partners for health research

11/25/2011 

SUSS MicroTec, a leading supplier of equipment and process solutions for the semiconductor industry and related markets, announces the cooperation with Swansea University´s Centre for NanoHealth (CNH).

ICPT 2011: Familiar CMP themes expand to new apps, interactions

11/22/2011 

Paul Feeney, director of process technology at Axus and ITRS co-leader for planarization topics, reports from the International Conference on Planarization/CMP Technology in Korea. Technical themes continue to address main areas (STI, ULK) but also explore new applications (e.g. TSVs), non-uniformity, and interaction between all the CMP process components.

Plan for 450mm whether an early adopter or not

11/21/2011 

Even if you don't plan on being a 450mm wafer size early adopter, should your planned upgrades handle the layout, utilities, vibration, and cleanroom criteria suitable for a 450mm semiconductor manufacturing environment? Yes, says Terry Behrens, or else be prepared to pay more.

Carl Zeiss combines light and electron microscopy divisions

11/18/2011 

Citing a change in the microscope customer market over the past decade, Carl Zeiss launchEd Carl Zeiss Microscopy. 2,500 employees of MicroImaging und Nano Technology Systems now form the new business group in the Carl Zeiss Group.

Intermolecular (IMI) prices IPO

11/18/2011 

Intermolecular Inc. (Nasdaq:IMI) priced its initial public offering of 9,650,000 shares of common stock at a public offering price of $10.00 per share.

Semiconductor yield improvement with scan diagnosis

11/18/2011 

ICs manufactured at 65nm nodes and smaller introduce new design-specific and feature-sensitive failure mechanisms, with systematic yield issues even more challenging to diagnose and overcome. SMIC and Mentor Graphics cover how to use scan diagnosis for better semiconductor yields.

Toppan Photomasks grows Shanghai site, adds more advanced capabilities

11/17/2011 

Toppan Photomasks will expand its Shanghai manufacturing operation serving China's semiconductor industry. Costing about $20 million, the expansion will increase photomask production significantly, and enable more advanced photomasks made with feature sizes as small as 90nm.

Fairchild Semiconductor's 200mm Mountain Top wafer fab rebounds

11/16/2011 

Reversing its 2009 decision to close the 200mm wafer fab, Fairchild Semiconductor (NYSE:FCS) will keep open its Mountain Top, PA, facility. Moutain Top makes high-voltage and automotive semiconductor products.

Applied Materials' 2011 supplier awards

11/15/2011 

Applied Materials Inc. (Nasdaq:AMAT) presented five companies with awards for helping Applied meet its strategic business goals in 2011.




WEBCASTS



Environment, Safety & Health

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The semiconductor industry is an acknowledged global leader in promoting environmental sustainability in the design, manufacture, and use of its products, as well as the health and safety of its operations and impacts on workers in semiconductor facilities (fabs). We will examine trends and concerns related to emissions, chemical use, energy consumption and worker safety and health.

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Wafer Processing

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As the industry moves to 10nm and 7nm nodes, advances in wafer processing – etch, deposition, planarization, implant, cleaning, annealing, epitaxy among others – will be required. Manufacturers are looking for new solutions for sustained strain engineering, FinFETs, FDSOI and multi-gate technologies, 3D NAND, and high mobility transistors.

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