Category Archives: Displays

May 10, 2011 — Teknek, contact cleaning technology provider, introduced the Ultracleen range of cleaning roller for flat panel display (FPD), solar photovoltaic (PV), touch panel, and other thin films.

Building on the Nanocleen product for contamination removal, Teknek worked with producers and users of thin film to create a product that addresses the impact of debris on yields, production and quality. Highly engineered thin film is increasingly used in flat panel displays, touch panels, automotive applications and thin film solar panels.

Films for FPD and other applications are exceedingly thin and fragile, noted Ruaridh Nicolson, Teknek sales and marketing manager. The Ultracleen contact cleaning range was designed to ensure the best possible cleaning at the fastest production rates that leaves the film totally undamaged by the cleaning process.

The company advises combining Ultracleen rollers with its Nanocleen Plus silicone-free, static-dissipating adhesive rolls.

Teknek is part of the TH Group of companies and provides contact cleaning equipment for a number of sectors including semiconductors, converting, printing, medical and solar cells. For further information, visit www.teknek.com.

by Michael A. Fury, Techcet Group

Click to EnlargeMay 3, 2011 – The final day of the MRS Spring 2011 meeting was more like a regular wake than the Irish wake of the preceding four days, in that everyone had been high on data (and caffeine). On Friday, the halls were quite a bit more subdued, perhaps due to exhaustion. The upside of the diminished crowd was that the coffee did not run out halfway through the break. I applaud the 25 hearty souls who persevered through the last talk of the last symposium on the last day.

My movement between rooms afforded me the opportunity to visit the coffee urns on both meeting floors of Moscone West during the break. To my surprise, one floor was apparently serving Starbucks, while the other was serving Seattle’s Best. Was this a deliberate distribution of wealth among suppliers? Or a subtle class distinction between floors? Inquiring minds had to know, so I asked the head barista. It turns out that one floor used the wrong labels. (In the interest of global peace, I will not reveal which label was in error.) My own taste test confirmed that the beverages were the same, and well within acceptable parameters.


(Additional presentation details can be found online on the MRS Spring 2011 abstracts page. The underscored codes at the beginning of papers reviewed below refer to the symposium, session, and paper number.)

Interconnects and optoelectronics

Wim Bogaerts at IMEC (O10.1) opened the emerging interconnect technologies session with a review of optical interconnects for photonic devices, the primary driver being our insatiable thirst for bandwidth. Light slows down in matter in proportion to the refractive index, so lower refractive index materials are desirable to make the speed of light faster! To calibrate, we’re looking at an available bandwidth of 40THz. Silicon photonics has a scattering loss from sidewall roughness of ~1dB/cm (~50% loss per inch) but this is adequate so far for on-chip applications. High speed signal modulators for silicon photonics requires introduction of a perovskite, Ge or polymer material to operate in the 42Gbit/sec range. Photonic layers are notoriously temperature sensitive and will likely require local temperature regulators, raising a serious issue of power management.

MRS Spring 2011
Day 1: Lighting the paths for LED materials
Day 2: The III-V future of CMOS, the return of spin-on low-k
MRS Day 3: Memory, hardmasks, low-k — nothing’s confidential
MRS Day 4: Outside CMOS fabrication, but respecting boundaries
MRS Day 5: Opto, interconnects, organics, Borg?
Thin-film PV materials under the microscope @ MRS

Dunlin Tan from Nanyang Technological U. (O10.2) introduced their scheme for the use of vertically aligned carbon nanotubes (CNT) for flip-chip interconnects. A TiN barrier layer is needed to separate the metallization from the CNT catalyst for good growth without consumption or contamination of the metallization. The chosen scheme calls for a CNT-to-CNT bond between the chip and substrate, rather than CNT-to-metal.

In an effort to achieve zero-emission data computer centers, Gerhard Meijer of IBM Zurich (I11.5) decided to cool supercomputers with hot water instead of cold water. (I know what you’re thinking, but wait…) Server centers consumed 2% of global electrical power generated in 2009. Only 47% of that is consumer by the IT equipment itself, much of it driven by leakage current at those 5nm gate oxides; the rest is spent on air conditioning. Micro-channel liquid coolers fabricated in silicon would operate with a much smaller temperature gradient between the inlet water and CPU temperature. The cooling system picks up 85% of the heat generated when operating at 60°C. Net energy consumption for the prototype data center was reduced by 40%. The first commercial implementation is planned later this year for the 3PFLOPS HPC supercomputer center in Munich. The concept is being extended in PowerPoint space to interlayer liquid cooling for 3D CPU stacking. Calculations indicate an extraction capability of 7.2kW from a 10-layer CPU stack in a 4cm2 footprint.

