Category Archives: Materials and Equipment

May 20, 2010 – High-density through-silicon stacking (TSS) shows promise for very high-volume applications, but work still needs to be done to "tame" key issues in manufacturing, improve costs, and smooth out the supply-chain, said Matt Nowak, director of engineering in Qualcomm’s VLSI technology group, in a presentation at The ConFab in Las Vegas.

High-density TSS refers to small diameter (~5μm), high aspect ratio (~10:1) via-middle through-silicon vias (TSV), used in backside wafer interconnect processing of high-density (10s of μm pitch) tier-to-tier microbump connections, with >1000s of TSVs and microbumps per chip. Though there is "industry momentum" for high-density TSS in very high-volume applications, work still needs to be done to "tame" issues with design, thermal management, manufacturing costs, and test — e.g. through "judicious system partitioning" to clarify design and manufacturing supply-chain handoffs. There also are a variety of manufacturing flow options to consider: die-to-die, die-to-wafer, die-to-substrate, wafer-to-wafer, etc. — also thin before/after stacking, bump before/after post-fab processing, and tier-to-tier attach techniques such as microbump and Cu-Cu.

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Via size, pitch, KOD, and required interstitial area impact silicon cost.

Cost in particular is currently a key challenge, he said, and there is no shortage of culprits, from incremental test cost to yield loss in both TSVs and microbumps, and incremental TSS process steps. Silicon area for TSVs is a key consideration as well, he pointed out, with via size, pitch, keep-out distance, and required interstitial area all impacting cost (see figure above). Possible cost-savings opportunities can be found in tweaking the laminate package size and number of layers, splitting large dies into two higher-yielding dies, and dividing into heterogeneous technology nodes.

By far the biggest cost culprits are materials- & equipment-related, Nowak pointed out (see figure below). These can be addressed by improvements in materials (adhesives, underfill, molding compounds), equipment cost-of-ownership (throughput, uptime, tool configuration vs. volume), simplified process flow (e.g. eliminating B-RDL, replacing microbumps with lower-cost tier-tier bonding), and simplifying or eliminating temporary carriers.

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He also urged standards for supply-chain handoff points, with specs and test methods to reliably manufacture TSS from multiple sources and processes, validated by experimental results (reliability, cost, yield, etc.). Target areas for initial standards include:

  • Nomenclature/definitions
  • TSV size, tier thickness, via fill material
  • Tier-to-tier pin locations and assignments
  • Key physical design rules
  • Microbump and passivation materials properties and geometries
  • Reliability test methods
  • Metrology
  • Thin wafer shipping

(May 19, 2010) ROSENHEIM, Germany — The Multitest next-generation MT9928 bowl feed module, which passed the strict QA and production approval requirements of an international IDM, is a gravity feed handler with a variety of loading and unloading options. With a throughput of up to 14,500 uph, the bowl feed loading module is the best loading option for small package sizes during semiconductor test.

The bowl feed module offers the modularity and conversion of the MT9928 test platform without limiting the flexibility of the base machine. The system can be combined with all types of unloaders.

The MT9928 bowl feed module is an efficient loading alternative that uses only one bowl to feed one to four tracks, which can support up to eight contact sites. The Multitest bowl feed module offers ease of operation and high productivity ensured by vision inspection for pin 1 orientation, a lot recognition feature, and an optimized ergonomic design with an operating height of less than 130 cm.

For more information about Multitest’s MT9928 bowl feed module, visit www.multitest.com/bowl.

Multitest (headquartered in Rosenheim, Germany) manufactures test equipment for semiconductors. Multitest markets test handlers, contactors, and ATE printed circuit boards under the brands Multitest, ECT Interface Products, and Harbor Electronics. Globally, the companre than 700 employees in North America, Singapore, Malaysia, the Philippines, Taiwan, China, and Thailand. www.multitest.com

May 10, 2010 – The Asys Group say it has acquired the IP and patents of fellow German firm DynTest Technologies, seeking to apply the company’s wafer singulation technology to high-brightness LEDs.

