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SMIC adds $600M through bank loans

06/08/2006  June 8, 2006 - Fresh off a $300M infusion to support expansion at its Tianjin facilities, Chinese flagship foundry Semiconductor Manufacturing International Corp. (SMIC) said its Shanghai subsidiary has closed a five-year, $600 million secured term loan facility with a consortium of international and Chinese banks.

Soitec adds CEA-Leti spinoff's thin-film layer transfer tech

06/08/2006  June 8, 2006 - Soitec, Bernin, France, has acquired CEA-Leti spinoff TraciT Technologies for an undisclosed amount, adding to its portfolio technology for thin-film layer transfers used in MEMS and power circuit production.

Two-in-One Packaging For Sensor Signal Conditioning

06/08/2006  The ZMD31012 sensor contains two ZMD31010 devices in a single SSOP14 package. ZMD claims that incorporating two signal conditioners in one package, sized at 6.33-mm x 7.90-mm, increases both functionality and board real estate.

Immersion's evolution launches the age of hyper-NA lithography

06/07/2006  ArF immersion lithography has started to reveal defectivity and overlay numbers comparable to dry ArF lithography, indicating that the technology is rapidly maturing and will soon be ready for introduction in volume manufacturing.

Akustica collaborating with Ricoh

06/07/2006  Akustica announced a collaboration with Ricoh Company Ltd. aimed at a new camera module for optimized audio and video performance in Universal Serial Bus audio/video applications.

Correct-A-Chip Adapter

06/06/2006  Aries Electronics introduces a RoHS-compliant version of its PLSS to DIP Correct-A-Chip adapter designed for prototyping, testing, and evaluation.

Laser Dicing Systems

06/06/2006  The IX-200 ChromaDice DPSS version is a high-precision wafer dicing system suitable for wafer trimming and scribing applications.

ULTRAMIC 600 Ceramic Heater

06/06/2006  The ULTRAMIC 600 advanced ceramic heater offers a high thermal conductivity aluminum nitride (AIN) ceramic composition paired with a proprietary, thermally matched heating element to enable a fast-responding heater configured in a low-mass package, suited to semiconductor processing, wire and die bonding equipment, analytical instrumentation, aerospace and medical device applications.

Letter to the Editor

06/06/2006  Dear Editor, Your editorial on the term "nanotechnology" did not go as far as it could in highlighting the ambiguity of the current usage of the "nano" prefix. I have always grudgingly accepted the definition containing features in the 1-100-nm scale as a useful first step in describing what it is we do to a layman. I am surprised to find that the U.S. Nanotechnology Initiative has used this infantile definition in setting out guidelines for what constitutes nanotechnology.

Another Word on Nano

06/06/2006  The day after I wrote my last editorial entitled Nano-inspiration, I attended the MEMS and Nanotechnology session at the IMAPS New England Symposium, May 16, in Boxborough, MA. There was so much discussion about nano-hype, multiple definitions of nano, how nanomaterials are made, and what you can do with them that I wished the session had occurred a few days earlier.

SEMI Holds Meeting on MEMS Packaging Standards

06/06/2006  (June 6, 2006) SAN JOSE, CA — If you're like most people who responded to SEMI's survey on MEMS packaging standards, you're not aware that SEMI has published three MEMS-related standards. Existing standards cover microscale fluidic systems, terminology, and wafer bonding. SEMI's MEMS technical committee has identified MEMS packaging as a task force area, and standardization efforts are just beginning.

Brion, Crolles2 partners extend OPC work to 45nm

06/06/2006  June 6, 2006 - Brion Technologies and Crolles2 Alliance partners STMicroelectronics, Philips Semiconductors, and Freescale Semiconductor, have incorporated Brion's Tachyon LMC lithography manufacturability verification technology into production on a fully automated 65nm process flow, and agreed to continue working to develop optical-proximity correction (OPC) technology for 45nm device fabrication.

RIO Design Automation Releases Next-generation EDA Tool

06/06/2006  Santa Clara, CA — Rio Design Automation Inc, an electronic design automation (EDA) company, announced that RioMagic, their chip design software tool, now includes full support for wire bonding and flip chip designs. This next-generation release reportedly has added rules-driven I/O sequencing, prototyping, and redistribution routing (RDL) support to its capabilities.

Report from EIPBN: Accelerating the future of nano fabrication

06/06/2006  We are entering a new era, in which nano-fabrication is moving beyond IC fabrication. Chasing Moore's Law is still an important challenge, but there are now other interesting challenges, such as making electronics ubiquitous, particularly in the medical field, and harnessing Nature's self-assembly methods. These were among the paths followed at the Electron, Ion, & Photon Beam Technology & Nanofabrication (EIPBN) held May 29 to June 2 in Baltimore, MD.

Renesas, Powerchip expand flash memory pact

06/05/2006  June 5, 2006 - Renesas Technology Corp., the chipmaking JV between Hitachi and Mitsubishi Electric, has expanded its technology license to Powerchip Semiconductor Co. to supply the Taiwanese company with flash memory devices, according to local news reports.

Report from The ConFab: Here comes the solar market

06/05/2006  Over the past 30 years, photovoltaics technology has made its share of false starts, and has earned a reputation as being impractical without government subsidies. However, recent advances and conditions are converging to create what this time promises to be a sustainable market -- and a significant business opportunity market for the semiconductor industry.