Kris Bertness at NIST (EE10.1) showed a method for growing GaN nanowires without the use of a catalyst, which would constitute an impurity that ultimately degrades its optoelectronic properties. The wires are shown to lase with n type background carriers in undoped materials at a concentration of <1^1016cm-3. Good electroluminescence was observed in p material. The only successful p type dopant for GaN is Mg and it tends to form tapered nanowires rather than ones with a uniform thickness. She discussed a number of assumptions used for modeling of planar materials that give grossly incorrect results when applied to nanowires.

Cengiz Ozkan at UC Riverside (O10.5) explored the use of graphene and InSb nanowires for nanoscale interconnects. Graphene has the bonus property of being an effective heat spreader, and showed a sustained data transmission capability of 90Mbit/sec. This is still far from competitive with the 2.5Gbps rate of Cu over a 20cm length. The InSb wires demonstrated 10Mbit/sec without any impedance matching. Additional improvement of the CVD methods used to deposit these films is underway.

Won Lee of Sungkyunkwan U. (O10.6) used graphene interconnects to demonstrate stretchable silicon TFT ICs on a rubber substrate. The devices functioned well up to 10% stretching, limited by the particular epoxy used in their demonstration.

Nobuhiko Kanzaki from Santa Clara U. (O10.7) sought to reduce the contact resistance between FIB- and e-beam-deposited tungsten contacts and carbon nanofiber (CNF) interconnects and vias. Resistance between Au electrodes dropped from the 100MΩ range to the 10kΩ range with the use of their W contact. Comparable resistance behavior was found between the two contact deposition methods after the e-beam method was optimized. E-beam has the advantage of lower operating energy, thus less potential damage to the underlying materials.

Kyongjun Kim at Seoul National U. (O10.8) demonstrated the use of patterned solution-processed ZnO films for transparent thin film transistors (TTFTs). Conventional lithography and plasma etching are not friendly to ZnO. They define the pattern in PMMA, then spin coat a ZnO solution to fill the features. The device is then immersed in a toluene/methanol solvent that extracts water from the ZnO features and stabilizes them for subsequent annealing at 200°C. Electrical performance was within the target ranges.

Life sciences applications

Cecile Delacour of Institut Néel-CNRS, Grenoble (EE11.1) demonstrated the use of a Si FET array to detect charge propagation in neuron circuits. Seeing these alien creatures on an otherwise pristine silicon surface made my contamination engineer neurons fire stochastically, but the technique does lend credence to the origin of the Borg. This work has serious implications for the understanding of neurological disorders such as Parkinson’s disease. Sensitivity and selectivity were further enhanced by incorporating 100nm Si nanowires into the system.

Ping Xie from Charles Lieber’s group at Harvard (EE11.2) fabricated a nanowire-nanopore FET sensor for detecting DNA translocation. This is the first FET-based nanopore sequencing device and the first multiplexing sensor detection of translocation.

Rouxue Yan of UC Berkeley (EE11.3) developed a technique for single cell endoscopy using SnO2 nanowire wave guides. Such a device can facilitate selective targeting for gene or drug delivery, intracellular imaging, and sensing of molecular dynamics processes within the cell. The micromanipulator employed can control the position of the probe tip with a precision of 100nm. Using conical glass nanoprobes results in cell death in a minute or less, whereas cells survive five minutes or more with these nanowire Cells exhibit a high tolerance to rapid injection or short-term interrogation, with 85% of the cells recovering fully after withdrawal. Unlike their multi-cellular human counterparts, individual cells require neither anesthetic nor medical insurance coverage to undergo the procedure. Getting a signature on the medical waiver form is a challenge that remains to be addressed.

