Tag Archives: New Products

MKS Instruments, Inc., a global provider of technologies that enable advanced processes and improve productivity, has introduced the I-250, I-500 and I-1000 Mass Flow Controllers. These products extend MKS’ I-Series full scale flow rate capabilities to 250, 500 and 1000 slm, respectively, and provide mass flow control for large scale production processes such as in Biopharm, Heat Treatment and Spray Coating. Available as both MFCs and MFMs, the IP66-rated I-250, I-500 and I-1000 are reliable, cost effective solutions for today’s most rigorous industrial applications. Simultaneous to this release, MKS is also releasing a G-Series version of the 250 slm product, the G-250.

The I-250, I-500 and I-1000 incorporate the latest digital mass flow control electronics; a proven, patented thermal sensor and mechanical design provide 1% of setpoint accuracy and precise control for full scale flow rates from 100 to 250 slm (I-250), 250 to 500 slm (I-500) and 500 to 1000 slm (I-1000). Multi-gas/multi-range capability is enabled through the onboard Ethernet interface and allows the user to change the gas and range of the instrument, reducing inventory requirements. The I-250, I-500 and I-1000 also feature the ability to convert flow measurements to the user’s unit of choice (e.g., slm, scfh, kg/hr.).

With the release of these products, the MKS I-Series mass flow products now provide customers with flow rate control capabilities extending from less than 1 sccm up to 1000 slm. Designed for use in harsh environments where resistance to liquid or dust ingress is essential, these elastomer-sealed instruments are available with analog I/O (0 to 5 VDC or 4 to 20 mA), with digital I/O soon to follow.

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TMC, a developer of high-performance vibration and motion cancellation technology, has introduced Stage-Base 450, its next generation of frame-mountable, active vibration and motion cancellation systems designed to control building floor vibration in semiconductor facilities, while increasing wafer-processing throughput.

TMC is the first and only solutions provider to integrate unique serial-type architecture with voice coil technology into a system for aggressive moving-stage motion cancellation. Its Stage-Base 450 system is specifically designed to be the primary vibration cancellation system for semiconductor tools that incorporate high-precision motorized X-Y stages.

While such tools require extremely efficient vibration isolation, they just as critically require that payload motion induced by the moving stage settle very quickly to maximize tool throughput. By adding voice coil motor technology to TMC’s highly advanced STACIS system, Stage-Base 450 (patent pending) provides a 4x improvement in settling time over TMC’s previous generation STACIS® iX Stage-Base.

“TMC continues to apply the latest technological advances in developing new solutions for the challenging demands that semiconductor tools place on their vibration isolation systems. Stage-Base 450, with STACIS inside, is truly unique in our industry,”  states Wes Wigglesworth, TMC Product Manager, Active Systems.

“This is the only commercial solution that provides active floor vibration cancellation starting at 0.6Hz increasing to a 10-to-1 reduction by 2Hz with voice coil technology in a compact, reliable system to dramatically reduce the impact of stage motion on wafer processing,” he adds.

Like its predecessor, Stage-Base 450 incorporates TMC’s unique STACIS technology. The serial-type architecture of STACIS allows TMC to use a very stiff spring to support the payload. This is very desirable due to the much lower initial deflection in response to stage forces compared to softer springs. The proven piezoelectric active cancellation technology in STACIS delivers vibration cancellation starting at the lowest frequency commercially available.

With the addition of optional voice coil motors with feed-forward control for even faster settling time, Stage-Base 450 is the most advanced active vibration- and motion-cancellation system available for tools with moving stages.

TMC designs and manufactures precision vibration isolation systems for sensitive research and manufacturing processes worldwide. The Company’s ISO 9001:2008-certified products include active and passive vibration isolation systems; optical tops, optical table systems, and breadboards; laboratory tables and table top platforms; floor platforms; magnetic field cancellation and electric field shielding systems; and acoustic enclosures.

TMC is a unit of AMETEK Ultra Precision Technologies, a pioneer in the development of ultra-precision measurement instruments and a global leader in ultra-precise machine tools and manufacturing systems for the semiconductor, photovoltaic, nanotechnology, military, defense and ophthalmic lens markets.

AMETEK Ultra Precision Technologies is a division of AMETEK, Inc., a global manufacturer of electronic instruments and electromechanical devices with annual sales of $4.0 billion.

voice coil

Entegris, Inc. announced the latest addition to its IntelliGen family of two-stage dispense technologies used in microelectronics manufacturing processes. The IntelliGen MV extends upon the proven performance of the IntelliGen Mini and HV dispense systems with a solution optimized for 3D and MEMS applications, enabling high-purity filtration and repeatable dispense of mid-viscosity fluids.

