Category Archives: Semicon West

by Michael A. Fury, Techcet Group

Click to Enlarge July 12, 2011 – Another cold summer in San Francisco, another SEMICON West, brimming with the usual vital statistics: 1256 booths, up 10% over 2010; 712 exhibiting companies (up 24%) from 21 countries, of which 105 are new to this event. Among the equipment suppliers, 315 have brought equipment to demonstrate, an attribute that had been on the decline over the past several years. Over 30,000 people have pre-registered for the combined SEMICON and Intersolar events, though it is safe to assume that Intersolar is the steroid driving that number.

Having recognized the action in Moscone West, I elected to start my wanderings at Intersolar. Two impressions struck me immediately upon entering. First, there were displays set up in what was otherwise lobby and aisle space in previous events. Clearly, space was at a premium, and there was plenty of demand for it. The other impression is that the space is very European. I’m not talking about the kind of distribution of ethnicities that you see at SEMICON shows around the world — I’m talking about a distinct predominance of European languages and eyeglasses and haircuts. I found it striking, and can only attribute it to the very effective nature of government subsidies for solar technologies in Europe as compared to the US. Yes, of course, US and Asian companies were well represented, but they did not determine the ambience.

Navigation through the Intersolar aisles required a reasonable amount of care, though far short of that required to ride a Tokyo subway. The space around the Solyndra booth, however, was simply not navigable due to the throngs of people waiting to approach their representatives for a discussion. At least that why I think they were waiting; there didn’t seem to be any stupendous giveaway driving the crowd. I was glad to see eIQ Energy back at the show and apparently doing quite well. They manufacture power inverters for connecting panels of varying designs and power outputs, and doing so in parallel rather than series. Last year they appeared as a fledgling startup with big aspirations. This year, they appeared more confident and capable, much less tentative than before. I imagine the same can be said for many other companies on the floor.

But my comfort zone is still in the semiconductor halls, where I found it much easier to navigate, yet the crowds were respectable and the buzz was a level above my recollection of the past two years. My time on the floor was limited by my own private meetings and by the commencement of a new feature for 2011: a private symposium by CEA Leti of France. Multimedia convergence on mid-size devices like tablet PCs call for high performance at low VDD, which is the focus of Leti’s FDSOI program (fully-depleted silicon on insulator). These devices are built on an 8nm SOI film with raised source & drain and undoped channel. Migration from 28nm bulk transistors to 20nm FDSOI can enable a 50% power reduction at constant speed, or a 60% speed gain at 0.8VDD (35% gain at 1.0VDD).

3D integration is another program focus at Leti, as it is at so many other companies these days. Development and implementation of EDA methods for 3D TSV has made Grenoble a consortium center for design shops. Solder-free copper-on-copper direct bonding is one of the disruptive process concepts being developed in the program. Leti has launched a program called Open 3D to foster open access to 3D design and process integration technologies to accelerate industry implementation.

The Leti program on silicon photonics aspires to combine CMOS with photonics to leverage the cost effectiveness of CMOS integration with the high bandwidth demands that are presently limiting card-to-card and module-to-module data transfer. Since 2006, Leti has been operating a product prototyping collaboration with 60 commercial partners in the US and Canada, resulting in the release of over 150 products.

Another program focus at Leti is the creative use of electronics in the practice of medicine, moving us toward the notion of molecular medicine. The MEMS technology that is already integrated into cell phones and gaming handsets is being adapted to a variety of medical assignments. Direct brain-computer interfaces that were once relegated to science fiction are now being tested to allow a variety of tasks from guiding a wheelchair to quelling muscular tremors to commanding an exoskeleton device that would allow a paralyzed patient to walk and raise a glass of champagne. (Some of these concepts come from other sources, and are not necessarily part of the Leti program.) The already complex issues of integration and device packaging now have to address the additional issue of biocompatibility and FDA approval.


Michael A. Fury, Ph.D, is senior technology analyst at Techcet Group, LLC, P.O. Box 29, Del Mar, CA 92014; e-mail [email protected].

by Michael A. Fury, Techcet Group

Click to Enlarge July 12, 2011 – Another cold summer in San Francisco, another SEMICON West, brimming with the usual vital statistics: 1256 booths, up 10% over 2010; 712 exhibiting companies (up 24%) from 21 countries, of which 105 are new to this event. Among the equipment suppliers, 315 have brought equipment to demonstrate, an attribute that had been on the decline over the past several years. Over 30,000 people have pre-registered for the combined SEMICON and Intersolar events, though it is safe to assume that Intersolar is the steroid driving that number.

