12/12/2002  SUSS MicroTec AG said it has launched new embossing equipment for nanoimprinting technology.

12/04/2002  DEC. 4- LAS VEGAS--Emergency Filtration Products Inc. (EFP) has begun testing its nanotechnology-enhanced 2H Technology filtration system to be incorporated into an environmental isolation mask.

12/04/2002  Dec. 4, 2002 - Round Rock, TX - DuPont Photomasks Inc. plans to streamline its European operations by consolidating trailing-edge photomask production in Rousset, France and Hamburg, Germany, into its manufacturing facility in Corbeil, France. These initiatives are expected to reduce the global workforce by approximately 8%, or 140 positions, once fully implemented.

11/29/2002  The atmosphere of the 22nd BACUS Photomask Symposium, held recently in Monterey, CA, was oddly upbeat, with a record 156 papers and high attendance, in spite of depressed industry conditions. The mask industry has been hard hit by the slow shift to 130nm and beyond, since most of industry revenue comes from such advanced reticles.

11/12/2002  The goal of the New Jersey Nanotechnology Consortium, a nonprofit corporation headquartered at Bell Labs, is to leverage the center's 40 years of experience commercializing technology. CTO Om Nalamasu says that companies that want to unlock the commercial potential of small tech need to pool resources.

11/12/2002  Small Times magazine has announced its 2002 Small Times Magazine Best of Small Tech Awards, recognizing the best people, products and companies in nanotechnology, MEMS and microsystems.

11/01/2002  Nov. 1, 2002 - Marlborough, MA - Shipley Company L.L.C., a provider of electronic materials and process innovations for advanced circuit board technology, semiconductor manufacturing, and advanced packaging, has established a partnership for low k1 lithography imaging with Silicon Valley-based Numerical Technologies Inc.

10/25/2002  Cymer Inc. is to build a new manufacturing facility for its advanced lithography light sources, and will implement a new organizational structure. The new facility is designed to accommodate the high-volume production of the company's light source portfolio. This will include the new XL Series product line, which utilizes the dual-gas-discharge-chamber Master Oscillator Power Amplifier (MOPA) architecture.

10/22/2002  Oct. 22-Austin and Round Rock, TX-Through a recently signed cross-licensing agreement, International Sematech (ISMT) and DuPont Photomasks have combined their intellectual property (IP) for producing test photomasks. The goal is to use test masks based on the combined IP to strengthen industry standards for photomask inspection and repair systems at the leading-edge technology nodes.

10/22/2002  QinetiQ has launched a new program for MEMS prototyping, according to Semiconductor Business News.

10/21/2002  Oct. 21, 2002 - Belmont, CA - Nikon Corp. and Nikon Precision Inc., a wholly-owned subsidiary located in Belmont, have filed a patent infringement action against ASML Netherlands BV, a Dutch corporation and ASM Lithography Inc., a US company in the US District Court for the Northern District of California, asserting infringement of eight Nikon patents relating to primary structures in stepper and scanner machines.

10/21/2002  With no need to rely on federal grants or contracts, and already making money off sample sales of its light beam management subcomponents, NanoOpto Corp. is pressing ahead with new offerings – integrated layers of two or more of its present products, plus new phase management devices. Staying on track is big news in today's economic climate.

10/08/2002  Oct. 8, 2002 - Corning, NY - Corning Inc. has received a US patent for a calcium fluoride (CaF2) lens blank that supports the advancement of CaF2 materials for the 193nm and 157nm microlithography systems.

09/12/2002  Nanotechnology and nanomaterials will be critical to solving the semiconductor industry’s formidable challenges, said John Kelly, IBM senior vice president and a keynote speaker at the Albany Symposium on Global Nanotechnology. Kelly said IBM is looking toward a future in which circuitry patterns are made through molecular self-assembly.

09/09/2002  Nanoscale computing took a significant step forward today with Hewlett Packard's announcement that it has fabricated a 64-bit array that switches molecules on and off inside a grid of nanowires only a square micron in size. The prototype circuit has 10 times the density of today's RAM memory chips. The first market for the technology would be flash memory for portable devices.

09/04/2002  As mask data sets become more complex and data-intensive, maskmakers face the challenge of how to manage large amounts of data that must be moved from design to mask.

08/30/2002  SAN JOSE, Calif.- July 15, 2002-SUSS MicroTec today announced the MA300Plus, a full field proximity Mask Aligner addressing the growing demand for advanced packaging tools capable of processing wafers with diameters of up to 300 mm.

08/30/2002  New NanoTech(TM) Family Builds on Ultratech's Proven Technology Expertise to Provide Highly Flexible, Productive and Cost-Effective Steppers for Emerging Markets

08/28/2002  nPoint Inc., a Wisconsin-based provider of precision motion devices and controllers, has launched a new tool to its line of nanoscale motion and control products.

08/19/2002  NanoInk, a mere seven months old, has released its first product: a software-and-supplies package that turns any atomic force microscope into a Dip-Pen Nanolithography machine that's targeted to research labs. Now comes the hard part – making a bunch of AFM pen tips work in an array large enough for manufacturing. The company promises an array product by early 2003.