Organic devices

Tau-Hun Ha from U Texas @ Austin (OO17.5) fabricated p channel organic polymer TFTs based on diketopyrrolopyrole-naphthalene copolymer (PDPP-TNT) which has a mobility of ~1cm2/Vsec. Performance in dual gate mode was superior to single gate mode. Morphology studies vs. annealing temperature were used to explain changes in device switching response times due to inhomogeneous crystallization.

Omar Khatib at UC San Diego (OO17.6) studied the infrared signatures of ambipolar charge injection in donor-acceptor copolymer OFETs. These devices were fabricated with PBBTPD on n doped Si for ease of analysis for the purpose of studying the fundamentals of ambipolar charge transport in this class of materials. This work represents the first IR signatures of ambipolar behavior.

Fabrice Mathevet from U. Pierre et Marie Curie, Paris (OO17.7) described his studies on molecular and macromolecular semiconducting liquid crystals intended for OFET and PV applications due to their high carrier mobility. Synthesis pathways and structural characterization were described for several compounds.

Toby Nelson of CMU (OO17.8) aspires to fabricate inexpensive throwaway devices for RFID and comparable applications using a ‘transistor paint’ comprising a next-generation set of material based on DTP and DPP, with early work reported on PDDTP-DPP. Device mobility with this material was as high as 0.41cm2/Vsec is highly repeatable and quite stable in normal environmental handling.

Christian Nielsen of Imperial College London (OO17.9) discussed his work on trithienobenzene-based polymers for high-performance FETs and OPVs. The materials have good absorption in the 500nm-600nm range. Mobilities on the order of 0.3cm2/Vsec were achieved for some of the compounds explored.

Toshihiro Okamoto from the U. of Tokyo (OO17.10) focused on the synthesis of face-to-face Π-Π stacked structures using fused acene backbones. A strategy of alternating aryl and perfluoroaryl was adapted to affect more aggressive stacking interaction. Time-resolved microwave conductivity was used to evaluate photoconductivity of single crystals of the material synthesized. The molecular design formalism proved promising, but outstanding mobility results have yet to be achieved.

Atefeh Yousefi Amin at the U. of Erlangen-Nurnberg (OO17.11) fabricated high mobility (6.4cm2/Vsec) OTFT devices based on 2,7-dialkyl-[1]benzothieno[3,2-b][1]benzothiophene (BTBT), resulting in a p channel transistor. Operating voltage was reduced by using a 5nm Al2O3 with a fluorinated SAM to adjust the threshold voltage from -1.8V to -1.1V (compared to -14V with an SiO2 gate dielectric).

Ajay Perumal of Technische Universität Dresden (TUD) (OO17.12) showed feasibility for alternating current OLEDs using doped organic semiconductors. A luminance of 1000Cd/m2 and a maximum efficiency of 0.37 lumens/W were achieved with the device, which does not respond to DC voltage. The luminance is attributed to the charge carrier generation and recombination, leading to formation of excitons within the device, without the injection of charge carriers through the external electrodes.

 


Michael A. Fury, Ph.D, is senior technology analyst at Techcet Group, LLC, P.O. Box 29, Del Mar, CA 92014; e-mail [email protected].

May 2, 2011 – Marketwire — Robert Bosch GmbH (Bosch), one of the top 4 MEMS suppliers, has standardized on an enhanced custom/analog flow based on Virtuoso v6.1 technology from Cadence Design Systems Inc. (NASDAQ: CDNS), gaining approximately 25% better productivity for advanced custom/analog silicon design.

Bosch and Cadence continue to build upon their longstanding collaboration with the aim of accelerating Bosch’s innovation and time to market, while ensuring the highest quality and reliability for its broad range of high-performance integrated circuits (ICs). The Cadence custom/analog flow includes all elements of silicon, package, and board and provides unified design intent, abstraction, and convergence through the flow.

As a result of implementing the Cadence unified custom/analog flow, Bosch yielded approximately a 25% design productivity gain compared to a multi-vendor point-tool approach that was used in previous designs. Significant productivity and quality gains were achieved by leveraging the constraint-driven design methodology and the new electrically driven design framework in the latest version of the Cadence Virtuoso v6.1 custom IC design technology.

Driving design intent and convergence pervasively through the custom/analog flow is especially critical for the high-performance and strict reliability requirements of the automotive IC industry. The Cadence unified custom/analog flow provides Bosch an integrated and modular IC development flow well suited for modern IC and micro electro mechanical system (MEMS) technologies.

