Table of Contents
Solid State Technology
Year 2012 Issue 2
| FEATURES
Cover Article Yield challenges and the 450mm learning curve
As the industry evolves to meet consumers' increasing demand for smaller, faster and cheaper devices, chipmakers are growing more focused on the wafer size transition from 300mm to 450mm.
Cover Article It's 2012: Time to get serious about 450mm?
The effort to actively engage equipment companies in the serious development of tools for 450mm wafers got a major boost last fall with the formal announcement of the investment of serious money by four major semiconductor manufacturers and the state of New York aimed at 450mm development at the Albany Nanotech facility in upstate New York.
Metrology Evolution or revolution: the path for metrology beyond the 22nm node
Metrology solutions are currently being investigated by SEMATECH to address the challenges of future nodes. Abraham Arceo, Benjamin Bunday, Aaron Cordes, and Victor Vartanian, SEMATECH, Albany, NY.
Metrology Metrology-aided gas purification development
An enhancement in contaminant moisture removal is acieved for inert (nitrogen, noble) and hydrogen gas purifier by tailoring purifier adsorbent properties. Abneesh Srivastava, Thomas Gaffne, Entegris, Inc., San Diego
Lithography Light sources for ArF immersion double patterning
In field studies, the XLR 600ix laser has demonstrated an uptime of 99.8%. Rajasekhar Rao, Slava Rokitski, Rui Jiang, John Melchior, Daniel J. Riggs, and Theodore Cacouris, Cymer Inc., San Diego, CA
Packaging Improved copper wire bonding with non-contact metrology
Copper wire is fast gaining popularity for chip bonding, but it is a less understood and less mature process than bonding with gold. A 3D optical microscope can help provide data needed for imprint studies aimed at process optimization and sampling. Matt Novak , Bruker Nano Surfaces Division, Tucson, AZ.
| | COLUMS
Editorial The
The maturing semidonductor industry, Pete Singer
Packaging Packaging with 3-D architectures
Phil Garrou, Microelectronic Consultants of NC
Mems Integrated smart systems with MEMS sensors
Jay Esfandyari, Fabio Pasolini, Gang Xu, STMicroelectronics, Coppell, TX
Industry Forum Supporting innovation by protecting IP
Dan Donabedian, Ziptronix
| | DEPARTMENTS
News The Future is Flexible
Flexible electronics, now being printed, is the future of new applications in sensors, displays, power and lighting according to experts gathered at the FlexTech Alliance 2012 Flexible Electronics & Displays Conference & Exhibition (held Feb. 6-9 in Phoenix).
News Thinfilm, PARC Win Award for Printed Addressable Memory
Thin Film Electronics ASA and PARC, a Xerox company, won the FlexTech Alliance Innovation Award for the world's first working prototype of a printed, non-volatile memory device addressed with complementary organic circuits, the equivalent of CMOS circuitry.
News LED Market Grew 9.8% To $12.5 Billion In 2011
The worldwide high-brightness LED market grew from $11.3 billion in 2010 to $12.5 billion in 2011, a growth rate of 9.8%, according to Strategies Unlimited, the leading market research firm in LEDs.
News 2011 ITRS: DRAM, 3D Flash, MEMS, nano-scaling steal the show
The Semiconductor Industry Association (SIA) released the 2011 International Technology Roadmap for Semiconductors (ITRS), a roadmap of near-term and long-term challenges and innovations for the semiconductor design and manufacturing industry through 2026.
News SRC Energy Research Initiative Adds Three New Members
Semiconductor Research Corporation (SRC) added three members to the global Energy Research Initiative (ERI) that focuses on new technologies for renewable energy and its efficient and reliable distribution on the power grid.
News MAPPER Lithography tech resolves 22nm
Research institute CEA-Leti shows "significant progress" with the MAPPER Lithography massively parallel direct write technology, resolving 22nm dense lines and spaces and 22nm dense contact holes in positive chemically amplified resist.
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