Wafer Processing

WAFER PROCESSING ARTICLES



Boston Semi Equipment brings fab equipment leasing to Japan

11/11/2011 

Boston Semi Equipment LLC (BSE Group) established Boston Semi K.K. in Tokyo, Japan, for customers of its flexible financing on front-end and back-end semiconductor manufacturing equipment.

Backside-illuminated image sensors: Optimizing manufacturing for a sensitivity payoff

11/11/2011 

Backside-illuminated image sensors require more precise wafer processing -- uniform extreme wafer thinning, dopant control, epitaxy growth, trench manipulation, etc. -- but the payoff in image quality is significant. Researchers at imec experimented with different wafer fab technologies to make a record BSI sensor. They also consider new architectures/packaging techniques for this technology.

Electron beam could assemble nanoscale objects

11/09/2011 

NIST and the University of Virginia have demonstrated that electron microscope beams can be used to move around nanoscale objects, raising the possibility of positioning and assembling nanoelectronics.

TSMC approves capex bump for advanced fab tech

11/09/2011 

TSMC's Board of Directors approved additional capital expenditures for advanced semiconductor manufacturing technologies and more 12" wafer capacity. The company also nailed down its R&D and 2012 capex budgets.

Wireless chip maker adds Plasma-Therm etch/depo tool

11/09/2011 

Plasma-Therm LLC sold a multi-chamber VERSALINE etch and deposition system to a leading North American wireless compound semiconductor manufacturer.

WLP start-up combines SunPower solar silicon fab with Cypress semiconductor interconnect

11/09/2011 

Deca Technologies, a new company backed by Cypress Semiconductor and SunPower, will combine solar wafer manufacturing methods with semiconductor manufacturing support to create wafer-level chipscale packaging (WLCSP) derivatives.

Predicting plasma in wafer etch and deposition via quantum mechanics

11/07/2011 

Simulation work can play an important role in understanding fundamental plasma physics, and providing insights into process optimization and development in wafer etch and deposition. Quantemol and TEL authors discuss their simulations and observations.

SEMATECH ISMI roundup: Fab diagnostics, energy consumption, ESH update

11/04/2011 

Key themes summed up from ISMI's Manufacturing Week (Oct. 17-21) included predicting and monitoring equipment health, optimizing WIP and maintenance scheduling, reducing energy consumption at both the tool and fab-wide level, and various areas of nanomaterial health/safety concerns.

300mm wafers buck soft silicon growth trend

11/04/2011 

"Silicon shipments for the most recent quarter are reflecting the general hesitancy of the market,

Improved post-etch metal and oxide residue removal yields

11/03/2011 

Avantor Performance Materials and SSMC Inc. compare the use of a semi-aqueous post-etch ash residue remover with an industry-standard HA-based residue removal chemistry. The semi-aqueous-based product was shown to reduce COO for manufacturing of low- and high-voltage logic devices, and increase yields.

Freescale Semiconductor CEO takes SIA lead

11/03/2011 

The Semiconductor Industry Association (SIA) elected Freescale Semiconductor CEO Rich Beyer as its 2012 chairman. This will be the SIA's 35th year.

BSI image sensors avoid distortion with Ziptronix bonding process

11/03/2011 

Ziptronix ZiBond direct bonding process contribute minimum distortion in backside illuminated (BSI) image sensors because of its low-temperature processing and high bond strength, the company reports.

ATMI pays $95M to bring SDS gas system manufacturing and sales in-house

11/01/2011 

ATMI has taken control of, and responsibility for, worldwide distribution of its proprietary Safe Delivery Source (SDS), gas storage and delivery system and related technologies from Matheson Tri-Gas.

450mm wafer platform from Crossing Automation offers a bridge gap solution

11/01/2011 

Crossing Automation Inc. introduced its Crossing Spartan 450mm Development Platform and Crossing Certon 450 Loadport. Crossing Automation's May Su discusses the product design, including single FOUP EFEM.

GlobalFoundries names CEO: Manocha keeps the job

10/31/2011 

GLOBALFOUNDRIES named Ajit Manocha its permanent CEO, chosen by the foundry's Board of Directors. He had served as interim CEO since June 2011.

EUV Symposium report card: EUV's past, present, and future

10/28/2011 

Two Wall Street analysts report their impressions from last week's EUV Symposium (Oct. 17-19 in Miami), where companies in the EUV supply chain reported their latest results and planned progress through 2012. And don't look now but there's a competition brewing in source power.

ACM Research Shanghai sells 1st 300mm megasonic clean tool

10/28/2011 

ACM Research Shanghai Ltd. will install its Ultra C 12" (300mm) single-wafer megasonic cleaning tool at a leading Korea-based memory manufacturer. The tool will be implemented as part of the customer

TSV fab tool combines stress-free CMP with thermal flow etch

10/28/2011 

ACM Research Shanghai, Ltd., introduced the integrated Ultra iSFP stress-free polishing (SFP) semiconductor manufacturing tool for 65-45nm copper (Cu) interconnects, improving through silicon vias (TSV) with better heat dissipation.

Semiconductor funding on the rise, reports GSA

10/27/2011 

The GSA released its September statistics for monthly, year-to-date, and year-over-year semiconductor funding, initial public offerings (IPO), and mergers and acquisitions (M&A).

ISMI Manufacturing Week keynote: Collaboration makes fab ramps happen

10/26/2011 

Paul Fego from Texas Instruments, a keynote speaker at ISMI Manufacturing Week (Oct. 17-21, Austin, TX), summarizes how TI's collaborative culture can address specific semiconductor manufacturing challenges -- notably the ramps of its 300mm analog fab and assembly/test factory.




WEBCASTS



Environment, Safety & Health

Date and time TBD

The semiconductor industry is an acknowledged global leader in promoting environmental sustainability in the design, manufacture, and use of its products, as well as the health and safety of its operations and impacts on workers in semiconductor facilities (fabs). We will examine trends and concerns related to emissions, chemical use, energy consumption and worker safety and health.

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Wafer Processing

Date and time TBD

As the industry moves to 10nm and 7nm nodes, advances in wafer processing – etch, deposition, planarization, implant, cleaning, annealing, epitaxy among others – will be required. Manufacturers are looking for new solutions for sustained strain engineering, FinFETs, FDSOI and multi-gate technologies, 3D NAND, and high mobility transistors.

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