Leveraging a holistic constraint-driven design methodology across a common backplane through Cadence Virtuoso Schematic Editor, Virtuoso Analog Design Environment, and Virtuoso Layout Suite, Bosch was able to save design time across all process technologies and meet the high quality standards for its safety-critical applications.

"Serving a very cost-sensitive market such as automotive with high-quality standards requires a comprehensive design, verification, and implementation solution which is based on a proven design methodology within a powerful automated design environment," said Dr. Peter van Staa, VP engineering at Bosch.

"Being selected by Bosch, the leading worldwide supplier for automotive electronics, underscores the significant technology leadership Cadence offers to advanced custom/analog design teams," said John Stabenow, group director, custom/analog product management at Cadence. "We are committed to the EDA360 vision and delivering on the promise of a more deterministic end-to-end path to silicon, as well as the industry call for higher productivity and profitability."

The enhanced custom/analog flow is focused on unique and pervasive design intent, abstraction, and convergence from schematic-to-GDSII, through to packaging.

Cadence enables global electronic design innovation and plays an essential role in the creation of today’s integrated circuits and electronics. More information about the company, its products, and services is available at www.cadence.com.

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April 28, 2011 – BUSINESS WIRE — Tokyo-based JSR Corporation named the first non-Japanese Officer to its Officers Committee. Eric R. Johnson, the current president of the company’s US semiconductor materials operations, JSR Micro, Inc., has been named as an Officer effective June 17.

While JSR has always functioned internationally, Johnson’s placement on the Officers Committee is representative of the company’s push to make JSR a truly global company, internally and externally, and of the critical role JSR Micro, Inc. (the US operations) is expected to play in the strategic future of the company. "For the JSR Group, North America is a strategically crucial market where we are expanding our businesses beyond semiconductor materials," said Mitsunobu Koshiba, president of JSR Corporation.

Johnson joined JSR Micro in 2001 as a senior vice president and was named president in 2005. As an Officer, Johnson will continue in his role as president of JSR Micro, Inc. but will also be involved in strategic planning and the strategic review process for JSR Corporation.

Johnson called the appointment a "tremendous honor" and stated his desire to support JSR’s strategic vision and people globally.

JSR Corporation is an advanced manufacturer in high-performance chemicals. JSR operates a wide array of global businesses ranging from the petrochemical business, including synthetic rubber, to the cutting-edge information processing and electronic materials business, including the manufacture of semiconductor materials and liquid crystal display materials.

JSR Micro supplies electronic materials to the world’s leading semiconductor manufacturers for imaging, packaging and CMP applications. Learn more about JSR Micro at http://www.jsrmicro.com/

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April 26, 2011 – BUSINESS WIRE — Universal Display Corporation (NASDAQ: PANL), enabling energy-efficient displays and lighting with its UniversalPHOLED technology and materials, announced advances in the performance of its UniversalP2OLED solution-processible, phosphorescent OLED material systems for use with solution-based manufacturing processes (such as ink-jet printing).

OLED manufacturers are evaluating manufacturing techniques, like ink-jet printing, as additional paths for the cost-effective production of large-area OLED displays and lighting panels. These developments were announced at the International Display Manufacturing Conference (IDMC 2011), held April 18-21, 2011 at the Taipei International Convention Center in Taipei, Taiwan.

Dr. Kwang Ohk Cheon, senior research scientist at Universal Display, reported in a paper titled "Progress in Solution Processible Phosphorescent Organic Light Emitting Devices (P2OLED)" that Universal Display has further enhanced the performance of its UniversalP2OLED red, green and light blue materials systems, as follows:

  • The green P2OLED system, which offers a luminous efficiency of 68 candelas per Ampere (cd/A), has now achieved 175,000 hours of operating lifetime. This represents approximately a 1.3 times improvement in lifetime over results reported last fall.
  • The red P2OLED system, with a luminous efficiency of 18 cd/A, now offers an operating lifetime of 125,000 hours for a two-times improvement in lifetime.
  • The light blue P2OLED system now offers a luminous efficiency of 29 cd/A and 8,000 hours of operating lifetime for a 1.6 times improvement in luminous efficiency and lifetime.
  • Operating voltage reductions were also achieved.

