Wafer Processing

WAFER PROCESSING ARTICLES



Applied Materials adds tungsten film planarization to CMP tool

06/16/2011 

Applied Materials (AMAT) unveiled the extension of its Reflexion GT chemical mechanical polishing (CMP) system to include planarization of tungsten films. Sidney Huey, director, CMP product manager, CMP Division, Silicon Systems Group at Applied Materials, discusses the tool and the technology.

Quantum transistor promises easier fab than Intel's 3D transistor

06/15/2011 

Avto Metals' Avto Quantum Transistor (AQT) modulates electrical signals via a tunneling electron either constructively or destructively interfering with electrons' wave function in a gate material. Avto credits a "unique surface geometry" for the transistor's properties.

IBM builds IC with graphene transistor

06/13/2011 

IBM researchers built an integrated circuit (IC) fabricated from wafer-scale graphene on SiC, integrating a graphene transistor with other electronics circuits.

Reports: Intel investigating explosion, fire in solvent room

06/10/2011 

What is being called an "explosion" and/or "flash fire" at one of Intel's Chandler, AZ fabs injured eight people earlier this week (June 7), according to multiple reports.

Temporary wafer bonding market: More than 10 approaches today

06/09/2011 

Figure. Temporary bonding tools used during a temporary bonding step. The figures in red show the order of the steps. Source: Yole, Thin Wafer Manufacturing Equipment & Materials Markets Report, June 2011. Yole Développement forecasts the temporary wafer bonding process growth and worth through 2016, and explains why there are so many process options, and who is working on them.

FormFactor next-gen DRAM tester contacts 850+ die in parallel

06/08/2011 

FormFactor (NASDAQ:FORM) introduced its new generation of the SmartMatrix 300mm full wafer contact probe cards for DRAM device test. The SmartMatrix 100XP probe card uses FORM's MicroSpring 3D MEMS contact technology and increases probe card parallelism to over 850 die, enabling single touchdown DRAM wafer test.

FSI wins wafer clean tooling orders from FEOL and BEOL customers

06/07/2011 

FSI International Inc. (Nasdaq:FSII), surface conditioning equipment supplier, won orders for multiple ORION single wafer cleaning systems. A memory maker will use the ORION in wet photoresist strip and etch and a foundry will use it for backend-of-line (BEOL) processes, like cleaning film stacks.

CMP metrics improved by undiluted slurry data

06/02/2011 

Figure 3. Ceria delivery monitor >120hrs. (SlurryScope data of undiluted extended run measurements of slurry LPC). SOURCE: Vantage TechnologyThe requirement for CMP slurry to perform consistently during the wafer polishing process has resulted in a push on the part of IC manufacturers to improve slurry metrics. Marty Mason, Vantage Technology Corp., explains how on-wafer slurry conditions can differ from slurry measurements, and new advances to rectify measurements.

Semiconductor inventory surplus mitigates fab losses in Japan disaster, for now

06/02/2011 

Average days of inventory for semiconductor suppliers. SOURCE: IHS iSuppli, May 2011.Sharon Stiefel, IHS iSuppli, reports that a cushion in the semiconductor supply chain helped balance out off-line fabs in Japan following the Sendai-area earthquake and tsunami. As fabs ramp back up, or products are transferred to lines in other facilities, Q2 should avoid component shortages as well. But will the disaster be the end of just-in-time inventory management?

Design-dependent semiconductor wafer monitoring developed between UCLA, SRC

06/01/2011 

Semiconductor Research Corporation and UCLA researchers developed design-dependent process monitoring for semiconductor wafer manufacturing. They expect the method to save 15% of semiconductor fab costs and boost productivity, potentially increasing per-chip profits by 12%. The yield improvement could equal that of a technology node, said one researcher.

ITRI installs EVG bonders to ramp 200mm MEMS

06/01/2011 

Taiwan's Industrial Technology Research Institute (ITRI) will install more EV Group (EVG) wafer bonding tools to research and develop advanced manufacturing processes for next-generation micro electro mechanical system (MEMS) devices, especially on 200mm wafers.

Metrology of epitaxial thin-films by advanced HRXRD and XRR

06/01/2011  Using complementary metrology techniques, the authors determined the thickness, composition and relaxation of SiGe and Si:C layers. Paul Ryan, et al., Jordan Valley Semiconductors, Durham, UK

High-productivity materials development for post-via etch residue removers

06/01/2011  Utilizing a high-productivity combinatorial technique, the best formulation and process window for post-via etch residue removers was determined. Rekha Rajaram, et al., Intermolecular Inc.; Barry Chen, et al.,ATMI, Inc., Danbury, CT and Round Rock, TX

Centralized automation control increases performance and reduces costs

06/01/2011  The capabilities of advanced motion controllers enable OEMs to achieve high-performance requirements. Cameron Sheikholeslami, ACS Motion Control, Eden Prairie, MN

450mm wafer transition needs collaboration and standards

06/01/2011  As the global supply chain deals with wafer size transition, pre-competitive collaboration will continue to be the best path towards economic efficiency and industry rationality, and Standards play a major role. Jonathan Davis, SEMI, San Jose, CA.

Combinatorial method can do for wafer processing tools what it has done for semiconductor materials

05/31/2011 

Mike Besnard, ATMI, speaks about evolving the high-productivity combinatorial research method to vet wafer processing tools for the ramp to high-volume, not just to screen semiconductor materials. He caught up with ElectroIQ.com at The ConFab.

Key takeaways from AMAT's 3Q: "Uphill" 2011 goals, memory comeback, solar concern

05/31/2011 

Building "cumulative headwinds" -- inflation, consumer skepticism, energy costs, and Japan recovery -- are causing semiconductors and display manufacturers to push out near-term orders, according to Applied Materials execs laying out their 2Q11 books and future projections. They also describe who's spending and who's not, why solar equipment is a concern, and what are three keys for bridging the 450mm wafer-size transition.

Imec ITF: 2011 is "the year for EUV to prove its readiness"

05/25/2011 

In an SST-exclusive series of blogs, imec reports from its International Technology Forum this week in Brussels. Geert Vandenberghe talks about how EUV lithography is at a readiness crossroads, but he feels "fairly secure" about its current capabilities.

Chip Supply changing its name to Micross Components, consolidating several facilities in Orlando

05/25/2011 

Semiconductor die and packaging specialist Chip Supply Inc. is changing its name to Micross Components, which reflects the acquisition of Chip Supply last November by Micross Components. Micross provides specialist products and services for high-reliability and state-of-the-art electronics for high-reliability, industrial, and commercial applications.

LED volume ramps motivate GT Solar's new sapphire growth system with larger boule growth

05/24/2011 

GT Solar International Inc. (NASDAQ:SOLR) introduced the ASF100 advanced sapphire growth system, which produces larger 100kg sapphire boules in the standard furnace chamber. Larger sapphire boules can enable lower costs for LED chips.




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Environment, Safety & Health

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The semiconductor industry is an acknowledged global leader in promoting environmental sustainability in the design, manufacture, and use of its products, as well as the health and safety of its operations and impacts on workers in semiconductor facilities (fabs). We will examine trends and concerns related to emissions, chemical use, energy consumption and worker safety and health.

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Wafer Processing

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As the industry moves to 10nm and 7nm nodes, advances in wafer processing – etch, deposition, planarization, implant, cleaning, annealing, epitaxy among others – will be required. Manufacturers are looking for new solutions for sustained strain engineering, FinFETs, FDSOI and multi-gate technologies, 3D NAND, and high mobility transistors.

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