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WEBCASTS
 Environment, Safety & Health Date and time TBD The semiconductor industry is an acknowledged global leader in promoting environmental sustainability in the design, manufacture, and use of its products, as well as the health and safety of its operations and impacts on workers in semiconductor facilities (fabs). We will examine trends and concerns related to emissions, chemical use, energy consumption and worker safety and health.
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Wafer Processing Date and time TBD As the industry moves to 10nm and 7nm nodes, advances in wafer processing etch, deposition, planarization, implant, cleaning, annealing, epitaxy among others will be required. Manufacturers are looking for new solutions for sustained strain engineering, FinFETs, FDSOI and multi-gate technologies, 3D NAND, and high mobility transistors.
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Aki Fujimura, chairman & CEO of D2S, provides an update of the eBeam Initiative roadmap. Speaking at SPIE Advanced Lithography with editor Debra Vogler, Fujimura recalls mask cost/yield and write time developments, summarizes the eBeam Initiative's meeting, and describes member Dai-Nippon Printing's impressive time results with an "impossible" mask.
Applied Materials integrated Magma's CAD-based navigation and yield analysis software with AMAT inspection systems; it's called Excalibur Litho and targets designs at 2xnm and below. Ankush Oberai, Magma and Erez Paran, AMAT, explain why hot spot identification and real line data for libraries will fuel better lithography processes.
Carl Zeiss introduced a new production tool aimed to improve registration and overlay of advanced photomasks. RegC is based on ZEISS femtosecond-laser technology. RegC enables correction on high-end photomasks for remaining registration errors after the pattern generation process. Current results show registration improvements over 50% in advanced lithography.
The trend toward complex semiconductor devices is fueling demand for more advanced wafer probe cards capable of accurately and cost-effectively testing these ICs, says January Kister, Microprobe. Kister examines the variables that impact current carrying capability (CCC) during semiconductor wafer test, and describe an optimal probe design with a composite metal structure.
SoftJin Technologies, a provider of customized automation software for electronic design and manufacturing, enhanced NxDAT, its defect analysis software. The enhanced version of NxDAT is optimized for better speed and memory performance.
Custom fabricated sapphire wafer carriers that are uniform, parallel, and impervious to solvents and etchants for thinning semiconductor materials are available from Meller Optics Inc.
Novellus Systems subsidiary Peter Wolters GmbH introduced a new version of its microLine double side lapping system for prime silicon wafers. The AC-2100L system features independently driven inner and outer pin rings, automatic force calibration, and in-situ wafer thickness metrology.
Veeco Instruments' new TurboDisc MaxBright GaN MOCVD multi-reactor system is poised to take advantage of what the company believes is an accelerated rate of LED TV penetration. The new system targets manufacturing of HB-LEDs and is capable of single- or multi-chamber layer growth.