Lithography

LITHOGRAPHY ARTICLES



Nikon opening worldwide training center

02/05/2004  February 5, 2004 - Nikon Corp. is building a $70 million worldwide training center in the US, following entrenched efforts from rivals ASML and Canon.

Customer-focused small tech companies were rewarded in '03

02/05/2004  Small tech accounted for 4.9 percent of the $4.9 billion in venture capital invested in the United States during the fourth quarter. Typical for the year was the experience of Kionix Inc., which managed to raise VC funds by focusing on market opportunity rather than sexy technology. Not surprisingly, California dominated the states list, with 10 deals worth $69.6 million in Q4.

Nikon to build worldwide training center

02/04/2004  FEB. 4--BELMONT, Calif.--Nikon Corp. says it will build a new worldwide training center here to meet the growing demand for training from English-speaking countries around the world.

Ultratech posts Q4, year-end profit

02/04/2004  Ultratech Inc. (Quote, News, Web) http://www.ultratech.com, a San Jose, Calif., developer of lithography tools for semiconductor and nanotechnology device fabrication, reported fourth quarter earnings of $3.3 million, or 13 cents per share, compared to a $2.4 million loss in the fourth quarter of 2002. Revenue was $26.8 million, up from $20.7 million in the year-earlier period.

Toshiba, Synopsys pair for chip design

02/03/2004  February 3, 2004 - Toshiba Semiconductor Company has licensed phase-shift mask technology from Synopsys Inc., Mountain View, CA, to help it ramp to volume production of 65nm process chips.

Unitive chooses SUSS lithography equipment to develop next-generation packaging

02/03/2004  (February 3, 2004) Munich, Germany—Unitive has selected SUSS lithography equipment to develop next-generation packaging processes. The equipment installation and process development will take place at Unitive's facility in Research Triangle Park, North Carolina.

Coatings company wants consumers to look for the U-Right label

01/29/2004  Raymond Chui of U-Right International wants consumers to think of Texcote when they think of stain-repellent fabrics – the same way that soda refers to Coca-Cola. But U-Right might have to settle for being Pepsi, since Nano-Tex is already entrenched in U.S. markets. The garment industry is one of the first consumer markets in which nanotechnology has taken off, and the battle for shares seems to be taking a page from the cola wars – where similar products depend on branding.

Self-assembly technique shines even if flash device was for show

01/28/2004  Chances are, consumers will never see IBM’s nanocrystal flash memory on the marketplace. But the self-assembly technique used for making the nanocrystals could become a cornerstone in Big Blue’s future miniaturized components. IBM uses a technique that allows polymers to self-assemble into a honeycomb pattern with holes as small as 20 nanometers.

Intel opens wallet for EUV litho

01/26/2004  January 26, 2004 - Intel Corp., Santa Clara, CA, will invest $20 million over three years in Cymer Inc., San Diego, CA, to help develop extreme-ultraviolet (EUV) lithography.

IMEC, ASML extend litho pact to 193nm

01/21/2004  January 21, 2004 - ASML and European research center IMEC have extended their collaboration on immersion lithography with the planned launch of an industrial affiliation program for 193nm liquid immersion lithography.

Report: Bad schools threaten California's nanotech dominance

01/21/2004  California’s inability to produce a technically skilled work force compromises the state’s standing as a leader in nanotechnology, according to a state-sponsored report released today. But the problem lies as much with state legislators as with its beleaguered public education system, particularly if lawmakers see school cuts as a quick-fix solution to the state’s budget crisis, proponents said.

Dow takes aim at 193nm litho

01/20/2004  January 20, 2004 - Dow Corning, Midland, MI, has unveiled new lithographic materials for use in developing 193nm photoresists and anti-reflective coatings used in 65nm processes.

Molecular memory not a dream as ZettaCore attracts real money

01/20/2004  Your cell phone, like an increasing number of electronic devices, constantly drinks electricity to maintain its memory. If you could somehow get it to sip instead of gulp, you might get a week from the battery instead of a day. That's one potential benefit of technology under development at ZettaCore, which is expected to announce today that a venerated venture capital firm has taken an equity stake.

Nikon aims for EUVL in '04

01/14/2004  January 14, 2004 - Nikon Corp., Tokyo, Japan, plans to start full-scale production of extreme ultraviolet (EUV) lithography systems this year, with a planned launch in 2006 for use with 45nm and 32nm chips.

SUSS sells nano tool to Taiwanese R&D center

01/14/2004  SUSS MicroTec AG News, Web has sold a stepper system to a Taiwanese organization for nanoscale research and development, according to a news release.

Hitachi set to plant its own 'nanostamp' on the medical market

12/30/2003  Hitachi's Advanced Research Laboratory is getting ready to commercialize a low-cost "nanostamp" technology for medical applications. The company's process creates "nanopillars" with extremely high aspect ratios (narrow relative to height), a feature that the company believes will prove useful for biochips.

Nanotech instruments and tools to reach $700 million by 2008

12/22/2003  (December 22, 2003) Norwalk, Conn.— A soon-to-be-released report from Business Communications Company Inc., entitled "RGB-283 Tools and Instrumentation for Nanotechnology," reports that the worldwide market for nanotechnology instruments and tools is estimated at $199.2 million in 2003. Expected to grow at an average annual growth rate (AAGR) of 28.6 percent, this market is expected to cross $700 million by 2008.

Transfer agreement speeds up cleanroom construction

12/22/2003  DEC. 22--TAIWAN--Color filter maker Allied Material Technology Corporation (AMTC) has signed a polarizer technology transfer agreement with South Korea-based LG Chemical, according to company chairman Charles Yu.

ASML MaskTools, Photronics forge alliance

12/17/2003  December 17, 2003 - ASML MaskTools, Santa Clara, CA, a subsidiary of Netherlands-based ASML, and Photronics Inc., Brookfield, CT, have agreed to co-develop a maskmaking infrastructure for ASML MaskTools' CPL technology, a technique that enables low-k lithography.

JMAR achieves sub-100nm litho

12/12/2003  December 12, 2003 - JMAR Technologies, San Diego, CA, says its has achieved sub-100nm imaging using its collimated plasma lithography has x-ray source and wafer exposure system.




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The semiconductor industry is an acknowledged global leader in promoting environmental sustainability in the design, manufacture, and use of its products, as well as the health and safety of its operations and impacts on workers in semiconductor facilities (fabs). We will examine trends and concerns related to emissions, chemical use, energy consumption and worker safety and health.

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As the industry moves to 10nm and 7nm nodes, advances in wafer processing – etch, deposition, planarization, implant, cleaning, annealing, epitaxy among others – will be required. Manufacturers are looking for new solutions for sustained strain engineering, FinFETs, FDSOI and multi-gate technologies, 3D NAND, and high mobility transistors.

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