Category Archives: Metrology

November 14, 2007 — Three companies — AMD, Carl Zeiss SMT, and Qimonda — are working together on new analytical and characterization methods required for the development of next-generation microchips. The work is being conducted within the framework of the Nanoanalysis Project, which the German Federal Ministry of Education and Research (BMBF) has backed with 12 million Euros. This strengthens the competency of the newly founded Carl Zeiss Innovation Center Dresden, particularly in the fields of semiconductor analysis and metrology.

Dr. Wolf-Dieter Lukas, Head of the BMBF Department “Key Technologies — Research for Innovations,” the strategic setup and expansion of microelectronics competency centers is an important goal. “Only by setting targeted priorities in research funding will we succeed in maintaining Dresden’s leading role in high-tech chip production and in further expanding it through such innovative approaches as here in the field of nanoanalysis.”

The Carl Zeiss Innovation Center Dresden, an important part of the Nanoanalysis Project, offers ultrahigh resolution particle beam systems that use electron and ion beams instead of light. These systems enable the imaging, analysis and processing of specimens down to the level of individual atoms. In this way, they are playing a decisive role in the characterization of three-dimensional semiconductor structures and in the development of new materials for chip fabrication. “With its Innovation Center, Carl Zeiss SMT is becoming involved in ‘Silicon Saxony,’ Europe’s leading microelectronics cluster. Not only is the cluster being strengthened in its function as a research location, but the ongoing development of the local semiconductor industry is also being promoted”, said Dr. Dirk Stenkamp, Member of the Carl Zeiss SMT Board of Management.

“As a manufacturer of innovative microprocessors, we are faced with the challenge of producing increasingly complex structures with smaller and smaller dimensions and with maximum yield”, says Dr. Udo Nothelfer, Vice President AMD Fab 36. “Therefore, process control at an atomic level plays a key role. Through our joint work in the Carl Zeiss Innovation Center Dresden, we have access to leading edge electron and ion microscopes and believe we can therefore further accelerate the introduction of new technologies. The experience gained in industrial utilization may be incorporated at an early stage in the development of future analytical systems.”

October 24, 2007 — /PRNewswire/ — REHOVOT, ISRAEL — Nova Measuring Instruments Ltd., provider of leading-edge, stand-alone metrology and the market leader of integrated metrology solutions to the semiconductor process control market, announced a major integrated metrology win for its CMP process control products at a leading memory manufacturer in Taiwan. The order includes dozens of Integrated NovaScan units, which are required to ramp up production in the largest memory fabrication facility in Taiwan. Installation of the NovaScan units began earlier this year and the next phase is expected to be completed during Q1 of 2008. This is one of the largest projects of its kind in the world, and Nova expects to supply additional units according to future production requirements.

“Our NovaScan product line, with its high throughput and market leading accuracy, make it the tool of choice to enable closed-loop control for CMP processes,” says Avi Magid, executive vice president, global business. “This is reflected in our leading position in the Taiwanese market, which represents over 20% of the world’s capital equipment spending.”

“In addition to improving yield and reducing cycle time, the NovaScan platform was chosen after demonstrating superior fleet matching capabilities during an exhaustive evaluation process. With so many tools installed in one facility, this aspect of the solution is particularly important,” Magid adds.

About Nova
Nova Measuring Instruments Ltd. develops, produces and markets advanced integrated and stand-alone metrology solutions for the semiconductor manufacturing industry. The company’s web site is www.nova.co.il.

Source: Nova Measuring Instruments Ltd.

ST’s Longgang site has been designed to house up to 40,000 sq m of manufacturing space, with a capacity for approximately 5000 employees, when fully built out. The first 20,000 sq m building is expected to be completed by the end of September 2008, followed by the installation of the manufacturing equipment in 4Q08. When complete, the Longgang plant will be among ST’s largest packaging and test facilities worldwide.

(November 06, 2007) DRESDEN & OBERKOCHEN, Germany — The companies AMD, Carl Zeiss SMT, and Qimonda are cooperating to launch a 12 million euro project within the framework of the joint Nanoanalysis project, funded by the German Federal Ministry of Education and Research (BMBF). The partners are working together on new analytical and characterization methods required for the development of the next chip generation. This reportedly strengthens the competency of the Dresden microelectronics site, particularly in the fields of semiconductor analysis and metrology.

(October 29, 2007) MIGDAL HA’EMEK, Israel — Jordan Valley Semiconductors Inc. has been named to the 2007 Deloitte Technology Fast 50 as one of the fastest-growing technology companies in Israel. A manufacturer of next-generation x-ray based semiconductor metrology, Jordan Valley provides patented x-ray technology to semiconductor fabs worldwide.

