Category Archives: MEMS

May 12, 2011 – PRNewswire — STMicroelectronics (NYSE: STM), micro electro mechanical systems (MEMS) supplier, and McGill University collaborated to create an undergraduate course that teaches the integration of multiple state-of-the-art sensors into embedded computer systems. Some 35 students have already completed the course, which started in January 2011.

The new course includes laboratory exercises and a final project that enables students to analyze and design systems that include the integration of data from multiple sensors. It was designed by Professor Zeljko Zilic of the Department of Electrical and Computer Engineering at McGill University and is based around ST’s iNEMO platform, which integrates ST’s most advanced accelerometers, gyroscopes and magnetometers, together with pressure and temperature sensors, to provide 3-axis sensing of linear, angular and magnetic motion, complemented with temperature and barometer/altitude readings.

The course integrates the curricula of computer, electrical and software engineering programs, just as occurs in real-world modern systems design, said Professor Zilic. "For example, smart phones now routinely employ multiple movement sensors to make more effective and intuitive user interfaces, navigation control and position detection and the same technology has unlimited applications in areas as diverse as robotics, factory automation and energy systems."

The course package could be implemented at other universities across North America.

The initial students’ final projects included a gaming application featuring ‘Hidden Markov Model Motion Detection,’ a gesture recognition system for image manipulation, and a tilt-compensated compass with free-fall detection for aircraft use. The next undergraduate course will start in September 2011. In addition, a two-day postgraduate workshop devoted to Integrated Sensor Systems, also based on the iNEMO, will be held at McGill University next week.

Similar collaborative industry/academia courses exist for nanotech, such as the NanoProfessor Program, recently implemented at the University of Calgary.

STMicroelectronics is a global leader serving customers across the spectrum of electronics applications with innovative semiconductor solutions. Further information on ST can be found at www.st.com.

McGill University is a public research university located in Montreal, Quebec, Canada. McGill consistently ranked as the top university in Canada. Learn more at http://www.mcgill.ca/

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May 12, 2011 — Researchers from the Technology Integration and Advanced Nano/microsystems (TIAN) Lab at the Department of Mechanical Engineering, University of Minnesota used IC assembly processes to fabricate single-walled carbon nanotube (SWCNT) composite thin film micropatterns and suspended beams. The stiff CNT-polymer composite thin film micropattern and suspended beam have potential applications to novel physical sensors, nanoelectromechanical switches, and other MEMS/NEMS devices.

Lithography-compatible layer-by-layer (LbL) nano-self-assembly was used to assemble negatively charged SWCNTs with a positively charged polydiallyldimethylammonium chloride.

The resultant composite thin film was patterned by oxygen plasma etching with a masking layer of photoresist, resulting in a feature size of 2µm.

The SWCNT nanocomposite stripe pattern with a metal clamp on both ends was released by etching a sacrificial layer of silicon dioxide in the hydrofluoric acid vapor. I-V measurement reveals that the resistance of SWCNT nanocomposite film decreases by 23% upon release, presumably due to the effect of reorientation of CNTs caused by the deflection of about 50nm. A high Young’s modulus is found in a range of 500-800GPa based on the characterization of a fixed-fixed beam using nanoindentation. This value is much higher than those of other CNT-polymer composites due to self-assembly and higher CNT loading.

The group was led by Tianhong Cui at the University of Minnesota. They have studied the lithography-compatible layer-by-layer nano self-assembly process in detail, and has previously configured nanomaterials as thin-film transistors and biosensors. The current work lends itself to nano-switches due to the thin films’ stiffness and electrical conductivity.

Dr Dongjin Lee was a PhD student when the study was conducted. He is currently a postdoctoral associate at the Korea Advanced Institute of Science and Technology (KAIST), Korea. The research group, TIAN Lab, is led by Prof. Tianhong Cui. The research goal of the group is to investigate the fundamental electrical and mechanical principles of new materials for MEMS/NEMS and low-cost micro/nanomanufacturing approaches, utilizing nanotechnology to effectively enhance the performance of micro/nanosystems. Learn more at http://www.me.umn.edu/labs/tianlab/.

