The JBX-5500FS fills the gap between higher and lower cost systems. (Photo: JOEL USA) |
July 11, 2007 — JEOL USA has introduced a new high resolution direct write e-beam lithography system to complement its family of spot beam, vector scan systems and mask production tools.
The JBX-5500FS writes patterns at a minimum line width of 10nm at 50kV on substrates up to 100mm. Its PC-controlled operating platform boasts a simple graphical user interface for pattern design and machine control.
The new tool targets research labs and universities, and aims to fill a gap in doing so. „For the past several years, there has been a void between the two most common direct write tools — SEMs or Scanning Electron Microscopes with e-beam attachments, and dedicated e-beam systems,” said Zane Marek, JEOL USA Semiconductor Equipment Product Manager. “The price gap between these levels has been too large to overcome, especially for universities.”
This year JEOL is celebrating its fortieth anniversary since the introduction of the first JEOL e-beam system, and today the company “prides itself on having the widest range of tools in its e-beam family of both direct write and mask production systems,” Marek notes.
JEOL says its product line and technical expertise covers all aspects of e-beam lithography, from 30kV SEM and EBL to 100kV production-level tools. In 2006 the company introduced a next-generation direct write tool, the JBX-6300FS, for sub-ten nanometer linewidths at 100kV with sub 15nm stitching accuracy.
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