Semiconductors

SEMICONDUCTORS ARTICLES



Verigy tests GDDR5 at Korean memory producer

06/15/2011 

Verigy (NASDAQ:VRGY), semiconductor test equipment provider, won orders for its V93000 HSM platform to perform volume test on GDDR5 memory devices at a large Korean customer.

LORD underfill encapsulant designed for lower cost

06/15/2011 

LORD ME-555 LORD Corporation launched the ME-555 underfill encapsulant for semiconductor packaging and assembly. LORD ME-555 is a high-purity, semiconductor-grade epoxy underfill for encapsulating flip chips.

Quantum transistor promises easier fab than Intel's 3D transistor

06/15/2011 

Avto Metals' Avto Quantum Transistor (AQT) modulates electrical signals via a tunneling electron either constructively or destructively interfering with electrons' wave function in a gate material. Avto credits a "unique surface geometry" for the transistor's properties.

Metryx joins semiconductor equipment assessment group SEAL

06/14/2011 

Metryx will work with IMEC and Intel via the joint European Semiconductor Equipment Assessment Leveraging Innovation (SEAL) project to assess high-resolution mass metrology viability at 20nm and smaller nodes.

New power MOSFET package from IRF minimizes form factor

06/13/2011 

ternational Rectifier, (IR, NYSE:IRF), power management technology provider, introduced a PQFN 2 x 2mm with <1mm profile package featuring its latest HEXFET MOSFET silicon. The new package is ultra-compact, high density and efficient for lower-power applications.

IBM builds IC with graphene transistor

06/13/2011 

IBM researchers built an integrated circuit (IC) fabricated from wafer-scale graphene on SiC, integrating a graphene transistor with other electronics circuits.

FEI plasma FIB tool targets packaging apps

06/13/2011 

High-speed sectioning of TSVs with plasma FIB. The device was located, cross-sectioned, polished, and imaged with PFIB. SOURCE: FEI FEI's new Vion plasma focused ion beam (PFIB) system based on inductively-coupled plasma (ICP) source technology using a xenon ion beam generates more than a micro-amp of beam current and can remove material faster than liquid metal ion sources, says product marketing manager Peter Carleson.

Reports: Intel investigating explosion, fire in solvent room

06/10/2011 

What is being called an "explosion" and/or "flash fire" at one of Intel's Chandler, AZ fabs injured eight people earlier this week (June 7), according to multiple reports.

Temporary wafer bonding market: More than 10 approaches today

06/09/2011 

Figure. Temporary bonding tools used during a temporary bonding step. The figures in red show the order of the steps. Source: Yole, Thin Wafer Manufacturing Equipment & Materials Markets Report, June 2011. Yole Développement forecasts the temporary wafer bonding process growth and worth through 2016, and explains why there are so many process options, and who is working on them.

Apple spends most on semiconductors; 61% for wireless products

06/09/2011 

Top 10 OEM semiconductor buyers (Ranking by revenue in millions of US dollars). SOURCE: IHS iSuppli.Apple bought the most semiconductors of all original equipment manufacturers (OEMs) in 2010, largely to build iPhones and iPads, according to IHS iSuppli (NYSE: IHS) research. This is Apple's first trip to the #1 spot, after being third in 2009 and sixth in 2008.

FormFactor next-gen DRAM tester contacts 850+ die in parallel

06/08/2011 

FormFactor (NASDAQ:FORM) introduced its new generation of the SmartMatrix 300mm full wafer contact probe cards for DRAM device test. The SmartMatrix 100XP probe card uses FORM's MicroSpring 3D MEMS contact technology and increases probe card parallelism to over 850 die, enabling single touchdown DRAM wafer test.

FSI wins wafer clean tooling orders from FEOL and BEOL customers

06/07/2011 

FSI International Inc. (Nasdaq:FSII), surface conditioning equipment supplier, won orders for multiple ORION single wafer cleaning systems. A memory maker will use the ORION in wet photoresist strip and etch and a foundry will use it for backend-of-line (BEOL) processes, like cleaning film stacks.