Additional information including a detailed version of the fabrication procedure is available in the journal Nanotechnology. Access the article, "Suspended carbon nanotube nanocomposite beams with a high mechanical strength via layer-by-layer nano-self-assembly," here: http://iopscience.iop.org/0957-4484/22/16/165601

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Updated May 12, 2011 – BUSINESS WIRE — The US International Trade Commission (ITC) ruled in Analog Devices, Inc. (NYSE: ADI) favor and found that Knowles Electronics infringed ADI’s Wafer Anti-Stiction Application (WASA) patent, U.S. Pat. No. 7,364,942. The ITC also issued an exclusion order prohibiting further importation into the United States of Knowles’ infringing "MEMS [microphone] devices and products containing the same," effective July 11, 2011.

For its part, Knowles states that the ITC has ruled definitively that "MEMS microphones made by Knowles’s current manufacturing process will not be affected by the patent case brought by Analog Devices, Inc. (ADI). This decision clears the way for Knowles to continue selling and importing these products without impact from the case."

The ITC’s decision confirms an initial ruling on December 23, 2010 by Administrative Law Judge Robert K. Rogers, Jr., finding that Knowles infringed ADI’s patent. In January, the ITC confirmed the earlier ruling by ALJ Rogers, which found that two of Knowles’ patents were invalid, and that ADI was not restricted from selling its own MEMS microphones.

Knowles further states, "The ITC Investigation was initiated in December 2009 based on ADI’s allegation that Knowles’s MEMS microphones infringed two patents that covered processes for the manufacture of these devices. Knowles no longer uses the processes at issue in the ITC case, having transitioned all of its production to one of its manufacturing processes that ADI did not accuse of infringement during the ITC investigation. The ITC has now expressly affirmed an earlier ruling that products manufactured under Knowles’s current process would not be subject to any exclusion order issued by the ITC. The ITC’s decision also made clear that imports by Knowles’s customers who incorporate Knowles’s microphones into their products may continue without interruption, regardless of the process used to manufacture those microphones. As a result, Knowles expects its operations and its customers’ operations to continue as normal."

"While we are gratified that the ITC has granted our request and issued an exclusion order barring importation of Knowles microphones into the United States, our dispute with Knowles is not over," said Margaret Seif, vice president and general counsel, Analog Devices. "In our pending lawsuit against Knowles in Delaware, we expect to recover significant financial damages for Knowles’ past sales of infringing MEMS microphones. In addition, we will do what we can to insure that Knowles does not import infringing products into the United States, either directly or indirectly."

By integrating a MEMS transducer with an audio ASIC, iMEMS microphones optimize system designs, beginning with motion sensors and now with MEMS microphones, with more control over the full solution and value chain.

Analog Devices Inc. (ADI) provides data conversion and signal conditioning technology used in analog and digital signal processing applications. Learn more at www.analog.com.

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May 11, 2011 — Less than five years ago, CMOS image sensors were one of the fastest growing segments in semiconductors, but since the middle of the last decade, this optoelectronics category has struggled with price erosion resulting from increasing competition by suppliers, slowing growth rates in camera-phone applications, and the last recession.

After dropping 16% in 2009, CMOS image sensor sales rebounded by just 17% in 2010 to $4.5 billion compared to the semiconductor industry’s much stronger growth of 32% last year. Beginning in 2011, however, CMOS image sensor sales are expected to gain new momentum and consistency in growth from new systems applications beyond camera phones and stand-alone digital still cameras, concludes IC Insights’ new 2011 Optoelectronics, Sensors, and Discretes (O-S-D) Report.
 