DynTest’s core technology is in wafer singulation for compound semiconductors and other substrate materials. Asys says it sees particular affinity in LED manufacturing, where DynTest’s technology is "a cost-efficient alternative to the saw-dicing and lasering methods." The company also points to synergies with DynTest’s technology’s improved wafer area utilization, and Asys’ depaneling systems for electronics systems, and metallization process lines for solar cells.

Development of existing prototype machines will be completed and ushered into mass production, with products already slated for release in 2010, the company says. The DynTest product line will be housed in Asys’ solar and new technologies business unit and directed by former DynTest sales/marketing exec Helge Luesebrink.

May 10, 2010 – Samsung Electronics says it has developed a new heat dissipating packaging technology for display drivers ICs in high-end TVs.

The new ultralow-temperature chip-on-film ("u-LTOF") packaging setup enhances heat dissipation by minimizing contact thermal resistance between the display driver IC (DDI) package and display panel chassis.

Samsung’s basic LTCOF technology uses a thin-film metal tape to spread heat generated by the DDI, providing a 30% improvement in heat emission vs. conventional chip-on-film packages, the company claims. The new u-LTCOF replaces the thin metal film with a "viscoelastic silicone" possessing a high thermal conductivity, enhancing heat transfer by an additional 20%. Moreover, packages coated with this viscoelastic silicone do not require addition of thin metal films or thermal pads, which saves costs in panel manufacturing.

"We expect the u-LTCOF solution to be applicable to other semiconductor chips such as D-TV system-on-chips (SoCs) that require high-speed processing of increased data," according to Sa-Yoon Kang, VP of Samsung Electronics’ system LSI package development team, in a statement.

The new u-LTCOF package is designed for DDIs in 240Hz full-HD and 3D LED TVs, as well as 60/120Hz mid- to large-size LCD and PDP TVs. Production is slated to begin in 4Q10.

April 28, 2010 – Researchers from the US and Europe say they have created devices with carbon nanotube (CNT) that can act as membranes for air filters far more effective than current ones.

The showerhead-resembling devices were created by chemical vapor deposition (CVD) of silicon dioxide templates, with laser-created holes; after 30min in the furnace the holes fill up with carbon nanotubes, through which only nanoscale objects can pass.

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Nanotube-infused microdevices, with forests of carbon nanotubes grown inside pores, can act as filters or as a carrier for improved catalysts. (Source: Rice U.)

"The basic idea is you have this carbon nanotube forest," explains Robert Vajtai, a Rice faculty fellow in mechanical engineering and materials science, in a statement. "The gas flows through, and because of the very small distance between the tubes, gas atoms have to hit many of them before they get out the other side."

This interaction lays the "scaffolding" for a catalyst template. When the CNTs are functionalized with catalytic chemicals, particles entering on one side of the filter come out the end in a different form — e.g., like an automobile catalytic converter, which turns carbon monoxide into carbon dioxide/nitrogen/water. In tests, Rice researchers deposited palladium onto the CNTs and used them to turn propene into propane (a benchmark test for catalysis), finding that the activated membranes "showed excellent and durable activity."

As a filter, the CNT-enabled membrane achieved 99% extraction of <1μm particles, removing about 100× more nanoparticles from laboratory air than the material used in high-efficiency particulate-absorbing (HEPA) filters, they note. The length of the CNTs (and thus density in the membrane) determines the filters’ permeability.

Results of the work were published in the journal ACS Nano.

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Nanotubes grown in holes in silicon dioxide wafers have the potential
to outperform currently available filters for many uses. (Source: Rice U.)

Vage Oganesian of Tessera and Vern Solberg, Tessera consultant, discuss the advanced packaging options available with 3D contact features on substrate interposers for complex, high-pin-count flip chip applications.

The electronics industry has acknowledged that increases in semiconductor circuit density pose interconnect challenges for the packaged chip’s thermal, mechanical, and electrical integrity. Although the majority of available semiconductors continue to use wire bond package construction, manufacturers of more complex and higher performance products have opted for a substrate-based array configured packaging. By utilizing a uniform array of contact features, the substrate interposer can enable smaller contact pitch, improve electrical path integrity, enhance reliability performance and minimize the finished package outline.