Having recognized the action in Moscone West, I elected to start my wanderings at Intersolar. Two impressions struck me immediately upon entering. First, there were displays set up in what was otherwise lobby and aisle space in previous events. Clearly, space was at a premium, and there was plenty of demand for it. The other impression is that the space is very European. I’m not talking about the kind of distribution of ethnicities that you see at SEMICON shows around the world — I’m talking about a distinct predominance of European languages and eyeglasses and haircuts. I found it striking, and can only attribute it to the very effective nature of government subsidies for solar technologies in Europe as compared to the US. Yes, of course, US and Asian companies were well represented, but they did not determine the ambience.

SEMICON West 2011
Day 0: Market forecasts, supply-chain dynamics
Day 1: Intersolar wanderings, SEMICON West symposium
Day 2: CMP views, outlooks for breakfast
Day 2.5: Roaming the floor, LEDs, CMP pads, kudos to Napoleon
Day 3: Two eye-catching technologies in CMP slurry, printed electronics

Navigation through the Intersolar aisles required a reasonable amount of care, though far short of that required to ride a Tokyo subway. The space around the Solyndra booth, however, was simply not navigable due to the throngs of people waiting to approach their representatives for a discussion. At least that why I think they were waiting; there didn’t seem to be any stupendous giveaway driving the crowd. I was glad to see eIQ Energy back at the show and apparently doing quite well. They manufacture power inverters for connecting panels of varying designs and power outputs, and doing so in parallel rather than series. Last year they appeared as a fledgling startup with big aspirations. This year, they appeared more confident and capable, much less tentative than before. I imagine the same can be said for many other companies on the floor.

But my comfort zone is still in the semiconductor halls, where I found it much easier to navigate, yet the crowds were respectable and the buzz was a level above my recollection of the past two years. My time on the floor was limited by my own private meetings and by the commencement of a new feature for 2011: a private symposium by CEA Leti of France. Multimedia convergence on mid-size devices like tablet PCs call for high performance at low VDD, which is the focus of Leti’s FDSOI program (fully-depleted silicon on insulator). These devices are built on an 8nm SOI film with raised source & drain and undoped channel. Migration from 28nm bulk transistors to 20nm FDSOI can enable a 50% power reduction at constant speed, or a 60% speed gain at 0.8VDD (35% gain at 1.0VDD).

3D integration is another program focus at Leti, as it is at so many other companies these days. Development and implementation of EDA methods for 3D TSV has made Grenoble a consortium center for design shops. Solder-free copper-on-copper direct bonding is one of the disruptive process concepts being developed in the program. Leti has launched a program called Open 3D to foster open access to 3D design and process integration technologies to accelerate industry implementation.

The Leti program on silicon photonics aspires to combine CMOS with photonics to leverage the cost effectiveness of CMOS integration with the high bandwidth demands that are presently limiting card-to-card and module-to-module data transfer. Since 2006, Leti has been operating a product prototyping collaboration with 60 commercial partners in the US and Canada, resulting in the release of over 150 products.

Another program focus at Leti is the creative use of electronics in the practice of medicine, moving us toward the notion of molecular medicine. The MEMS technology that is already integrated into cell phones and gaming handsets is being adapted to a variety of medical assignments. Direct brain-computer interfaces that were once relegated to science fiction are now being tested to allow a variety of tasks from guiding a wheelchair to quelling muscular tremors to commanding an exoskeleton device that would allow a paralyzed patient to walk and raise a glass of champagne. (Some of these concepts come from other sources, and are not necessarily part of the Leti program.) The already complex issues of integration and device packaging now have to address the additional issue of biocompatibility and FDA approval.


Michael A. Fury, Ph.D, is senior technology analyst at Techcet Group, LLC, P.O. Box 29, Del Mar, CA 92014; e-mail [email protected].

by Olov Karlsson, senior director of logic technology, Intermolecular

July 12, 1011 – Greetings from SEMICON West 2011, which opened Tuesday under typically San Franciscan conditions of alternating clouds and sun and cool temperatures. The show floor is satisfyingly energetic; nothing like the huge crowds of a decade ago, but definitely more active than last year

July 12, 2011 — Novellus Systems (NASDAQ:NVLS) launched the VECTOR CFD family of films for its VECTOR Express, VECTOR Extreme, and VECTOR Excel plasma-enhanced chemical vapor deposition (PECVD) systems.

The Conformal Film Deposition (CFD) suite of dielectric films consists of oxide, doped oxide and nitride films that are deposited at 50-450

July 12, 2011 – Suss Microtec has joined imec’s research program to develop an in-fab approach to EUV lithography mask integrity. The work, which builds on a collaboration in mask cleaning processes between Suss unit Hamatech APE and imec since 2009, will focus on mask cleanliness during in-fab transportation and support, aiming to develop a holistic mask management system and a sophisticated approach to preserving mask integrity prior to exposure.

