Fluid scanners

Mesa-Tek Instruments introduces its “Fluid Scanner” series of fast (3 mns/cycle for an 8-in. wafer scan) machines, designed for contamination extraction at wafer geometries of ( 0.25 microns. The Fluid Scanner replaces the vapor phase dissolution process, providing fast, programmable (PLC-controlled) 100 percent wafer surface coverage. The FS-500 is designed to monitor cleanroom ambient conditions, identifying contaminants and their sources. It can also be used as an “ultra-cleaner” for wafer surface preparation before processing. The FS-1000, a manual analytical lab tool, enables detailed analysis of all or part of the wafer surface; the FS-2000, a semi-automatic version, automates sample placement and collection for in-line sample collection/off-line analysis; the FS-3000 is a fully automated minienvironment production-line cluster tool designed for real-time hands-off analysis of semiconductor wafer batch-process lots. It interfaces with all available analytical tools.

Mesa-Tek Instruments, New Fairfield, CT

(203) 746-7042