"Commercial viability is now in sight. Solution-based manufacturing techniques could become a cost-effective and attractive option for the production of OLED devices, especially at large sizes," said Steven V. Abramson, president and CEO of Universal Display. Improvements in materials, device design and fabrication techniques drive P2OLED performance closer to the levels currently obtained using vacuum-based manufacturing today. The operating lifetime data is reported as the time to 50% of the initial luminance of 1,000 nits without burn-in.

Small-area OLED displays, manufactured using conventional vacuum thermal evaporation, have already entered the mainstream consumer market in display applications for smartphones and multi-media players. Display and lighting manufacturers are evaluating other techniques for the manufacture of large-area OLEDs in an effort to further drive down costs for OLED TV panel and lighting panel production. Solution-processible techniques, such as ink jet printing, are candidates for the efficient and low-cost manufacturing of large-area OLEDs.

Universal Display Corporation (Nasdaq: PANL) is a leader in developing and delivering state-of-the-art, organic light emitting device (OLED) technologies, materials and services to the display and lighting industries. To learn more about Universal Display, please visit www.universaldisplay.com.

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April 19, 2011 – PRNewswire — TCZ, Cymer Inc. (Nasdaq: CYMI) display equipment product division, received a volume order for the TCZ-1500B, TCZ’s new Gen 5.5 crystallization system, from a leading Asian flat panel display (FPD) manufacturer. This represents TCZ’s second volume order in 2011 and fourth tool customer. The TCZ-1500B system is used for the production of advanced liquid crystal display (LCD) and next-generation organic light-emitting diode (OLED) displays for applications such as high-end smart phones and tablet computers.

Enabled by Cymer light source technology, the TCZ-1500B incorporates a high-power laser for increased throughput, and the Gen 5.5 system allows for a three-time increase in substrate size compared to Gen 4 systems.

Wider adoption of OLED displays has been challenged by the low yield and high costs of OLED technology, and this has limited the number of FPD manufacturers to enter into OLED production. TCZ has developed patented system improvements that use advanced laser beam controls to significantly improve the yield of OLED displays. The increased stability and improved yield of the TCZ-1500B is also expected to reduce the complexity of the manufacturing process, making it easier for new FPD manufacturers to enter the OLED market.

TCZ’s laser crystallization system broadens Cymer’s product offering to meet the display industry need to transition to larger substrate sizes for LCD and OLED displays, said Ed Brown, president and chief operating officer of Cymer.

Cymer Inc. develops light sources used by chipmakers worldwide as the essential light source for DUV lithography systems. Please visit www.cymer.com for additional information.

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April 19, 2011 – BUSINESS WIRE — MicroVision (Nasdaq: MVIS), ultra-miniature display technology provider, opened a research and development center at Nanyang Technological University (NTU), Singapore. The research facility, located on NTU’s 200-hectare green campus, will focus on developing innovative breakthrough products using MicroVision’s PicoP Display technology.

MicroVision plans to staff the new R&D facility with up to 25 engineers by 2012 to work on advanced research and development projects, perform operational support functions, and build upon the company’s current portfolio of over 500 patents issued and pending. By collaborating with NTU, MicroVision aims to leverage the university’s strength and expertise in engineering, microelectronics, and materials science to conduct joint research and development with faculty and students. The alliance is also expected to facilitate the exchange of ideas between NTU staff and students and MicroVision personnel, as well as provide possible internship opportunities for NTU students.

MicroVision’s dedicated R&D center includes a customized laboratory at NTU’s Innovation Centre. The company will work directly with NTU’s School of Electrical and Electronic Engineering and the Division of Physics and Applied Physics.

The Memorandum of Understanding between NTU and MicroVision was signed by Professor Bertil Andersson, NTU’s President-Designate and Provost and Alexander Tokman, CEO and president, MicroVision.

Tokman called Singapore centrally located to MicroVision’s manufacturers and customers, and "a hub for exceptional technical talent and productivity," adding that the students at NTU proffer a wealth of new ideas and fresh thinking.

This is MicroVision’s first R&D center outside the United States. The company originally considered Taiwan, but decided on NTU citing expertise in engineering and computing and an excellent research infrastructure, said Andersson. MicroVision engineers will work side by side with NTU faculty and students to perform joint research into innovative imaging and display solutions.