The O-S-D Report shows CMOS image sensor sales growing 13% in 2011 to a new record high of $5.1 billion, topping the previous peak of $4.6 billion set in 2008. CMOS image sensor revenues are forecast to increase at a compound annual growth rate (CAGR) of 11.2% in the next five years, reaching $7.6 billion in 2015.

Figure. CMOS vs CCD image sensor dollar volumes. Source: IC Insights May 2011.

IC Insights’ forecast of 11.2% CAGR for sales in the 2010-2015 period is predicated on strong new growth in automotive safety systems, intelligent video cameras for surveillance networks, medical imaging, toys and games, and other emerging applications.

CMOS imaging devices are expected to account for 66% of the total image sensor market in 2015, compared to about 58% in 2010. Charge-coupled devices (CCDs), which still dominate consumer digital camera applications, video camcorders, scanners, and copiers, account for most of the remaining sales: 42% in 2010 and a projected 34% in 2015 (Figure). Also read: CMOS image sensors overrun CCD for digital cameras

Between 2003 and 2008, CMOS image sensor dollar volumes increased at a CAGR of about 27%, with unit volume shipments climbing by an annual average of 42%, but those rates of growth slowed significantly in the 2005-2010 period (5.1% for sales and 14.4% for units), according to the O-S-D Report’s analysis. While there has been some consolidation in the image sensor segment, more than 35 suppliers worldwide continue to pursue CMOS imager design wins — with most still concentrating on camera phones, consumer cameras, and embedded webcams for portable PCs and tablet computers. Camera phones accounted for 62% of CMOS image sensor sales in 2010 and are forecast to drop to about 49% in 2015, says the new O-S-D Report.

CMOS image sensor production capacity at IDMs and foundries has been moving from 200mm to 300mm wafers, driving up unit volumes and adding more pricing pressure to the marketplace.

With more production capacity coming online, minimum feature sizes reaching 65nm, and resolutions pushing beyond 16 megapixels on devices, CMOS image sensor suppliers will need new high-volume applications to sustain double-digit annual growth rates in the next five years.

The 2011 O-S-D Report continues to expand IC Insights’ coverage of the semiconductor industry with detailed analysis of trends and growth rates in optoelectronics, sensors/actuators (including MEMS-based devices), and discretes. View http://www.icinsights.com/services/osd-report/ for more information.

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May 11, 2011 — Worldwide silicon wafer area shipments decreased slightly during the first quarter 2011 when compared to fourth quarter 2010 area shipments and were marginally higher than first quarter 2010, according to the SEMI Silicon Manufacturers Group (SMG) in its quarterly analysis of the silicon wafer industry.

Total silicon wafer area shipments were 2,287 million square inches during the most recent quarter, a 1% decrease from the 2,302 million square inches shipped during the previous quarter. Q1 total area shipments are 3% greater than first quarter 2010 shipments. Silicon shipments are recorded for semiconductor industry usage.

"Silicon shipments experienced typical seasonal softening during the most recent quarter," said Dr. Volker Braetsch, chairman of SEMI SMG and corporate VP Siltronic AG. "Given that 2010 was a record year in terms of volume of silicon shipped, it is encouraging to see quarterly shipments were above levels reported the first quarter last year."

Quarterly silicon area shipment trends (Shipments are for semiconductor applications only and do not include solar applications).
Q1 2010 Q2 2010 Q3 2010 Q4 2010 Q1 2011
2,214 2,365 2,489 2,302 2,287

All data cited in this release is inclusive of polished silicon wafers, including virgin test wafers, epitaxial silicon wafers, and non-polished silicon wafers shipped by the wafer manufacturers to the end-users.

The Silicon Manufacturers Group acts as an independent special interest group within the SEMI structure and is open to SEMI members involved in manufacturing polycrystalline silicon, monocrystalline silicon or silicon wafers (e.g., as cut, polished, epi, etc.). The purpose of the group is to facilitate collective efforts on issues related to the silicon industry including the development of market information and statistics about the silicon industry and the semiconductor market.

