Semiconductors

SEMICONDUCTORS ARTICLES



Nanometrics WLP bonding metrology tool launches with logic order

02/24/2011 

The Unifire 7900IR provides 3D inspection of wafer-scale packaging features as well as registration for wafer-to-wafer bonding applications for use in advanced wafer scale packaging process control.

Si-wafer-double-side-lapping-system-upgrades-Novellus-Peter-Wolters

02/24/2011 

Peter Wolters lapping systemNovellus Systems subsidiary Peter Wolters GmbH introduced a new version of its microLine double side lapping system for prime silicon wafers. The AC-2100L system features independently driven inner and outer pin rings, automatic force calibration, and in-situ wafer thickness metrology.

USHIO brings NIL ashing system to US market

02/23/2011 

USHIO develops and begins marketing nano-imprint VUV ashing system "CHIPs" (Photo: Business Wire)USHIO America will start marketing the nano-imprint vacuum ultra violet (VUV) ashing system "CHIPs (Compact HiPower System)" in the US. Incorporated into nano-imprint lithography (NIL) equipment, the CHIPs allows non-contact and damage-free cleaning, surface improvement, and ashing of templates and workpieces.

E beam litho etch make identical quantum dots

02/23/2011 

quantum dots. SOURCE: NISTWith electron beam lithography and etching, quantum dot size and position can be controlled and replicated. Tests at the NIST confirm that these etched quantum dots emit single particles of light, boosting prospects for powering new types of devices for quantum communications.

300mm bonder will demo chip to wafer direct metallic bonding tech developed at Leti

02/22/2011 

CEA-Leti, in a multi-partner project with SET, STMicroelectronics, ALES and CNRS-CEMES, will demonstrate high-alignment-accuracy chip-to-wafer structures made by direct metallic bonding. Such structures are required for high-performance 3D ICs, and possibly microelectronics, optoelectronics, or MEMS.

Implantable mm scale computing self referencing antenna U Michigan

02/22/2011 

Photo: Designed for use in an implantable eye-pressure monitor, University of Michigan researchers developed what is believed to be the first complete millimeter-scale computing system. Credit: Greg Chen.A prototype implantable eye pressure monitor for glaucoma patients is believed to contain the first complete millimeter-scale computing system. And a compact radio that needs no tuning to find the right frequency could be a key enabler to organizing millimeter-scale systems into wireless sensor networks.

SICAS 4Q10 data: Output lags capacity, utilization dips

02/22/2011 

Wafer capacity rose about twice as fast as output in the 2010 calendar year-ending quarter, so utilization rates pulled back slightly -- but one sector showed surprising strength.

Researchers tweak graphene FET for nonvolatile memory

02/21/2011 

Adding a SiO2 dielectric gate to a graphene FET device opens the door for its use in nonvolatile memory, say researchers from Singapore's Agency for Science, Technology, and Research (A*STAR).

Veeco GaN MOCVD tool debut

02/17/2011 

Veeco's TurboDisc MaxBright MOCVD, LED TV penetration Veeco Instruments' new TurboDisc MaxBright GaN MOCVD multi-reactor system is poised to take advantage of what the company believes is an accelerated rate of LED TV penetration. The new system targets manufacturing of HB-LEDs and is capable of single- or multi-chamber layer growth.

IBM tops 2010 patents list again

02/17/2011 

IBM said that its inventors received a record 5896 US patents in 2010, marking the 18th consecutive year it has topped the list of the world's most inventive companies, and the first time a company has received >5000 patents in one year in the US.

Taiwan DRAM consolidation take 2: Elpida pulls in Powerchip, ProMOS

02/17/2011 

Finally feeling the heat of price whipsaws (or withering stare of inevitability), Taiwan DRAM players seem ready to embrace tie-ups with Japan's Elpida Memory.

Samsung grew DRAM lead in Q4, says IHS iSuppli

02/16/2011 

Samsung Electronics Co. Ltd. grew its already commanding share of the dynamic random access memory (DRAM) market in the fourth quarter of 2010, according to new IHS iSuppli research. Shifts in DRAM market share will occur in 2011, IHS believes.

STATS ChipPAC launches flip chip packaging for advanced silicon nodes

02/16/2011 

STATS ChipPAC launched fcCuBE technology, an advanced flip chip packaging technology that features copper (Cu) column bumps, bond-on-lead (BOL) interconnection and enhanced assembly processes. STATS ChipPAC claims the flip chip package is cost-comprable to standard packaging processes, and compatible with shrinking semiconductor device nodes down to 28nm.

Camtek logs CMOS image sensor inspection unit orders

02/15/2011 

Camtek Ltd. (Nasdaq:CAMT; TASE:CAMT) received an order for multiple wafer inspection systems from one of the world's largest manufacturers of CMOS image sensors (CIS).

Intel Capital leads InVisage Series C venture funding

02/15/2011 

InVisage pixel capture as compared to traditional image sensors.InVisage Technologies, image sensor technology start-up, received its series C round of venture funding, led by Intel Capital. The undisclosed amount will be used to bring the company's quantum-dot-based QuantumFilm technology and products into mass production.

Wafer shipments surge in 2010, sales still catching up

02/15/2011 

Global wafer shipments and revenues rebounded strongly in 2010, according to updated data from SEMI's Silicon Manufacturers Group (SMG) -- but one is at record levels while the other lags behind.

Keithley Avoid wafer test probe set up cabling errors

02/14/2011 

Dave Rose, Keithley Instruments, addresses specific cabling techniques for DC, multi-frequency capacitance, and ultra-fast I-V and pulse testing, as well as the importance of proper grounding and shielding, choosing the proper interconnect for a specific measurement, and troubleshooting common interconnect problems.

SOI Consortium unveils FDSOI results

02/14/2011 

FDSOI, Horacio MendezHoracio Mendez, executive director of the SOI Industry Consortium, discusses how planar FD-SOI technology enables substantial improvements in performance and power consumption. The SOI Industry Consortium recently announced results of an assessment and characterization of FDSOI, based on the ARM Cortex processor as a prototyping vehicle.

Tunable nano ribbons form future nanoelectronics spintronics devices

02/14/2011 

Topological insulators act as both insulators and conductors, with their interior preventing the flow of electrical currents while their edges or surfaces allow the movement of a charge. Surface conduction channels in BiTe topological insulator nano ribbons are tunable, according to new research from UCLA and Australia's U of Queensland.

ETH Zurich adds Vistec EBPG5200 to nanotechnology center

02/11/2011 

Vistec Lithography Inc received an order from the ETH Zurich (Swiss Federal Institute of Technology) for one of its Vistec EBPG5200 electron-beam lithography systems. The Vistec EBPG5200 will be installed in the new Nanotechnology Center, which is a public/private partnership between IBM Research - Zurich and ETH Zurich.




WEBCASTS



Environment, Safety & Health

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The semiconductor industry is an acknowledged global leader in promoting environmental sustainability in the design, manufacture, and use of its products, as well as the health and safety of its operations and impacts on workers in semiconductor facilities (fabs). We will examine trends and concerns related to emissions, chemical use, energy consumption and worker safety and health.

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Wafer Processing

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As the industry moves to 10nm and 7nm nodes, advances in wafer processing – etch, deposition, planarization, implant, cleaning, annealing, epitaxy among others – will be required. Manufacturers are looking for new solutions for sustained strain engineering, FinFETs, FDSOI and multi-gate technologies, 3D NAND, and high mobility transistors.

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