“With the growth of 3D IC technology and MEMS, manufacturers are requiring a higher level of throughput and greater filtration capabilities to meet their unique process demands,” said Entegris Chief Operating Officer, Todd Edlund.  “Each application requires an intensive focus on real-time, interactive diagnostics and feedback. The IntelliGen MV provides several new diagnostic and detection features to reduce defects, simplify recipe programming and improve filter priming.”

The IntelliGen MV Dispense System’s compact design allows manufactures to install multiple dispense systems into a single track with the ability to process several chemistries simultaneously and maximize filter performance even in the most sensitive photochemicals between 100 and 300 centipoise.

The IntelliGen MV Dispense System and other Entegris contamination control and substrate handling solutions will be featured at the SEMICON® Korea 2015 tradeshow, which is being held at COEX exhibition center in Seoul, Korea from February 4 through 6, 2015.

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HAM-LET, a global manufacturer of instrumentation valves and fittings for industrial and high purity fluid and gas delivery systems is showcasing its Ultra Fast (UF series) Diaphragm Valve for Atomic Layer Deposition at Semicon Korea in Seoul, during 4-6 February, booth no.2878.

“Our UF series unique flow adjustment mechanism, patent pending no. US 61/910,79, allows for precise flow adjustment and stable flow capacity during rapid high cycle operation,” said Mr. Felix Shestatski, Vice President of Quality, Engineering and R&D at HAM-LET.

The optional extended bonnet and cooling fin provide a superb solution when precise and repeatable performance in high-temperature applications is required. The UF series offers superior sealing performance and remarkable durability in hazardous environments, under severe demands of ultra fast actuation at ultra high purity (UHP) applications.

“Another advantage of our UF diaphragm valve is its outstanding durability and low maintenance, as it offers over 100 million life cycles.

The UF series meets the demand for high-precision diaphragm valves that can perform  repeatable and reproducible performance over an extremely frequent and large number of cycles, required by ALD applications. In addition, the UF series offers a wide range of applicable accessories, such as: position indicators, direct mounted solenoid valves (for actuation speed optimization), integrated thermocouples, heaters and more” said Shestatski.

HAM-LET has received purchase orders of UF series by one of the strongest equipment manufacturer for Samsung. In addition, HAM-LET developed a special high temperature fully immersed version of UF valve for 120°C, enabling position indication and with special inductive sensor designator. The UF series is available in surface mount (IGS) and in-line type of connections, 2-way and multiport configurations.

HAM-LET will showcase a live demonstration of the UF series at Semicon Korea 2015, booth no. 2878, as well as exhibit its advanced actuated ball valves, Let-Lok fittings, process valves and HTC fittings, which are available in Korea through HAM-LET’s distributer, PFK.

UF Diaphragm Valve for for ALD Applications

Ultratech, Inc., a supplier of ALD systems, as well as lithography, laser-processing and inspection systems used to manufacture semiconductor devices and high-brightness LEDs (HB-LEDs), today introduced the Ultratech Cambridge NanoTech Savannah G2 atomic layer deposition (ALD) system. Since its introduction in 2004, the Savannah product line has become the industry-leading commercial ALD system used for research and development activities.

The Savannah G2 platform incorporates a wide range of advanced field-upgradable options intended to aid serious researchers in expanding their portfolio of available ALD films, as well as allow them to characterize the films in real time. Among the Savannah G2’s array of options, a unique low vapor precursor delivery system has been developed to enable the growth of novel materials including single- and multi-component films from Perovskite, Yttrium, Lithium, and the rare earth families. Additional options such as ellipsometry, Quartz Crystal Microbalance (QCM), and mass spectrometry allow for the simultaneous growth of ALD films and the real-time characterization of the deposition process, all of which are indispensible capabilities for process development and optimization activities.

Ultratech Cambridge NanoTech Vice President of Research and Engineering Ganesh Sundaram noted, “With 400 ALD systems in the field, Ultratech Cambridge NanoTech’s tools have been used in over 800 published papers in peer-reviewed journals. As a result, universities and government institutions, as well as corporate research and development centers, are using our ALD systems to break ground on some of the most interesting applications for thin film use. Today, the Savannah G2 system represents a highly extendable ALD platform, engineered to meet the needs of both routine and extremely challenging ALD thin-film research and development for today’s and tomorrow’s requirements.”

Dynaloy unveils safer cleaners


November 19, 2014

In response to evolving industry trends and customer preferences for products with better environmental, health, and safety (EHS) profiles, Dynaloy LLC is launching three new formulated products that offer exceptional performance without the use of certain chemicals, while continuing to offer its line of traditional cleaners.