SEMI is the global industry association serving the manufacturing supply chains for the microelectronic, display and photovoltaic industries. For more information, visit www.semi.org.

Also read: Leading-edge processes, MEMS, Japan turnaround driving 2011 wafer demand

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May 10, 2011 — For the MEMS industry in general and for Japan’s MEMS sector in particular, the damage from the March 11 earthquake and tsunami was not as severe as initially feared due to a fortuitous accident of geography.

Most MEMS fabs and foundries are located in southern Honshu, away from the disaster-devastated northern section of Japan, notes Jérémie Bouchaud, director and principal analyst for MEMS at IHS. MEMS and compass suppliers had been employing multiple fabrication plants for manufacturing before the March 11 earthquake and tsunami occurred, reducing the impact of supply disruptions caused by damage to a specific factory.

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"To date, the supply of MEMS sensors and actuators remains only slightly affected by the Japan catastrophe," said Jérémie Bouchaud, director and principal analyst for MEMS at IHS. "In fact, the main effect of the earthquake on the world MEMS industry is on the demand side, not on supply. Manufacturers of finished electronic products have been more severely impacted than the component suppliers."

9 of the top 50 MEMS manufacturers worldwide are Japanese companies (Canon, Panasonic, Epson and Denso all rank among the Top 20 in the global MEMS space), and Japan is a strong manufacturing base for MEMS companies headquartered in western countries. Japanese companies sold some $1.38 billion worth of MEMS in 2010, representing 21.3% of the global market.

Approximately 32.5% of MEMS sensors and actuators in value were processed — partly or entirely — in Japanese facilities in 2010, corresponding to revenues from both Japanese MEMS companies and from foreign companies that have their MEMS processed in Japan. Western companies with MEMS facilities in Japan include Freescale Semiconductor, Knowles Electronics, Goodrich Corp. and Texas Instruments Inc. for the complementary metal-oxide semiconductor (CMOS) circuitry of its digital light processing (DLP) chipsets.

Japan makes nearly all of the world’s digital compasses. Compasses rapidly are becoming a standard feature in tablets and cell phones equipped with global positioning system (GPS) functionality. Worldwide shipments of digital compasses reached 263 million units in 2010, up 354% from 58 million the earlier year, with shipments expected to rocket to 1.28 billion units by 2015, IHS iSuppli research indicates. Four Japanese firms — AKM Semiconductor, Yamaha Corp., Aichi Steel and Alps Electric — accounted for 97% of the global supply of digital compasses.

Only three of the 22 most important MEMS and compass fabrication plants in Japan suffered direct damage, IHS iSuppli research shows, although 19 fabs potentially could be affected by the same logistical and power issues impacting all Japanese industries in the calamity’s aftermath. The three damaged facilities belonged to Freescale, Canon Corp. and Texas Instruments, shown in the attached figure pinpointing the location of MEMS and digital compass fabrication facilities throughout Japan.

  • According to Freescale, the company has decided to close its 150mm fab in Sendai, near the quake’s epicenter, and focus efforts on accelerating the transfer of MEMS production to its 200mm Oak III fab in Texas. Freescale was lucky in that the Sendai fab had been scheduled for shutdown by the end of 2011, and the company already had built buffer inventories. Had it not made this decision in 2009, Freescale and its customers would have been severely hurt, IHS believes.
  • For Canon, which makes printers and MEMS print heads in the city of Fukushima, site of the nuclear meltdown, production was halted after significant damage to the company’s plant. However, Canon managed to repair the damage very quickly, with the plant completely operational again by the first week of April. As a result, the impact of the disaster on Canon’s MEMS revenue for 2011 is expected to be very modest, IHS iSuppli data indicate.
  • For its part, Texas Instruments’ Miho fab northeast of Tokyo has undergone the repair of various infrastructure systems for water, gases and chemicals. Full production will resume by the middle of July, with full shipment capacity to commence before September, the company said. Prior to the catastrophe, Texas Instruments already was using multiple fabs for the fabrication of CMOS wafers for DLP MEMS chips, and the company is in a fortunate position to rapidly increase production at its other fabs to compensate for the disruption at Miho.

