01/26/2006  XTREME Technologies GmbH, based in Gottingen and Jena, Germany, announced it has received funding from Intel Capital, Intel Corp.'s strategic investment arm, to accelerate development of its extreme ultraviolet light source for photolithography applications.

01/23/2006  January 23, 2006 - Intel Corp. and Dai Nippon Printing Co. Ltd. have extended a mask development collaboration to cover mask technologies, including optical lithography (ArF excimer laser) and extreme ultraviolet (EUV), for the 32nm node and beyond.

01/19/2006  January 19, 2006 - In a move to reduce expenses and tighten focus on its technical programs, Sematech is eliminating about 15% of its cost structure, restructuring various support and administrative functions and reshaping its interconnect program.

01/19/2006 

01/17/2006  January 17, 2006 -- /BUSINESS WIRE/ -- SAN JOSE, Calif. -- Metron Technology has launched its new eMetron.com online ordering capability designed to optimize the efficiency of purchasing cleanroom consumables for customers in the U.S.

01/12/2006 

01/10/2006  By Bob Haavind, Group Editorial Director

While exotic properties of materials in the nanozone (1-100nm) promise a host of new devices and applications, success in the marketplace will depend on making tough choices and focusing on developing products offering sustainable profits.

01/10/2006  January 10, 2006 - Aubrey "Bill" Tobey, president of ACT International, has been presented with the seventh annual Bob Graham award for "outstanding contributions in semiconductor equipment and materials marketing" by SEMI.

01/10/2006  January 10, 2006 - Photronics Inc., Brookfield, CT, plans to build a new photomask fabrication facility in South Korea, to support R&D and volume production of photomask technologies for semiconductors using 65nm- and below process technologies.

01/10/2006  January 10, 2006 - Mentor Graphics Corp., Wilsonville, OR, has unveiled a new product to help verify post-optical-proximity correction (OPC) output, and help chipmakers minimize costly mask respins and delays getting products through production.

01/06/2006  January 5, 2006 -- /MARKET WIRE/ -- AUSTIN, Texas -- SEMATECH today announced the 2006 SEMATECH Knowledge Series (SKS), a set of public, single-focused industry meetings designed to increase global knowledge in key areas of semiconductor R&D.

01/01/2006  Gajus Worthington knew three years ago that he needed to find a manufacturing site for Fluidigm Corp.

12/20/2005 

12/19/2005 

12/09/2005  December 9, 2005 - A European Commission-sponsored research project said it has achieved a significant breakthrough with development of a 800W EUV light source.

12/08/2005  December 8, 2005 - European R&D consortium IMEC is installing two 300mm coater/developer tools from Tokyo Electron Ltd. for use in EUV and 193nm immersion lithography work.

12/08/2005  December 8, 2005 - ASML said it plans to ship 20-25 immersion lithography systems in 2006, including shipments to Japan, and is now receiving components for its first EUV alpha tools being delivered next year to IMEC and Albany NanoTech.

12/08/2005 

12/02/2005 

12/01/2005  December 1, 2005