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WEBCASTS
 Environment, Safety & Health Date and time TBD The semiconductor industry is an acknowledged global leader in promoting environmental sustainability in the design, manufacture, and use of its products, as well as the health and safety of its operations and impacts on workers in semiconductor facilities (fabs). We will examine trends and concerns related to emissions, chemical use, energy consumption and worker safety and health.
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Wafer Processing Date and time TBD As the industry moves to 10nm and 7nm nodes, advances in wafer processing etch, deposition, planarization, implant, cleaning, annealing, epitaxy among others will be required. Manufacturers are looking for new solutions for sustained strain engineering, FinFETs, FDSOI and multi-gate technologies, 3D NAND, and high mobility transistors.
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Sunrise Optical LLC debuted the Zebraoptical low coherence fiber optic interferometer with microscope attachment. The Zebraoptical Integrated Metrology Tool (ZIMT) provides metrology readings on micro electromechanical system (MEMS) wafers.
Magneto-optical (MO) effects can be used for a wide range of applications, from data storage and processing to thin films characterizations or even remote magnetic field sensors. Gabriel Monette, Université de Montréal and Marc Verhaegen, Photon etc., performed measurements of spectral dependence of the Faraday MO effect in the visible part of the electromagnetic spectrum along with temperature dependence measurements on a semiconductor 2µm epilayer (GaP) grown with embedded metallic ferromagnetic nanoclusters (MnP).
New work from Stanford goes beyond simple bump shear testing to allow simulation of stresses exerted on chips during semiconductor packaging. The researchers are able to explore how the stresses affect back-end structures. Alex Hsing, a PhD student in Professor Reinhold Dauskardt's Group at Stanford University, summarizes the group's approach.
KLA-Tencor Corporation (Nasdaq: KLAC) introduced the ICOS CI-T620, a high-performance component inspector system for tape and reel. The CI-T620 system has dual tapers working sequentially with minimal operator intervention to increase units per hour.
Among the topics covered at KLA-Tencor’s annual Lithography Users Forum was extension of KLAC's Teron 600 platform for inspection of EUV blanks at the 16nm hp node. Here, Brian Trafas speaks with Debra Vogler about process control in advanced lithography.
Carl Zeiss introduced a new production tool aimed to improve registration and overlay of advanced photomasks. RegC is based on ZEISS femtosecond-laser technology. RegC enables correction on high-end photomasks for remaining registration errors after the pattern generation process. Current results show registration improvements over 50% in advanced lithography.
SoftJin Technologies, a provider of customized automation software for electronic design and manufacturing, enhanced NxDAT, its defect analysis software. The enhanced version of NxDAT is optimized for better speed and memory performance.
Novellus Systems subsidiary Peter Wolters GmbH introduced a new version of its microLine double side lapping system for prime silicon wafers. The AC-2100L system features independently driven inner and outer pin rings, automatic force calibration, and in-situ wafer thickness metrology.
Leica Microsystems and Digital Surf announced an agreement whereby Leica Map surface imaging and metrology software, based on Digital Surf's Mountains Technology, will be used with the Leica Application Suite (LAS) for Leica industrial microscopes.