To learn more about this topic, see the new IHS iSuppli report "The Japanese Disaster and Its Impact on the MEMS and Compass Industry" http://www.isuppli.com/MEMS-and-Sensors/Pages/The-Japanese-Disaster-and-Its-Impact-on-the-MEMS-and-Compass-Industry.aspx?PRX

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May 9, 2011The Dolomite Centre Ltd, designer and manufacturer of microfluidic devices, signed a collaboration agreement with Sphere Fluidics, a leading company in commercializing picodroplet technology that performs thousands of simultaneous analyses on single cells and small populations of molecules.

Sphere Fluidics is commercializing new lab-on-a-chip and picodroplet technology developed at Cambridge University by company founders Professor Chris Abell and Professor Wilhelm Huck. Sphere Fluidics offers expertise in miniaturized discovery systems and services based on microfluidics and picodroplets.

Focusing on storing and retrieving individual picodroplets containing a unique sample, Sphere Fluidics’ technology benefits rapid antibody discovery, identification of novel algal strains, generation of new biocatalysts, etc.

The agreement between Sphere Fluidics and Dolomite establishes core areas where the two companies will collaborate:

  • Dolomite will become the exclusive worldwide distributor for Sphere Fluidics’ standard products, including a range of PDMS picodroplet handling chips and surfactants;
  • Dolomite will develop and sell new products in picodroplet technology, based on Sphere Fluidics’ expertise.

Dolomite expects to add further functionality, such as droplet merging, via the collaboration. Sphere Fluidics expects the cooperation to bring its technologies to market faster.

"Microdroplets are a fascinating and fast growing area of research, especially useful where tests need to be conducted on only a few nanolitres of sample containing, for example, cells or DNA," commented Dr. Andrew Lovatt, CEO of Dolomite.

Sphere Fluidics is commercializing new lab-on-a-chip and picodroplet technology from Cambridge University that can perform thousands of simultaneous reactions on single cells and small populations of molecules contained within aqueous droplets, fractions of a millimetre in size. For more information please visit www.spherefluidics.com

A Microfluidic Application Centre, Dolomite focused on working with customers to turn their concepts for microfluidic applications into reality. For more information please visit www.dolomite-microfluidics.com

 

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May 6, 2011 – BUSINESS WIRE — Optics Balzers, optical coating partner, is offering a portfolio of patterning technologies for producing high-grade optical components. Depending on the application, patterning techniques such as photolithography, laser ablation, or masked coatings are available.

Beside the core business of coating optical thin film components, Optics Balzers also offers additional processing steps such as patterning of optical components. Most patterning solutions are used in conjunction with the sputter technology developed by Optics Balzers.

Photolithography capabilities such as wet etching, reactive ion etching, and lift-off techniques allow the manufacture of high-precision patterned coatings and gratings in the submicron range. Photolithographic techniques are specifically applied in the production of lids for micro electromechanical systems (MEMS) elements and CCD/CMOS image sensors. This method enables pattern sizes smaller than 10 microns to be produced.

Laser ablation offers novel options for patterning optical filter coatings. Through the application of customized processes high-precision patterns can be generated on the coated components. Laser ablation provides flexibility in producing customized shapes and patterns as well as very short processing times. It is possible to manufacture patterned filters down to a minimum pattern size of 100 microns by means of this technology.

Metal masks fixed to the substrates generate patterns during the coating process. The achievable pattern size and shape that this technology allows is limited, with the minimum size being around 200 microns. The advantage of the masked coating technique is that patterning can be applied with almost any coating process and material, including processes requiring high temperatures.

Together with its subsidiary in Jena, Optics Balzers supplies optical coatings and components. More information is available at www.opticsbalzers.com.