“We understand concerns in the industry about some formulations. That’s why we’ve developed products that have the same or better functional capability but none of the chemicals that raise EHS concerns. For customers who prefer conventional cleaners, we still provide a robust selection of those products as well,” said Diane Scheele, Dynaloy business manager.

The newly released Dynastrip DL9150 is a non-TMAH containing multi-purpose photoresist and post-etch residue remover. With outstanding cleaning and metal compatibility, this product raises the bar for achieving environmental, health, and safety compliance while also performing as well as comparable products that contain TMAH.

With the release of Dynastrip DL9240, it’s possible to remove tough photoresists and residue materials without the use of N-methylpyrrolidinone (NMP), a solvent. Dynast rip DL9240 shows excellent compatibility with dielectric materials while cleaning hard-to-remove photoresist in advanced packaging applications.

The third product is Dynastrip DL9005. Used for high density solder cleaning applications, this product is formulated for customers who have concerns about meeting improved waste-related guidelines. It does not contain a common photoresist stripping solvent, dimethylsulfoxide (DMSO). DMSO is a solvent that may cause nuisance odors in waste stream abatement systems.

These new Dynaloy products combine superior performance with EHS-advantaged profiles to allow companies around the world to address existing and emerging EHS concerns and regulations.

Entegris, Inc. today announced a new product for its VaporSorb line of airborne molecular contamination (AMC) filters. The new filter was created as an “all-in-one,” single-filter solution for capturing critical AMC in the chemical mechanical planarization process, or CMP, in semiconductor manufacturing. VaporSorb, which is a leading brand of filter used in cleanroom environments and for process tools during key steps in manufacturing, is the first such filter available for CMP process tools that protects against weak acids as well as other contaminants.

The new filter was designed specifically for CMP tools to provide balanced lifetimes for all critical AMC in a single filter which avoids the complexities of multi-filter handling. In addition, the filter retains the VaporSorb brand’s industry-leading service life to reduce both tool downtime and cost of ownership.

“Yield concerns in the CMP process, just as in the photolithography process, can be addressed by providing complete AMC protection. This means protecting against weak acids, as well as strong acids and other contaminants,” stated Entegris Product Marketing Manager for AMC Filtration Solutions, Marc Venet. “With VaporSorb CMP, we have a single solution that completely addresses AMC-induced corrosion defects in CMP processes.”

Examples of weak acids include acetic and formic acids (acetate; CH3COO– and formate; HCOO–) and nitrous acid (nitrite; NO2–). Strong acids include HNO3, SO2, H2SO4 and HCl. These contaminants are causing concerns regarding defects and yield in CMP processes.

In July, the company launched the industry’s first “four-in-one” filter, the VaporSorb TRK for photolithography tools, to capture airborne organics, bases, strong acids and weak acids. VaporSorb filters use Entegris’ own unique mix of materials to capture airborne molecular contaminants, which are tailored to create application- and fab-specific filter solutions.

EV Group (EVG), a supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today introduced its SmartNIL large-area nanoimprint lithography (NIL) process. Available on all EV Group NIL platforms, including mask aligners as well as the industry benchmark EVG 720 and newly available EVG 7200 UV-NIL systems, SmartNIL provides a low-cost, large-area and high-volume-manufacturing solution for a variety of advanced devices, including:

  • Photonic-based devices such as light-emitting diodes (LEDs), lasers and photovoltaics
  • Micro arrays and nano-devices for medical devices and bioengineered applications
  • Advanced storage media, including newly emerging forms of non-volatile memory (NVM)

“SmartNIL is built on more than 15 years of NIL experience at EVG that includes the largest installed base of NIL systems worldwide, and is the only NIL technology currently used in high-volume manufacturing on substrates up to 200 mm today,” stated Paul Lindner, executive technology director at EV Group. “With our new EVG7200 UV-NIL system, which has industry-leading resolution down to 20 nm in volume production, EVG brings the advanced soft stamp and imprint capability of SmartNIL to larger substrates and smaller geometries. This enables our customers to achieve even greater cost-of-ownership (CoO) benefits and realize the full manufacturing potential of nanoimprint lithography.”

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SEMI-GAS Systems, a provider of ultra-high purity gas delivery equipment, recently broadened the capabilities of its custom Xturion Blixer gas blender product line. The new options include system auto-purging and a dynamic stream gas analyzer to facilitate the blending of highly corrosive gases into gas mixtures, as needed in semiconductor and microelectronics fabrication processes.