“Achieving sustained revenue growth over five years is a tremendous accomplishment for a technology company operating in a competitive world,” said Asher Mechlovich, partner in charge of the Deloitte Brightman Almagor Israel Technology Fast 50 Program. “Jordan Valley Semiconductors deserves a lot of credit for its remarkable growth, and we commend them for it.”

by Debra Vogler, Senior Technical Editor, Solid State Technology

Some speakers at last week’s ISSM conference (Oct. 15-17, Santa Clara, CA) speculated that the industry’s eventual transition to 450mm wafers would offer a chance to reformulate the concept of the fab. Not all IC manufacturers would be in the elite group that would benefit from the transition. However, most chipmakers would welcome the opportunity to add capacity in existing facilities while decreasing cycle times.

As a number of presenters at ISSM made clear, there is a movement in the industry that favors the ability to utilize small-lot (<25 wafers) manufacturing as a way to provide fab agility and drive down cycle times. Aquest Systems believes its vehicle-free transport (VFT) technology, FabEX Transporter, released in May of this year, can change the way existing or new fabs implement automation, and enable both small lots and a possible wafer size transition.

The company’s AMHS technology can be deployed in new fabs, but was also designed to work with existing automation systems, so fabs constrained with current layouts and tools can add capacity without making major changes. Available with straight segments of varying lengths and “turn” segments (0-270° of rotation), stocker and overhead transport (OHT) I/O, the system mounts directly under the OHT. According to the company, the controls leverage current ASIC, VoIP, and Ethernet technologies.

The breakthrough with the VFT concept is the decoupling of transportation with the loading operation — a concept that ISSM presenter Mike Brain, Aquest VP of technology and marketing, sees as one of the ways in which “no-wait manufacturing” can be used to drive down cycle time.

Brain told WaferNEWS that he envisions a time when automation will be tied more closely with process and metrology equipment. A key issue is that fabs, especially foundries, want the flexibility to start <25 wafer lots, but those smaller lots require higher movement capacity, and therefore, more FOUPs handled by equipment front-ends. "Double the number of FOUPs at the same wafer out rate translates to twice as much FOUP traffic," he said. This would cause even more traffic jams with OHTs, he noted. "Today, most people believe that an OHT system could handle 13 wafer lots, but it means putting up double the number of vehicles." It is this traffic congestion that Aquest wants to address with VFT.

Additional AMHS components in the FabEX product line are expected to be released in 1Q08. Brain couldn’t provide details at this time, but acknowledged that these components are also designed to reduce the need for wafers to wait for material handling systems, and for equipment to wait for wafers. — D.V.

by Ed Korczynski, Senior Technical Editor, Solid State Technology

Jeannine Sargent, recently appointed CEO of Oerlikon Solar, sat down with WaferNEWS for an exclusive interview to discuss the future of solar energy and her company’s plans to bring photovoltaic (PV) technology to the point of “grid parity” (the point at which the cost to generate electricity is no more than the cost to buy it from the distribution grid).

Oerlikon has committed itself to the future of PV success beyond the current amorphous/micromorph-tandem silicon thin-film on glass technology, and so they consider the eventual use of alternate absorbers as well as alternate substrates.

The company currently sells equipment and complete turnkey manufacturing lines to global customers. Established companies in the solar manufacturing market may only need certain hardware to add to their line, while a new company to the industry may opt for a complete turnkey line from Oerlikon. “Some people getting interested in renewable energy may have tried thin-film some years ago and it didn’t work for some reason,” explained Sargent. “Now they see that a turnkey line offers them the ability to enter the market.” She contends that the PV manufacturing industry is poised to take the last step that hasn’t happened in the semiconductor manufacturing space: buying a complete turnkey line, along with contracts for all the personnel to run it.

In general, one gets a better economy of scale on a per-module basis if you increase the capacity of the line,” Sargent explained. Today’s 20-40MW capacity is relatively small; 60-80 MW is the current scale ordered, and 120 MW lines are now being spec’d.” Even greater capacity would likely come from multiple 120MW lines, perhaps distributed around the world (each producing ~4100 modules/day at 1.3 m2).

Oerlikon considered using both 1.3 and ~4 m2 glass substrate sizes (having worked with both for TFT), and after consulting with potential customers decided that the smaller size was preferable for device performance and to minimize installation costs for solar farms/plants. Commercial plants use modules less than a maximum size so as to avoid the costs and hassles of cranes for installation, and to minimize the “sail effect” of stressing or breaking panels in the wind. Consequently, even the 1.3m2 substrates need to be cut in two prior to module assembly, so a larger substrate size just results in more cutting. “If you look at solar parks and solar farms, they all cut up large plates,” Sargent noted.

Manufacturing efficiency for Oerlikon’s line would not necessarily be helped by a larger substrate size, since the absorber deposition chamber processes a batch of 30 substrates at a time. Ensuring that film properties remain constant across a larger substrate requires a reduction in the deposition rate and thus the throughput based on area would not be helped. Larger panels might be advantageous for custom installations on the sides of office buildings, but Sargent pointed out that this category is <10% of current forecasts.

Oerlikon plans to drive final module costs down to grid parity primarily through the rigor of industrial engineering benchmarks, based on diverse manufacturing industries such as automotive, aerospace, and paper, and the IC fab industry still provides reference technologies as well. “We have developed some in-line metrology technologies that we’re starting to look at for feedback process control,” said Sargent. “The automotive and aerospace industries really understand reliability, and we want to align the energy market with these industries.”