May 6, 2011 – PRNewswire — STMicroelectronics (NYSE: STM), micro electromechanical systems (MEMS) supplier, launched a complete hardware solution for advanced sensing applications with 10 degrees of freedom (DoF). A set of 3 thin, high-performance MEMS sensors provides accurate and comprehensive information on linear, angular, and magnetic motion together with altitude readings, enabling enhanced navigation and smarter user interface in mobile phones and other portable consumer devices.

An emerging new class of mobile consumer applications, such as location-based services and pedestrian dead-reckoning for indoor and multi-floor navigation, require rather complex sensing capabilities. By using three ST MEMS sensors — a geo-magnetic module, a gyroscope, and a pressure sensor — a consumer device can have a complete indication of its linear acceleration, angular velocity, earth gravity, heading and altitude. With this information, mobile users will be able to identify their direction and precise location in all three dimensions everywhere they go, including in places with no or low GPS signal: inside buildings in urban canyons, or in mountainous and forested terrain.

Facilitating the fusion of complex motion-sensor data in smart consumer devices, ST has also recently introduced an advanced filtering and predictive software engine, which integrates the outputs from 3-axis accelerometers, gyroscopes and magnetic sensors. Fusing these sensors’ data through sophisticated algorithms, the iNEMO Engine delivers more accurate and reliable sensor performance.

"Multi-sensor capabilities enhance the mobile user experience with previously unseen realism and accuracy in next-generation motion- and location-based applications," said Benedetto Vigna, group VP and GM of ST’s MEMS, Sensors and High Performance Analog Division.

Designed and produced using the same micromachining technology process that the company applies to its more than 1.2 billion sensors, ST’s MEMS chips boast ultra-small size and minimized current consumption coupled with superior accuracy and reliability. The three-chip 10-DoF sensor solution comprises the following components:

  • The LSM303DLHC geo-magnetic module integrates high-resolution, three-axis sensing of linear and magnetic motion in a 3 x 5 x 1mm package, with operating current consumption as low as 110 microamps. The device delivers extremely accurate output across full-scale extended ranges up to +16g (linear acceleration) and +8 Gauss (magnetic field), with excellent stability over time and temperature.  In addition to that, it comes with a host of advanced features, including 4D/6D orientation detection and two programmable interrupt signals that enable immediate notification of motion detection, free fall and other conditions.
  • Housed inside a 4 x 4 x 1mm package, the L3G4200D 3-axis digital gyroscope provides state-of–the-art performance in terms of output accuracy and stability over temperature and time. The device couples a 16-bit data output with a wide set of user-programmable full-scale ranges from +250dps up to +2000dps. An embedded FIFO (first-in first-out) memory block removes the need for continuous communication of between the sensor and the host processor, decreasing dramatically the overall power consumption.
  • ST’s soon-to-be-announced silicon pressure sensor uses an innovative technology to provide extremely high resolution measurements of pressure — and therefore also of altitude — in a 3 x 3 x 1mm package. The device has an operating pressure range of 260-1260 millibars, corresponding to the atmospheric pressures between -700 and +10000m relative to sea level, and can detect height variations as small as 0.3m.

ST’s 10-DoF sensor solution is now available for evaluation, with mass production scheduled for the end of Q3 2011.

STMicroelectronics creates innovative semiconductor solutions for multimedia convergence and power applications. For further information on ST’s MEMS solutions, go to www.st.com/mems.

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May 5, 2011Crystals and MEMS are used in electronic components as the basis of oscillators. Both are popular in consumer electronics devices like smartphones. Crystal growth was significantly interupted by the major March 11 earthquake off the coast of Sendai, Japan. MEMS, on the other hand, seem to have escaped the disaster largely unscathed, show 2 new reports from IHS iSuppli.