EUV masks don’t offer protection of pellicles, so they are more sensitive to contamination (particles and organics) on the mask patterns. A higher cleaning frequency will be needed to mitigate risk to wafers and yields, but the backside of the mask is also a concern — in the scanner it could transfer contaminants to the reticle clamp and result in serious overlay issues. Cleaning the reticle clamp means bringing the critical litho tool offline, causing delays and costs.

imec installed the Suss MaskTrack Pro photomask cleaning system in its 300mm fab in 2009, and the two have pushed ahead with processes-of-record (POR) for EUV mask cleaning, that are effective in removing those contaminants but are gentle enough to be applied repeatedly. Shifting attention to the wafer backside, they have achieved up to 80% particle removal efficiency on an alpha demo reticle; reaching 100% will require avoidance of artifacts caused by handling, transportation, and storage, i.e. a more controlled mask management environment throughout the mask’s use in the fab. To this end, imec has added Suss’ InSync fab management system to its NXE-3100 EUV tool. EUV masks are automatically transferred into and out of the dual pod; the inner pod can be stored inside the InSync environment. Functioning as a loadport the system can accept a reticle dual pod directly from the scanner for transfer to the mask cleaning tool.

Particle removal efficiency (PRE) of the backside of an ADT (alpha demo tool) reticle of up to 80%. (1

July 12, 2011 — Applied Materials Inc. (AMAT) introduced a toolset for manufacturing low-power, fast interconnects in 22nm and lower logic chips: the Applied Producer Black Diamond 3 deposition system and Applied Producer Nanocure 3 UV curing system. The systems create low-k dielectric films that insulate copper wire interconnects. Applied also debuted a full-vacuum gate stack fab tool today.

The Black Diamond 3 technology, extendible to 14nm, can be integrated into existing process flows. Black Diamond was first introduced for the 90nm node.

Applied’s Black Diamond 3 process creates a dielectric film with uniform porosity. This engineered nano-porosity increases the mechanical strength and hardness of the film, enabling it to withstand the stress of hundreds of downstream processes and packaging steps. The new film also delivers a 2.2 k-value, which reduces parasitic capacitance in interconnects.

The new Applied Producer Nanocure 3 system enhances Applied’s ultraviolet (UV) curing technology for porous low-k films with advancements in UV source optics and chamber design that provide up to 50% more uniform curing than conventional processes. The Nanocure 3 employs a high intensity UV source with a low pressure curing process that results in 40% faster curing. Combined with the Black Diamond 3 film, this two-step deposition and cure process provides up to twice the mechanical strength of Applied’s successful second generation Black Diamond film, reducing device variability and boosting chip yield.

Applied Materials will showcase the breakthrough Black Diamond 3 and Nanocure 3 technologies at Semicon West in San Francisco from July 12-14. Read more product news from SEMICON West.

Applied Materials Inc. (Nasdaq:AMAT) provides equipment, services and software to advanced semiconductor, flat panel display and solar photovoltaic manufacturers. Learn more at www.appliedmaterials.com.

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July 12, 2011 — Applied Materials Inc. (AMAT) launched the Applied Centura Integrated Gate Stack system for creating gate dielectric structures in 22nm logic chips. It processes the entire high-k multilayer stack in a single vacuum environment, preserving integrity of film interfaces.

Applied Materials developed the Integrated Gate Stack system to build the dielectric film stack atomically, based around Applied’s advanced atomic layer deposition (ALD) technology, which builds ultra-thin, hafnium-based layers less than 2nm in thickness a fraction of a monolayer at a time.

By fabricating the entire gate dielectric stack under vacuum, the Centura system is able to prevent interface contamination from exposure to ambient air. AMAT reports that eliminating air exposure during processing improves mobility in the transistor by up to 10% and reduces switching voltage variability between transistors by up to 40%.

Applied Materials will showcase its Centura Integrated Gate Stack technology at SEMICON West in San Francisco from July 12-14, booth 303, South Hall. More news and products from SEMICON West

Applied Materials, Inc. (Nasdaq:AMAT) provides equipment, services and software to advanced semiconductor, flat panel display and solar photovoltaic manufacturers. Learn more at www.appliedmaterials.com.

Recent Applied Materials toolset introductions:

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July 12, 2011 — SEMI appointed Doug Neugold, ATMI Chairman, CEO, and president, as Chairman of its International Board of Directors, serving his first term on the association’s board.