Mobile SoCs can have low power without dopants, says SuVolta

06/06/2011 

SuVolta Vt variation reduction in perspective, 65nm bulk CMOS Vt variation.SuVolta is tackling the low-power challenge of mobile SoC devices with its PowerShrink platform and undoped, deeply depleted channel (DDC) technology. Scott Thompson, SuVolta, says DDC technology produces high performance at low voltage because it enables inversion charge to move from source to drain without scattering with dopants. The undoped channel and screening regions provide threshold voltage variation as good as the best fully-depleted SOI and fully-depleted FinFET research devices.

Phase-change memory module debuts at DAC

06/03/2011 

Inside the Moneta storage array with PCM modules installed. Image courtesy of Jacobs School of Engineering. All rights reservedUC San Diego researchers developed a phase change memory (PCM) solid-state storage device (SSD) that claims 7x speed improvement over current SSDs. The project has backing from Micron Technology, BEEcube, and Xilinx.

NXP assembles RF power transistors in plastic packages

06/03/2011 

NXP Semiconductors N.V. (NASDAQ: NXPI) launched overmolded plastic (OMP) RF power devices with 2.5-200W peak power. The plastic packages are a lower-cost option alongside NXP's ceramic package RF devices.

CMP metrics improved by undiluted slurry data

06/02/2011 

Figure 3. Ceria delivery monitor >120hrs. (SlurryScope data of undiluted extended run measurements of slurry LPC). SOURCE: Vantage TechnologyThe requirement for CMP slurry to perform consistently during the wafer polishing process has resulted in a push on the part of IC manufacturers to improve slurry metrics. Marty Mason, Vantage Technology Corp., explains how on-wafer slurry conditions can differ from slurry measurements, and new advances to rectify measurements.

Semiconductor inventory surplus mitigates fab losses in Japan disaster, for now

06/02/2011 

Average days of inventory for semiconductor suppliers. SOURCE: IHS iSuppli, May 2011.Sharon Stiefel, IHS iSuppli, reports that a cushion in the semiconductor supply chain helped balance out off-line fabs in Japan following the Sendai-area earthquake and tsunami. As fabs ramp back up, or products are transferred to lines in other facilities, Q2 should avoid component shortages as well. But will the disaster be the end of just-in-time inventory management?

Elpida, PTI, UMC finalize 3D IC partnership

06/01/2011 

Updating on plans announced a year ago, Elpida, Powertech, and UMC say they have finalized their partnership to develop a "one-chip" logic+DRAM 3D IC solution incorporating 28nm interface design, through-silicon via (TSV) formation, wafer thinning, testing, and chip stacking assembly.

Design-dependent semiconductor wafer monitoring developed between UCLA, SRC

06/01/2011 

Semiconductor Research Corporation and UCLA researchers developed design-dependent process monitoring for semiconductor wafer manufacturing. They expect the method to save 15% of semiconductor fab costs and boost productivity, potentially increasing per-chip profits by 12%. The yield improvement could equal that of a technology node, said one researcher.

ITRI installs EVG bonders to ramp 200mm MEMS

06/01/2011 

Taiwan's Industrial Technology Research Institute (ITRI) will install more EV Group (EVG) wafer bonding tools to research and develop advanced manufacturing processes for next-generation micro electro mechanical system (MEMS) devices, especially on 200mm wafers.




WEBCASTS



Environment, Safety & Health

Date and time TBD

The semiconductor industry is an acknowledged global leader in promoting environmental sustainability in the design, manufacture, and use of its products, as well as the health and safety of its operations and impacts on workers in semiconductor facilities (fabs). We will examine trends and concerns related to emissions, chemical use, energy consumption and worker safety and health.

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Wafer Processing

Date and time TBD

As the industry moves to 10nm and 7nm nodes, advances in wafer processing – etch, deposition, planarization, implant, cleaning, annealing, epitaxy among others – will be required. Manufacturers are looking for new solutions for sustained strain engineering, FinFETs, FDSOI and multi-gate technologies, 3D NAND, and high mobility transistors.

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