07/07/2005 AUSTIN, TX and SAN JOSE, CA -- (MARKET WIRE) -- 07/06/2005 -- Copper resistivity will remain a challenge for the semiconductor industry, but chip designers are likely to use hierarchical design workarounds to modify the metal for linewidths at the 45 nm technology node, according to participants at an industry workshop sponsored by SEMATECH and Novellus Systems, Inc. (NASDAQ: NVLS).
07/07/2005 TOKYO--(BUSINESS WIRE)--July 6, 2005--Tokyo Electron Limited (TEL) announced today that they will start accepting volume orders for their immersion process coater/developer CLEAN TRACK LITHIUS i+ in January 2006.
07/07/2005 SAN FRANCISCO, CA--/Pharmaceutical Technology/--Biotech giant Genentech (South San Francisco, CA) last week detailed its aggressive production plan and provided updates of its key manufacturing activities that reportedly will boost its capacity to run at nearly 100% for the next several years.
07/06/2005 July 6, 2005 - In the second quarter, Semiconductor Manufacturing International Corp. (SMIC) ran its capacity at an 86% rate, higher than the 84% recorded by foundry Taiwan Semiconductor Manufacturing Co., a Merrill Lynch & Co.'s study shows, according to Taiwan Economic News.
07/06/2005 July 6, 2005 - Soluris and CEA-Leti have announced that they have engaged a joint development program (JDP) involving Soluris' Yosemite SP-1000 CD-SEM to help characterize the sub-45nm logic technologies at CEA-Leti's new Minatec research facility in Grenoble, France.
07/06/2005 BILLERICA, Mass--July 5, 2005--Millipore Corporation (NYSE:MIL) today announced it has completed the acquisition of MicroSafe, B.V., for approximately $9.3M.
07/06/2005 July 06, 2005 - EV Group, a leading manufacturer of MEMS, nano and semiconductor wafer-processing equipment, announces the installation of an EVG620 precision alignment system for nanoimprint lithography (NIL) at Stanford Nanofabrication Facility (SNF) in Stanford, CA.
07/06/2005 TAMPA, FL, USA--05 July 2005--Three different sessions addressing Good Automated Manufacturing Practice (GAMP) issues will highlight ISPE's Chicago Training Series, scheduled for 22-25 August at the Eaglewood Conference Resort and Spa in Itasca, Illinois.
07/05/2005 By M. Yeh, S.-P. Fang, B.-J. Tsau, C.C. Huang, B. Lin, United Microelectronic Corp.; S. Fu, J. Chen, R. Freed, T. Dziura, M. Slessor, KLA-Tencor Corp.
This work evaluates the capability of a spectroscopic ellipsometry-based profile technology as a new metrology tool to monitor polysilicon gate processes at 130nm and 90nm nodes. This study proves that this method can consistently flag different profile excursions of polysilicon gate.
Narrowing process windows, emerging tools for statistical analysis of design, and model-based simulations of yield results may soon push designers to actually design for manufacturability, argued experts at Semi's Strategic Business Forum in Welches, OR, May 9-11.
07/05/2005 CLINTON TOWNSHIP, Mich.--(BUSINESS WIRE)--July 5, 2005--KUKA Robotics Corporation, a leading global manufacturer of industrial robots, today announced the introduction to the US market of a family of clean room robots specifically designed for flat panel display manufacturing and substrate glass handling.