Based on a preset component ratio, Blixer receives regulated process gases from two or more independent gas sources and blends them to the desired composition in the system’s on-board accumulator tank. The system then draws from the accumulator tank and delivers the uniform gas mixture through the process gas outlet to a tool or gas distribution manifold.

To oversee all of these system operations, Blixer utilizes a SEMI-GAS GigaGuard PLC controller with an ergonomically front-mounted 8.0″ color touch screen. In addition, the PLC controller manages the electrical components and pneumatically actuated valves for process gas delivery and fully automated purging sequences.

Mass flow controllers regulate the volumes of component and balance gases to be blended according to the controller’s pre-programed blend recipe. Recipe percentages can be adjusted by the system’s operator through the touchscreen, allowing for on-site process modifications.

To ensure a highly accurate blend composition, the GigaGuard PLC works in conjunction with the system’s dynamic stream gas analyzer by continuously withdrawing a small sample from the accumulator tank. If the analyzer signifies the mixture is outside of the preset tolerance range, the system will automatically adjust the blend percentages to approach the set point value.

Should the system recognize an error, external system lights and audible alarms will commence, signaling operators of warnings and/or shutdown conditions. To provide emergency manual shutdown, an externally mounted UL-approved Emergency Off (EMO) push button is provided. Remote shutdown options are also available with an optional kit that can communicate via an Ethernet network, enabling centralized, facility-wide equipment monitoring and data collection.

Like all SEMI-GAS custom Xturion systems, each unit is user-configurable to accommodate application-specific flows, pressures, mixture percentages, and blending accuracies. Various analyzer configurations are also adjustable to precisely tailor the system’s operational needs for each application.

All Blixers meet SEMI S2 and Uniform Fire Code requirements and are equipped with UL-approved fire sprinklers, a 1/4″ high-impact polycarbonate plastic safety viewing shield, and gas identification labels. The standard enclosure is constructed of powder coated 11 gage cold rolled steel and is 87 inches tall, 40 inches wide and 28 inches deep, including an 8-inch exhaust collar for venting to the facility’s ducting.

Internal panel components are autogenously welded, helium leak tested and certified to the highest purity standards. All valves, regulators, transducers, tubing and fitting bodies are 316L stainless steel to prevent deterioration from the corrosive process gases and resulting mixtures.

SEMI-GAS Systems Gas Blender

Entegris, Inc., announced last week the launch of GateKeeper GPS, its next-generation of automated regeneration gas purification system (GPS) technology. Three new GPS gas series products for delivering on-site solutions have been developed on the GateKeeper platform and are now available for semiconductor, compound semiconductor and solar manufacturing processes. The GateKeeper GPS platform offers a variety of new benefits, including a new control system for increased process control performance and new options for gas monitoring.

Building on over a decade of experience, this 4th generation solution is designed to help lower operating costs while ensuring continuous uptime though the use of parallel purification and automated purifier regeneration. This eliminates the need to return a purifier for regeneration or install a replacement purifier, adding efficiency and improving system safety.

“The GateKeeper GPS family of gas purification systems sets new standards for process control in high-volume manufacturing,” said Product Marketing Manager Jeff Hermann of Entegris’ Gas Microcontaminantion Control business. “Customers asked for optimized system designs with more features in a smaller footprint, while reducing operating costs and increasing process control. We are excited to deliver GateKeeper GPS models that meet these requests.”

With an industry-leading, ultra-small footprint, the new GateKeeper GPS platform offers new system options, including gas monitoring features and an on-board back-up system. It also maintains ambient temperature operation which helps keep energy costs lower.

The GateKeeper GPS series (available in HX, DX, and Z2 series) are the first systems available in the new platform and offer a flow rate in the 20-60 meters-cubed/hour (m3/h) range.

The HX series delivers ultrapure hydrogen, nitrogen, or argon gas with output purity in the parts-per-trillion (ppt) levels, while removing contaminants such as H2O2 O2, CO, CO2, and non-methane hydrocarbons. HX series applications include Metal Organic Chemical Vapor Deposition (MOCVD), Atomic Layer Deposition (ALD) and Low Temperature Epitaxy (LTE).

The DX series can deliver ultrapure carbon dioxide (parts per trillion levels), which is required for advanced lithography tools – such as immersion argon-fluoride steppers – while removing contaminants such as acids and bases, refractory compounds, condensable and non condensable organics, and moisture.

The Z2 Series safely delivers XCDA (Extreme Clean Dry Air) purified purge gases to the most advanced scanner platforms, including dry and immersion-based lithography tools. This system removes contaminants such as acids and bases, refractory compounds, condensable organics, and moisture from CDA (compressed dry air) gas.