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XsunX: PV tools come first, then factory site

12/06/2007  December 6, 2007 - Citing an abundance of real-estate options to choose from, XsunX execs say they're prioritizing getting their tool orders ready before finalizing a deal for their first multimegawatt thin-film photovoltaic factory.

Microfluidics device forms tumor for better drug discovery

12/06/2007  Small, spherical conglomerations of tumor cells are superior to individual cells for predicting the response of malignant cells to a variety of anticancer treatments. To trap a reproducible number of cells in an environment that causes the cells to adhere to one another in discrete structures (the tumor spheroid), a Berkeley researcher has designed a microfluidics device that uses the properties of fluid flow at the nanoscale to capture cells within a U-shaped structure.

Indian nanotech students report no real classes

12/06/2007  More than a year after the fanfare-filled launch of the National Center for Nanoscience and Nanotechnology at the University of Madras in India, its first 11 students are still waiting to receive a nanotech education, according to a report in the Indian newspaper The Hindu.

Reports: Hynix prepping 48nm NAND ramp

12/06/2007  December 6, 2007 - Hynix Semiconductor expects to start mass production of 48nm-based NAND flash in 1Q08, which would give it a brief headstart on rivals Samsung and Toshiba, according to local media reports.

Shinko Electric Licenses Vertical Circuits' 3D Interconnect Technology

12/06/2007  ; Vertical Circuits Inc. (VCI), has announced a long-term license agreement with Shinko Electric Industries, enabling Shinko to utilize VCI's patented vertical interconnect pillar (VIP) technology to develop and produce next-generation chip scale 3D packaging solutions.

Hitachi Chemical hiking CMP slurry output

12/06/2007  December 5, 2007 - Hitachi Chemical plans to boost its production capacity for CMP slurry by 50% to 15,000 tons/year by next June, its second upgrade in the past year, according to the Nikkei Business Daily.

Japanese firm says new additive limits tin whiskers

12/06/2007  December 5, 2007 - C. Uyemura & Co., an Osaka-based supplier of metal plating chemicals, has developed an additive that prevents formation of "tin whiskers" on circuit boards and other electronic components, according to the Nikkei Business Daily.

EV Group, Brewer demo ultrathin wafer bonding platform

12/05/2007  December 5, 2007 - EV Group (EVG) and Brewer Science say they have demonstrated temporary wafer bonding capabilities for a wide range of backside processes, including through-silicon vias (TSVs) and backside metallization, using an approach optimized for high-temperature advanced packaging applications.

SEMATECH tweaks, updates "next-generation" fab programs

12/05/2007  December 5, 2007 - SEMATECH has laid out general info about its 300mm "next generation factory" program, describing new and updated projects within its efforts to help the industry find ways to lower costs and reduce cycle times for 300mm wafer manufacturing, and establish a "proving ground" for concepts relevant to 450mm wafer-size manufacturing.

ATMI, IBM to work on next-gen resist strips

12/05/2007  December 5, 2007 - ATMI and IBM have agreed to jointly develop and demonstrate advanced chemical formulations for highly implanted photoresist strip applications targeting 45nm, 32nm, and 22nm chipmaking processes.

TDK tips way to purge FOUP gases

12/05/2007  December 5, 2007 - TDK has developed a way to quickly expunge air inside 300mm wafer front-opening unified pods (FOUPs) when entering or leaving cleanrooms, which otherwise can oxidize and damage wafers and lower yields, notes the Nikkei Business Daily.

NXP sells off Crolles2 tools

12/05/2007  December 5, 2007 - NXP Semiconductors says it has sold off equipment from its participation in the Crolles2 partnership, mainly used for R&D and pilot manufacturing, to an undisclosed buyer for an undisclosed price. Ownership will be transferred in two stages over the next six months.

SEMI sees equipment slide in '08, high single-digit rebound in '09-10

12/05/2007  December 5, 2007 - Semiconductor equipment sales this year are turning out slightly better than expected, according to SEMI's year-end forecast update, but the outlook for 2008 now indicates the equipment sector's first year in the red since 2005.

EVG, Brewer Science claim wafer 'milestone'

12/05/2007  EV Group, which supplies wafer-bonding and lithography equipment for the MEMS and nanotech markets, and Brewer Science Inc., have claimed a "milestone" in handling and processing of ultrathin wafers.

Finland and China intensify nanotech collaboration

12/05/2007  A cooperation agreement between the Finnish national nanotechnology initiative (FinNano) and the China International Nanotech Innovation Cluster (CINIC) was inaugurated Dec. 1 in the Chinese city of Shuzou.

Agilent Technologies and Multiprobe to Expand Partnership

12/04/2007  ; Agilent Technologies Inc. and Multiprobe Inc. today announced their intent to expand the companies' strategic partnership. As a result, Agilent will sell and support Multiprobe's Multiscan atomic force prober (AFP) to customers in Asia and Japan.

TI's Templeton named SEMI's Inoue EHS recipient

12/04/2007  December 4, 2007 - Richard Templeton, president/CEO of Texas Instruments, has been awarded the 2007 Akira Inoue Award from SEMI, for his efforts and achievements in semiconductor industry environmental, health, and safety improvements.

EV Group and Brewer Science Demo New Ultrathin-Wafer Bonding Technology

12/04/2007  In their ongoing joint development work, EV Group (EVG) and Brewer Science Inc. unveiled they have demonstrated temporary wafer bonding capabilities for a wide range of backside processes, including through-silicon vias (TSVs) and backside metallization.

SVTC, SEMATECH's ATDF merge to expand R&D capabilities

12/04/2007  December 4, 2007 - Months after significant reorgs on both sides, the SVTC (nee the Silicon Valley Technology Center) and SEMATECH's R&D foundry subsidiary Advanced Technology Development Facility (ATDF) in Austin, TX, are merging to expand their ability to offer an alternative to dedicated R&D fabs or shared development/production operations, months after both sides took steps earlier this year to reorganize and expand.

IMEC at IEDM: PVD for workfunction metals going forward?

12/04/2007  Researchers at IMEC gave WaferNEWS a preview of the group's papers to be presented at next week's IEDM 2007 conference in Washington, DC. Topics include PVD used for workfunction electrode metal in FinFETs; interactions between a capping layer, host dielectric, and workfunction metal that impacts threshold voltage; and using laser annealing in (gate-first) HK+MG devices to achieve gate length scaling with no loss in drive current.