02/17/2006 Nikon Corp. says it has shipped the world's first production immersion lithography system to a memory chip manufacturer using 55nm process technologies, and for R&D on 45nm devices.
02/17/2006 February 14, 2006 -- /MEDICAL INDUSTRY E-MAIL NEWS SERVICE(TM)/ -- COSTA MESA, Calif. -- The FDA has released a new report that takes carefully examines the way the agency reviews applications for drugs and biologics that have not previously been approved by the FDA.
02/17/2006 Feb. 14, 2006 -- /BUSINESS WIRE/ -- LOGAN, Utah -- HyClone, an innovative developer of cell-culture products and bioprocessing systems, has expanded its Beijing operations to offer prepared liquid media for customers throughout China and other parts of Asia.
02/17/2006 February 14, 2006 -- /MARKET WIRE/ -- ALBANY, NY -- SEMATECH North researchers working on extreme ultraviolet lithography (EUVL) have achieved an important breakthrough in the complex process of cleaning mask blanks, the base material for the stencil-like photomasks that are used to describe patterns on semiconductor wafers.
02/17/2006 February 15, 2006 -- Flanders, NJ -- Rudolph Technologies, Inc. (Nasdaq: RTEC), a leading provider of process control equipment for thin film measurement and macro defect inspection, announced today that its merger with August Technology Corporation has been completed.
02/17/2006 February 15, 2006 -- /TOSOH SMD/ -- Grove City, Ohio -- Tosoh SMD, The Global Leader in Target Technology(TM) announces the asset acquisition of the former Cabot Thin Films business located in Etna, Ohio.
02/17/2006 February 15, 2006 -- /IEST/ -- ROLLING MEADOWS, Ill. -- Now available exclusively online, the Journal of the IEST contains peer-reviewed technical papers and TechTalk articles related to the fields of contamination control; design, test, and evaluation; and product reliability.
02/17/2006 February 15, 2006 -- /BUSINESS WIRE/ -- PHILADELPHIA -- CorCell, Inc., a national, private umbilical cord blood (UCB) bank, announced today that its patent-pending, sterile and closed connection technique exceeds current Good Manufacturing Practice (cGMP) guidelines, setting a new industry quality standard.
02/16/2006 February 16, 2006 - Microsoft's Xbox 360 gaming systems have had tight supplies thanks to publicized component shortages. Now, at least we know who's partly to blame.
02/16/2006 February 16, 2006 - Leuven, Belgium-based fabless company Essensium NV, a spin-off of Europe's Interuniversity Microelectronics Center (IMEC) R&D consortium, has secured ?6 million (about US $7.1 million) from Khazanah Nasional, the parent company of Malaysian wafer foundry Silterra.
02/16/2006 February 16, 2006 - Worldwide silicon wafer shipments increased for the fourth straight year in 2005, according to the SEMI Silicon Manufacturers Group (SMG). Wafer revenues grew in 2005 by 8%, slightly ahead of the ~6%-7% rate of the overall IC industry.
02/16/2006 February 15, 2006 - James Gallagher, former SEMI chairman and founder of wafer stepper supplier GCA Corp., passed away Feb. 7 at the age of 85. He was an early pioneer in the semiconductor equipment industry
02/16/2006 February 16, 2006 - Researchers at the U. of Notre Dame have developed a prototype demonstrating a chip design approach that utilizes tiny magnets for logic functions instead of electrical transistors.
02/16/2006 February 16, 2006 - Researchers at the U. of Wisconsin-Madison and French wafer supplier Soitec have determined that if specially cleaned, ultrathin layers of silicon actually do facilitate current flow.
02/16/2006 San Jose, CA — Tessera Technologies and UTStarcom have signed a licensing and development agreement, in which Tessera will license its Tessera Compliant Chip (TCC) semiconductor packaging technologies to UTStarcom. Both companies have collaborated on developing UTStarcom's MobileCard technology, which is an ultra-miniaturized mobile phone module that is equivalent to the size of two SIM cards.
02/16/2006 The NanoBusiness Alliance, a U.S.-based nanotechnology trade association, announced that two days of meetings between members of the nanotechnology business community and government officials commenced this morning.
02/15/2006 February 15, 2006 - KLA-Tencor Corp., San Jose, CA, has introduced an upgrade to its Starlight photomask inspection system, offering contamination inspection for all types of photomasks, including mainstream extreme resolution enhancement technique (XRET) photomasks, at the 65-nm node and below.