"Numerous Japanese crystal products are manufactured in factories located near the epicenter of the earthquake or are situated close to the coastal regions impacted by the tsunami," Rick Pierson, senior analyst for CPT and semiconductors at IHS, said. Most MEMS fabs and foundries are located in southern Honshu, away from the disaster-devastated northern section of the island, noted Jérémie Bouchaud, director and principal analyst for MEMS at IHS. Moreover, MEMS and compass suppliers had been employing multiple fabrication plants for manufacturing before the quake and tsunami occurred, reducing the impact of supply disruptions caused by damage to a specific factory.

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  6 2010 7 2010 8 2010 9 2010 10 2010 11 2010 12 2010 1 2011 2 2011 3 2011 4 2011 Q3 2011 Q4 2011
KHz and MHz Crystals 13 14 10 10 9 9 9 8 8 8 12 12 10

Disruptions spurred by the Japan earthquake and tsunami caused shipments of crystals to be delayed by four weeks in April compared to March, impacting the supply of a critical component employed in products including cell phones and PCs, new IHS iSuppli research indicates. The average lead time for megahertz and kilohertz crystals rose to 12 weeks in April, up 50% from eight weeks in March (figure). Unusually long lead times can lead to delivery delays and short supplies, which could threaten price increases.

"Because Japan is the world’s leading producer of crystals — major suppliers include Epson, NDK and Citizen — the quake crisis will cause pricing for crystals from major Japanese suppliers to climb during the next few weeks," said Rick Pierson.

Among the facilities damaged in the disaster is a supplier’s location in northern Japan that produces crystals for oscillator products. Damage was also sustained by two oscillator suppliers in Fukurawa and Kanagawa, as well as at NDK, which produces crystal oscillator products in its Furukawa, Osaki-city manufacturing site.

On a positive note, status reports from one leading manufacturer of quartz crystals and oscillators that are sold in cylindrical, plastic, metal and ceramic packages show production has restarted at that manufacturer’s Yamanashi, Funehiki-cho, Tamura-shi and Fukushima-ken plants. However, aftershocks and recurring disruptions to the local power grid continue to delay the resumption of normal operations.

For the MEMS industry in general and for Japan’s MEMS sector in particular, the damage was not as severe as initially feared due to a fortuitous accident of geography.  Bouchaud pointed out.

Only three of the 22 most important MEMS and compass fabrication plants in Japan suffered direct damage, IHS iSuppli research shows, although 19 fabs potentially could be affected by the same logistical and power issues impacting all Japanese industries in the calamity’s aftermath. The three damaged facilities belonged to Freescale, Canon Corp. and Texas Instruments (map) pinpointing the location of MEMS and digital compass fabrication facilities throughout Japan.

Click to Enlarge

According to Freescale, the company has decided to close its 150mm fab in Sendai, near the quake’s epicenter, and focus efforts on accelerating the transfer of MEMS production to its 200mm Oak III fab in Texas. Freescale was lucky in that the Sendai fab had been scheduled for shutdown by the end of 2011, and the company already had built buffer inventories. Had it not made this decision in 2009, Freescale and its customers would have been severely hurt, IHS believes.

For Canon, which makes printers and MEMS print heads in the city of Fukushima, site of the nuclear meltdown, production was halted after significant damage to the company’s plant. However, Canon managed to repair the damage very quickly, with the plant completely operational again by the first week of April. As a result, the impact of the disaster on Canon’s MEMS revenue for 2011 is expected to be very modest, IHS iSuppli data indicate.

For its part, Texas Instruments’ Miho fab northeast of Tokyo has undergone the repair of various infrastructure systems for water, gases and chemicals. Full production will resume by the middle of July, with full shipment capacity to commence before September, the company said. Prior to the catastrophe, Texas Instruments already was using multiple fabs for the fabrication of CMOS wafers for DLP MEMS chips, and the company is in a fortunate position to rapidly increase production at its other fabs to compensate for the disruption at Miho.

To learn more about this topic, see the new IHS iSuppli report: The Japanese Disaster and Its Impact on the MEMS and Compass Industry

Also read: MEMS producers in Japan: Facility updates after earthquake