 
Figure 1. Build-up substrate with solid copper filled micro-via. 

Consistent die-to-substrate interface with decreased  contact pitch or spacing allows far greater contact density and enables shorter electrical path lengths. A shorter conductor path reduces inductance and, because the contacts are directly beneath the die element, heat dissipation is better facilitated through the substrate interconnects to the host circuit structure. These characteristics make the array package suitable for various devices: microprocessors, microcontrollers, ASICs, memory, PC chip sets, and other products. Substrate fabrication for semiconductor packaging is a somewhat specialized segment of the electronics industry. This is due in part to its unique requirements for high circuit density, enhanced electrical performance and thermal stability. A laminate substrate designed for array packaging, for example, may have one, two, or several circuit layers, especially for the higher I/O semiconductor applications. Several organic substrate compositions are furnished with a relatively high glass transition temperature (Tg), provide a low dielectric constant, and exhibit excellent insulation properties. Materials have also been developed to provide improved high frequency (HF) performance while maintaining the ease of fabrication associated with commercial epoxy/glass laminates. The material is described as reinforced woven glass with a ceramic-filled thermoset material. This specialized material combination furnishes a very high Tg (>280°C), which can meet high thermal operating condition requirements.

Substrates for semiconductor packaging can be furnished with several routing layers and there are a number of methods for integrating passive devices within these layers. To meet system-level performance and density requirements, the finished semiconductor packaging must provide thermal and electrical characteristics that will enhance performance of the die element. New advanced packaging technologies must also consider the ever-increasing market demand for smaller size, more I/Os and minimized package cost. Substrate cost is greatly influenced by the materials specified, the number of circuit layers, and routing complexity. When two or more circuit layers are needed, the metal planes or traces are interconnected to each other by plated through-hole (PTH) or partially formed vias, in the same way as conventional PCBs used for second-level assembly. Although packaging less complex semiconductors may require only one or two metal layers, the higher I/O and high-performance semiconductors will need additional layers for in-package circuit routing and power and ground distribution. For example, a substrate construction with two build-up circuit layers on each side of a two-layer core (2-2-2) will typically employ semi-additive patterning for the high-definition build-up circuit pattern and subtractive patterning for the core or base layers of the substrate. The inner and outer circuit layers are most commonly connected through laser ablated and plated via holes. To better facilitate higher density circuit routing for the semiconductor element, the industry has adopted via-in-pad techniques using laser ablated and plated micro-vias (Figure 1). As functionality increases, wiring density also needs to increase. Filling of blind micro-vias with copper, initially developed to accommodate high-density semiconductor substrate applications, is currently in wide use for build-up circuit boards developed for wireless handsets with very high component density.

The demand for a greater number of functions on a single chip requires the integration of an increased number of transistors or bits for each product generation. Typically, the number of pads and pins necessary to allow I/O signals to flow to and from an integrated circuit increases as the number of transistors on a chip increases. While a number of semiconductor package substrates require only 2 or 4 layers of build-up, substrate production with increased layer count is on the rise. Several substrate suppliers are expected to implement 10- to 14-layer substrates for 45-nm devices in the near term. Intel’s Presler 65-nm processor, for example, was introduced with a 12-layer substrate and the company’s 45-nm Atom processor uses a 6-layer substrate. Sun Microsystems, a company that traditionally used ceramic substrates for its high-performance semiconductors, reports that increases in layer count make lower-cost organic substrates an attractive alternative for some of its new microprocessors.

Materials development is an important underpinning of most technology advances. Industry roadmaps consistently point to materials and process refinement as key enablers for new technologies, improving product performance and manufacturing efficiency. In addition, product developers have realized that wire-bond die-to-substrate interface does not always meet optimum performance criteria for all applications, especially for the growing number of higher-speed processor and ASIC products noted previously. For the next generations of products, the semiconductor suppliers have abandoned traditional wire-bond package assembly methods altogether, opting instead for the more compact die-face-down flip-chip (FC) attachment methodology. There are issues, however, that may impede defect-free joining of the high-density flip-chip die, solder bump uniformity, and substrate flatness.