Neugold’s year-long tenure will begin tomorrow at the SEMI membership meeting during SEMICON West 2011 and Intersolar North America in San Francisco, CA. Neugold is an active SEMI member, recently serving on the International Board, the Executive Committee, and as Vice Chairman of the Board. He will assume leadership from Rick Wallace, KLA-Tencor president and CEO, who served as Chairman for the prior 12 months.

Neugold looks forward to serving as SEMI chairman as SEMI and the industry undergo "significant strategic, technological, and management change." He was welcomed to the Board Chair by outgoing SEMI president and CEO Stanley T. Myers.

David B. Miller, president, DuPont Electronics & Communications; and Ho-Ming Tong, chief R&D officer and general manager, ASE Group, were newly elected to the association board as well. Dave Miller and Ho-Ming Tong have made "significant contributions to SEMI regional activities and advisory groups," noted Myers.

In accordance with the association’s by-laws, the following board members were re-elected: Andr

by Michael A. Fury, Techcet Group

Click to Enlarge July 11, 2011 – The day before the official opening of Semicon West 2011 started for this participant with the SEMI press conference. The group forecasts $44B equipment sales, 12% growth following 148% in 2010. Capital spending this year is driven by Intel, Global Foundries, and Samsung, with regional spending rankings led by Taiwan, the US, and Korea. Materials were up 25% in 2010 over 2009, and SEMI sees another 6% in 2011 to $46B. Materials spending by region is projected to be, in order: Taiwan, Japan, SE Asia, and Korea. There are 30,000 folks pre-registered for Semicon and Intersolar combined.

The SEMI/Gartner Market Symposium followed with a full room of ~150 people. Vincent Tong, senior VP of Xilinx, led off the session with his view of the supply chain dynamics critical to success at 28nm and beyond. Short-loop learning cycles of three months or less will play a key role in climbing yield curves not just for the semiconductor, but for the complete package, he advised.

Some changes are ahead in capital spending, foretold Bob Johnson, VP of research at Gartner. The impact of the March 2011 earthquake & tsunami in Japan is now being reported to been for only one quarter on the global electronics supply chain, due largely to the excellent efforts of Japanese vendors. Smart phones are well on their way to being the largest consumer of flash memory, which is forecast to have a total demand of 140,000 petabytes by 2015. Media tablet PCs are flagged as the next killer app as a semiconductor growth segment. A buildup of chip inventories has facilitated a push out of fab capacity expansion. Capex spending in 2011 will be up 12% over 2010, driven by Intel, foundries, and NAND, with a slight decrease in 2012 as inventory demand catches up. Capital concentration is continuing, with the top five chip producers spending 56% of the capital, and the top 10 spending 70%.

SEMICON West 2011
Day 0: Market forecasts, supply-chain dynamics
Day 1: Intersolar wanderings, SEMICON West symposium
Day 2: CMP views, outlooks for breakfast
Day 2.5: Roaming the floor, LEDs, CMP pads, kudos to Napoleon
Day 3: Two eye-catching technologies in CMP slurry, printed electronics

SEMI’s senior director of industry research & statistics, Dan Tracy, confirmed a sharp recovery in shipments of all wafer sizes in 2010, with 300mm shipments ~50% greater than 200mm shipments. Fab materials are forecast to be $24.8B in 2011, up 8.1% over 2010 with another 4.9% growth expected for 2012. Gold bond wire is being replaced by copper, but is still >80% of the market, with 80% of that gold wire <25

July 11, 2011 — KLA-Tencor Corporation (NASDAQ:KLAC) launched a new generation in its Surfscan family of wafer defect and surface quality inspection systems: the Surfscan SP3. The unpatterned wafer inspection platform uses deep-ultraviolet (DUV) illumination and is extendible to 450mm wafers.  

With Surfscan SP3, KLAC recognizes the need for substrate development and manufacture for =28nm devices. Defects such as crystalline pits, terracing, voids, etc., are problematic for current generation tools when applied at 28nm and below.



Amir Azordegan, senior director of marketing for Surfscan at KLA-Tencor, explains how the new DUV wafer inspection platform detects such defects at more advanced nodes. He also describes the significance of combining DUV illumination with special apertures, multiple illumination and collection channels. The new tool has a module that inspects the backside of wafers for defects that might deform the wafer shape during lithography.

Figure 1. Surfscan SP3 sensitivity at throughput. SOURCE: KLA-Tencor

"From the standpoint of the user, the two key advances in the new platform are sensitivity and throughput," said Azordegan. "The new tool and its predecessors each have three or four operating points, and, predictably, sensitivity can be gained by operating the system at a lower throughput (Fig. 1). However, the SP3