Pure PV technology development continues for thin-films beyond silicon, today primarily for CdTe and CIGS, though much work is still needed on materials science and engineering to get to a viable manufacturing flow, with peak efficiencies for CIGS seen in the 16%-20% range. Meanwhile, Oerlikon will be building up a silicon-based product line that it expects to be a $1B/year business in <5 years, and if other thin-films or even roll-to-roll substrates eventually seem likely the company will work on them too, Sargent noted.

Sargent thinks that CIGS absorbers could get costs near the $0.25/W-peak level, which she suspects may be the parity level in 2012. “A lot of people will be happy because it’s ‘green,’ but it’ll be driven by economics,” she explained. “We talked to China’s government officials, and they can’t even build up the infrastructure for coal fast enough. They can’t build pipelines from Russia for oil fast enough. They’re fast-forwarding into renewable energy because they don’t have a choice.” Also, the “emerging markets” of the world without substantial existing energy infrastructures should find it relatively much easier to adopt all manner of renewable energy sources including PV. With a terawatt challenge facing the world, it looks like there should be nearly boundless demand for all types of PV modules for the foreseeable future. — E.K.

(October 19, 2007) AUSTIN, TX— Intel Capital, Intel’s global investment organization, became the sole investor in a US $11 million round of funding into Jordan Valley Semiconductors Ltd in return for a significant stake in the Israeli company. Jordan Valley develops tools for semiconductor metrology based on X-ray technology.

October 16, 2007 – Intel Capital, the chipmaking giant’s global VC arm, has invested $11 million in Jordan Valley Semiconductors to obtain what the companies describe as “a significant stake” in the provider of x-ray-based thin-film metrology tools.

The deal gives Jordan Valley more resources to accelerate technology and product development, noted company CEO Isaac Mazor, in a statement. “Working with Intel Capital significantly increases our profile in the industry and enables us to take full advantage of existing and new growth opportunities. From our perspective, this can only help to further expand our leadership position in the market.”

For Intel Capital, the deal offers an opportunity to tap into the field of x-ray metrology, which has “reached an inflection point for broad industry adoption,” according to Heiko von Dewitz, investment director of Intel Capital in charge of Intel Capital’s semiconductor investments in Europe and Israel.

Jordan Valley execs wouldn’t provide many details about the structure of the deal, except that the stake obtained by Intel is distributed among the company’s current owners — Clal (~44%), Elron (~28%), and founders/others (28%). Elron indicated in a statement that its stake is now 21%; the rest of the ownership distribution has not been disclosed.

In an e-mail exchange with WaferNEWS, Jordan Valley CEO Itzak Mazor indicated that “at this time you may call [the infusion from Intel] mostly financing,” but also a strategic investment,” indicating that the two may work more closely on development work on x-ray metrology.

September 18, 2007 — The French company FOGALE nanotech, developer of dimensional metrology devices, has opened its first North American office in Los Angeles to forge partnerships with North American universities to develop ideas for innovative sensors, and to improve sales service for the company’s North American clients. Arnauld Dumont is CEO of the new operation.

With expertise in capacitive, inductive, optical, and ultrasonic metrology and a strong scientific background, FOGALE provides standard and customized detection systems to customers in the automotive, defense, aeronautics, and nuclear industries in Europe, the United States, and Asia.

Some examples of the company’s technologies are an intelligent anti-collision device for medical robots, an ultra-high-accuracy alignment for extra-large laboratory machines, and high-temperature blade-tip clearance measurement systems for the aerospace industry. It has also developed active real-time measurement devices for telescopes, and has customized 3-D profilometers for laboratories and the semiconductor industry. It recently introduced the new Biomass+ system for accurately measuring viable cell density for yeast, bacterial, fungal, animal, and plant cells.

September 11, 2007 – Cadence Design Systems and Stratosphere Solutions are collaborating to increase 45nm semiconductor device yields by targeting manufacturing variability, combining their technologies to offer improved process modeling, analysis, and implementation flows.

The pact combines Cadence’s Encounter digital IC design platform with Stratosphere’s Ozone variability modeling environment, to support an end-to-end flow from parametric yield measurement, modeling and characterization to design analysis, optimization and final signoff, the firms said. The result is a comprehensive methodology for 45nm design that minimizes impact of potential systematic (lithography, chemical mechanical polishing) and random variations.

The combination helps users “analyze impact of within-die, die-to-die, systematic and random variation on design,” in order to “significantly mitigate [the] impact of process variation, improve performance predictability, and prevent silicon failures,” explained Prashant Maniar, co-founder and chief strategy officer of Stratosphere, in a statement.

Foundries and semiconductor companies using Stratosphere’s parametric yield metrology platform “produce massive amounts of fab data that can be translated into accurate statistical models,” noted Mike McAweeney, VP of DFM marketing at Cadence. “Our collaboration with Stratosphere has produced a comprehensive and seamless flow that helps customers to prevent, analyze and optimize for manufacturing effects and manage process variation.”