Electromigration in very-fine-pitch flip-chip applications can contribute to the formation of intermetallic compounds that, over time, can form a conductive bridge between closely space contact features. The effect can be catastrophic in flip-chip applications where high direct current densities are used. As the structure size of the die element decreases, the significance of this effect increases.

 
Figure 2. High-density flip chip mounted onto a µPILR configured substrate.

A potential solution for high-density flip-chip mounting is a relatively new build-up substrate fabrication process that was developed to provide an array of uniform raised contact features that have proved ideal for bumped die mounting (Figure 2). The raised contacts* are formed using a subtractive process during the final stage of the package substrate fabrication process. The raised contact features provide a uniform planar package interconnect, meeting the requirements of very-fine-pitch and high-pin-count flip-chip-configured die elements. This technology is designed to eliminate solder printing on the package substrate, allowing high yields at bump pitches of 150 µm or less. The system also enables high aspect ratio connections and positive stand-off height for underfill flow control even with low melt solders. The raised contact substrate allows designers to provide finer bump pitch on the die without reducing pad size that may contribute to current crowding and electromigration problems.

*The raised contacts formed are trademarked µPILR.

Vage Oganesian, VP, R&D, Micro-Electronics group, Tessera and Vern Solberg, Tessera consultant, may be contacted at [email protected]; www.tessera.com.

Read Vern Solberg’s series on flip chips for SMT.

Advanced Packaging, April 2010

Emerging technologies, such as imbedding components within organic substrates, fulfill challenging electronics design objectives. Imbedded component/die technology* is a method of imbedding active and passives into cavities within a multi-layer printed circuit board (PCB) to decrease the surface area required to implement the circuit design and increase the robustness of the overall assembly. Casey H. Cooper, STI Electronics Inc., discusses the design methodology, packaging processes, and test data gathered during imbedded die/component packaging implementation in a mixed-signal prototype. The prototype was subjected to reliability testing and ultimately demonstrated in a test flight. Test results are provided here.

The electronics industry has seen an explosion in development of new materials and processes to support “smaller, lighter, faster, and better” products. Military and aerospace electronics providers continue to push the technological envelope, designing and manufacturing leading-edge high-reliability electronics. Current design problems are not caused by circuit design capabilities but by an inability to reliably package these circuits within the space constraints. Innovative packaging techniques are required to meet the increasing size, weight, power, and reliability requirements of this industry without sacrificing electrical, mechanical, or thermal performance.

Over the last decade, advanced packaging technologies have shifted to 3D integration.1 Whereas most new products have defined X and Y dimensions, added capability is left confined to integration within these boundaries, forcing engineers to rely on miniaturization that can only be achieved through smaller form and fit factor components and interconnection in the Z direction. Some established packaging technologies integrate bare die of both actives and passives into package designs, such as multichip modules (MCM), system-in-package (SiP), chip-on-board (COB), and emerging system-level designs such as imbedded components.2

In a paper presented at SMTA’s Pan Pacific Conference in 2004, the features and advantages of imbedding actives and passives were described.3 Since then, development was completed on an imbedded die manufacturing process,4 imbedding unpackaged components, i.e. bare die, for further electronics hardware miniaturization than current packaging technologies, such as SMT, cannot provide.

Packaging Technology

This embedded packaging approach addresses miniaturization, thermal management, performance, reliability, and system capability requirements through innovative design guidelines and materials selection. Elimination of external component packaging reduces circuit card assembly (CCA) size, weight, and electrical and thermal parasitics, and it enables the 3D assembly of multiple components. 3D assembly facilitates design integration of key subsystems, i.e. multiple CCAs, into a single high-density module.

Miniaturization is achieved fundamentally due to the elimination of external component packaging. Bare die enable designers to specify the smallest form and fit factor available. Component geometries can be reduced up to 85% through the removal of external leadframes, package substrates, and overmold encapsulants. These die are then imbedded in openings/cut-outs of the PCB, commonly referred to as cavities (Figure 1). Imbedding die in cavities in the substrate facilitates Z-integration through imbedding die on tiers, or exposed layers, within the substrate.