MicroVision provides the PicoP display technology platform designed to enable next-generation display and imaging products for pico projectors, vehicle displays and wearable displays that interface with mobile devices. MicroVision has a history of collaborating with leading universities and research institutes across the globe, including Stanford and MIT (USA) and Fraunhofer Institute (Germany). For more information, visit the company’s website at www.microvision.com.

NTU has been rapidly ramping its research capabilities in the last few years and has established strong industry partners including Rolls-Royce, Robert Bosch, Thales, and Toray. A research-intensive public university, Nanyang Technological University (NTU) has 33,500 undergraduate and postgraduate students in the colleges of Engineering, Business, Science, and Humanities, Arts, & Social Sciences. In 2013, NTU will enroll the first batch of students at its new medical school, the Lee Kong Chian School of Medicine, which is set up jointly with Imperial College London. For more information, visit www.ntu.edu.sg

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April 15, 2011 — Researchers at Eindhoven University of Technology have developed a replacement for indium tin oxide (ITO), which is used in displays, solar cells, and other technologies. This transparent, conducting film is produced in water, and based on electrically conducting carbon nanotubes (CNT) and plastic nanoparticles. The component materials are commonly available and the process is deemed environmentally friendly.
 

Click to Enlarge
Image. 4-point conductivity measurement of the new transparent conducting film developed by Prof. Cor Koning (left) and prof. Paul van der Schoot (right). The black pot contains a dispersion of carbon nanotubes in water, and the white pot contains the conducting latex. Photo: Bart van Overbeeke.

The research team has been able to achieve higher conductivity by combining low concentrations of carbon nanotubes and conducting latex in a low-cost polystyrene film. The nanotubes and the latex together account for less than 1% of the weight of the conducting film (a high concentration of CNTs makes the film black and opaque). The research team was led by theoretical physicist Paul van der Schoot and polymer chemist Cor Koning. Post-doc Andriy Kyrylyuk is the first author of the paper in Nature Nanotechnology (see below).

The researchers use standard, widely available CNTs, which they dissolve in water. Then they add conducting latex (a solution of polymer beads in water), together with a binder in the form of polystyrene beads. When the mixture is heated, the polystyrene beads fuse together to form the film, which contains a conducting network of nanotubes and beads from the conducting latex. The water, which only serves as a dispersing agent in production, is removed by freeze-drying. The researchers calculated the expected effects and also understood how the increased conductivity worked before trying the formula.

The conductivity of the transparent film is still a factor 100 lower than that of indium tin oxide. But Van der Schoot and Koning expect that the gap can quickly be closed. Standard CNTs are a mixture of metallic conducting and semiconducting tubes, notes Cor Koning. "As soon as you start to use 100% metallic tubes, the conductivity increases greatly. The production technology for 100% metallic tubes has just been developed, and we expect the price to fall rapidly."

The film’s conductivity is already good enough to be used immediately as an antistatic layer for displays, or for EMI shielding to protect devices and their surroundings against electromagnetic radiation.

The film has an important advantage over ITO: it is environment-friendly. All the materials are water-based, and no heavy metals such as tin are used. The new film is also a good material for flexible displays.

The research team was a combination of theoreticians, modeling specialists and staff to do practical experiments.

The results, which also provide new insights into conduction in complex composite materials, were published online April 10 by the scientific journal Nature Nanotechnology, "Controlling Electrical Percolation in Multi-Component Carbon Nanotube Dispersions" (DOI: 10.1038/NNANO.2011.40). Access it here: http://www.nature.com/nnano/journal/vaop/ncurrent/full/nnano.2011.40.html

The research forms part of the Functional Polymer Systems research program at the Dutch Polymer Institute (DPI), which provided financial support for this project. Prof. Cor Koning is with the Polymer Chemistry group (Department of Chemical Engineering and Chemistry) and prof. Paul van der Schoot is with the Theory of Polymers and Soft Matter group (Department of Applied Physics) of Eindhoven University of Technology. The other authors of the article are Andriy Kyrylyuk (first author), Marie Claire Hermant, Tanja Schilling and Bert Klumperman.