Figure 1. Active and passive components imbedded in a cavity on a laminate substrate.

With the free real estate on the PCB provided by reduced component footprints, additional systems or capabilities can be added to an electronics assembly. System capabilities can be increased through the integration of additional features and functionality and/or redundant system within the same envelope. For example, processing architectures, such as those implemented in field programmable gate arrays (FPGAs), may be easily scaled to increase the number of processing elements within the same PCB envelope due to component-level miniaturization.

Elimination of secondary packaging materials plays a significant role in overall weight reduction achieved through imbedding unpackaged die. Interconnect materials that physically and electrically connect the bare die integrated circuit (IC) to the circuit are eliminated. There is also a reduction in the mass related to the electrical interconnect material, achieved by using wire bonds rather than solder. Typical bonding wire alloys have a lower density than solder, and wire bonds use a significantly lower volume of material per connection.

End-product reliability is improved not only by a reduction in attachment material mass through the elimination of external component packaging, but also through the increased flexibility of the electrical attachment. By using wire bonding technology as the electrical attachment process, very flexible light-weight interconnects are created. This flexibility is exploited during operation in demanding thermal and mechanical environments such as high temperature, vibration, and/or mechanical shock. In contrast to a soldered connection, which localizes the applied stress, the imbedded package concept distributes the applied stress producing a more robust and rugged electrical product.

Embedding actives and passives into the PCB improves long-term signal reliability by eliminating unnecessary failure opportunities and utilizing reliable electrical interconnects. All first-level component packaging is eliminated. This reduces two to four possible modes of electrical failure associated with component-level packaging. Due to the removal of external packaging, electrical parasitics and thermal resistance are reduced, improving overall system performance. This means the assembly is suitable for high-speed, high-I/O electronics, such as those found in missile defense systems.

Conventionally, a high-power CCA would dissipate heat through convection or radiation from the component and substrate surfaces, often including package-level heat sinks or cooling fans. However, advanced handheld applications inhibit the use of active cooling devices such as large, finned heatsinks and fans. Imbedded die/component technology relies on passive cooling via conduction to a single, central cooling core to remove heat from high-power devices and to evenly distribute the thermal energy along the interface. Through creative thermal management, die junction temperatures (TJ) are reduced, increasing package- and system-level reliability.3

Prototypes

We recently completed testing of two prototype vehicles to provide a technology demonstration of the design guidelines, materials, and manufacturing processes used to imbed passive and active devices in laminate substrates. Environmental stress testing was conducted on these prototypes to evaluate the robustness of imbedded bare die in an organic laminate substrate in conventional military and aerospace environments, i.e. harsh environments.

Test vehicle 1. A test vehicle was designed to evaluate the effectiveness of assembly materials in harsh environments when imbedding bare die (silicon) in organic laminate substrates. The test vehicle consisted of multiple imbedded die (Figure 2) wired to inner layer tiers for monitoring fluctuations in resistance during/after environmental testing. The imbedded test die consisted of silicon, daisy-chain components with peripheral bond pads for interconnecting to a test substrate. Test patterns on the high-temperature FR-4 (HT-FR4) laminate substrate enabled in-situ resistance monitoring of the assembly during testing. A conformal coating, encapsulant, and lid were used (Figure 3) to protect the imbedded die from physical damage (handling/transportation) and environments (thermal movement due to coefficient of thermal expansion (CTE) mismatch, ionic contamination, and moisture ingression).

The test coupon comprised a 4.000 × 6.000″ HT-FR4 substrate, laminate PCB, in three tiers, with an imbedded copper core and Ni/Au plating. The Si die was 0.248 × 0.240″, daisy-chain design, with peripheral wire bond pads. The die attach material was thermally conductive, electrically insulative compliant epoxy. A 1.2-mil-diameter Al/1%Si wire formed each interconnect. Conformal coating was achieved with a 0.6-mil-thick parylene C material; encapsulation used silicone gel to a 95% cavity fill. The lid was laminate with top/bottom copper plane layer.