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April 13, 2011 – ACN Newswire — Applied Materials Inc. (AMAT) manufacturing solutions provider to semiconductor, flat panel display and solar photovoltaic industries, signed an agreement with the Institute of Microelectronics (IME), a research institute under the Agency for Science, Technology and Research (A*STAR), to set up a Center of Excellence in Advanced Packaging in Singapore.

The Center will be located at Singapore’s Science Park II and will focus on developing new capabilities in advanced packaging, which is a key growth market for the semiconductor industry. The Center will have a full line of wafer level packaging (WLP) processing equipment for die stacking and through silicon vias (TSV), etc., and will conduct research in semiconductor hardware, process, and device structures. Applied has provided equipment for WLP since 2009 with a comprehensive line of processing systems for production line manufacturing.

Applied expects many advanced logic devices at the 40nm and below technology nodes to be packaged at the wafer level.

Russell Tham, regional president, Applied Materials South East Asia, said, "This collaboration is part of Applied Materials’ strategy to expand our global R&D network and extend our leading position in advanced packaging, bringing our development activities closer to our customers in Asia."

According to Professor Dim-Lee Kwong, Executive Director of IME, "Such a close collaboration will spur the growth of next generation equipment and translate into greater share of the semiconductor market in Asia and the world for Applied Materials, and position Singapore as the country of choice for global semiconductor R&D."

IME is a research institute with advanced R&D capabilities in 3D-ICs using TSV technology. IME’s capabilities in this area include its 300mm facility. The Center leverages R&D capabilities in 3D-TSV, built by IME over the years, to support advanced packaging tool development for Applied Materials, added Lim Chuan Poh, Chairman of A*STAR.

In April of last year, Applied Materials opened its Singapore Operations Center, its first facility in Asia for manufacturing advanced semiconductor equipment, at Changi North Industrial Park.

The ceremony for the planned Advanced Packaging Center was attended by Singapore’s Minister for Trade and Industry, Lim Hng Kiang.

Applied Materials, Inc. (Nasdaq:AMAT) provides innovative equipment, services and software to enable the manufacture of advanced semiconductor, flat panel display and solar photovoltaic products. Learn more at www.appliedmaterials.com.

The Institute of Microelectronics (IME) is a research institute of the Science and Engineering Research Council of the Agency for Science, Technology and Research (A*STAR). A*STAR oversees 14 biomedical sciences and physical sciences and engineering research institutes, and 9 consortia & centers. For more information about IME, please visit www.ime.a-star.edu.sg.

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April 13, 2011 Applied Materials Inc. (AMAT) launched the Applied AKT-Aristo Twin system for manufacturing touch-enabled displays. Featuring two independent processing tracks on a single system, the AKT-Aristo Twin enables simultaneous fabrication of two different film stacks.

Click to EnlargeThere are several touch screen technologies on the market, with capacitive multi-touch displays being the preferred technology for mobile applications. Advanced multi-touch displays require the deposition of up to 15 or more PVD film layers during manufacturing. The new AKT-Aristo Twin system can fabricate glass- and rigid plastic-based advanced touch panels, providing up to 50% higher throughput than competing systems and using half the manufacturing space, Applied Materials claims.

"Touch screens are enabling the next wave of growth in flat panel displays, providing smartphone and tablet PC users with a faster, more intuitive interface," said Tom Edman, group vice president and general manager of Applied’s Display Business Group, who added that AMAT has shipped multiple systems, mainly to major manufacturers in China and Taiwan.

Based on the AKT New Aristo PVD platform for LCD color filter and touch panel applications, the AKT-Aristo Twin system is capable of handling substrate sizes up to 5.5m2 (2.2 x 2.5m). The parallel architecture provides a compact footprint and potentially eliminates the need for multiple systems. The system also features leading-edge rotary target technology to achieve high production yield and the lowest available cost-per-substrate.

Applied Materials will showcase the capabilities of its AKT-Aristo Twin system at the 2011 FineTech Japan Exhibition and Conference, April 13-15 in Tokyo.

Applied Materials, Inc. (Nasdaq:AMAT) provides innovative equipment, services and software to enable the manufacture of advanced semiconductor, flat panel display and solar photovoltaic products. To learn more, visit www.appliedmaterials.com/display.

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