Figure 2. High-resolution images of test coupon daisy-chain die in the central cavity: upper left die (left) and lower left die (right).
Figure 3. High-resolution image of test coupon final assembly.

Materials properties found on the technical data sheets were reviewed prior to selection of die attach, conformal coating, and encapsulant candidates to include in the test matrix. Materials were identified that minimize CTE-induced stress on the devices and interconnects and to reduce the thermal resistance between the die junctions and substrate/heat sink. Certain characteristics are desirable for all materials comprising the assembly. Materials with a glass transition temperature (Tg) outside the operating environment range can minimize thermomechanical stresses induced by a material’s state change from glassy to rubbery. Die attaches, underfills, and encapsulants with low ionic contaminates minimize opportunities for corrosion in harsh environments. Materials’ thermal and electrical performance equally contribute to system-level performance requirements. Materials meeting the following specifications were selected to be included in the test matrix.

Critical material properties:

  • Cure temperature: The type of cure, snap cure versus a step cure, and cure temperature affect the cured material properties including Tg. The glass transition temperature should be significantly above the upper operating temperature range of the assembly to enable lower expansion/CTE of the material over a wider temperature range.5
  • Material purity: Low ionic contaminants and alpha particles emitted will aid in increasing the reliability of the bare die. Industry recommends chloride (Cl-), sodium (Na+), potassium (K+), and fluorine (F-) levels of less than 5 to 10 ppm to increase the die’s resistance to corrosion.6 Less than 0.001 particles/cm2/hr minimizes irradiating particles found in encapsulants that can cause soft errors in logic and high-density memory devices such as DRAMs and SRAMS.7
  • Voiding: Voids, or air pockets in the material, result in increased localized stresses, which can lead to premature delamination or loss of adhesion to the die and/or substrate. The material is no longer an effective stress buffer with voids present, and the material’s thermal resistance is increased due to air’s poor ability to transfer heat.
  • Moisture absorption: Due to use of organic substrate materials, a hermetically sealed assembly cannot be achieved, thus the materials selected should be hydrophobic  in nature.8
  • One-part system: One-part materials are easily integrated into the manufacturing and assembly process. All components of the material, curing agent, and hardener, are premixed ensure product uniformity and quality and eliminate operator errors. The material is supplied in a syringe for use on automated dispensing equipment and is typically stored at -40ºC to prevent changes in performance.

Thermal cycling fatigue or overstress failures are often detected through alternating exposure of the assembly to extreme temperatures with short transition times between extremes. The test vehicle was placed in a thermal shock chamber to evaluate the materials’ resistance to temperature excursions and the process parameters used to assemble the test vehicle. The assembly was placed on a tray that transitions from a cold chamber (air) to a hot chamber (air) within a specified time. Test conditions were changed periodically during the thermal shock test. Test conditions included: 1000 cycles from -55°C to 85°C, 250 cycles from -55°C to 125°C, 200 cycles from -55°C to 85°C, followed by 4200 cycles from -55°C to 125°C. The test vehicle was subjected to over 175 days of thermal shock cycling.

Critical materials evaluated during this analysis included:

  • Die attach adhesive: Determine effect of stress-related cracking of silicon die due to mismatch in coefficient of thermal expansion (CTE) of die and laminate/copper core.
  • Conformal coating: Determine aging characteristics of Parylene after repeated exposure to extreme temperatures.
  • Encapsulant: determine warpage and stress due to modulus and CTE differential of encapsulant and assembly (silicon die, laminate substrate, metal core, aluminum wire bonds).

Continuity testing was performed prior to cycling to establish a baseline resistance for each of the daisy-chains and at periodic intervals to monitor resistance fluctuations. Five daisy-chain die were imbedded within the test coupon, providing 30 daisy-chains, equivalent to 60 wires (120 wire bonds), for monitoring. A 3.0? increase in resistance constituted a failure with the cycles-to-failure data noted in Table 1. The first failure/high-resistance bond occurred after exposure to 3000 cycles with a lapse of 1500 cycles till the second noted failure. Only 23% of the wires failed after 5500 cycles when the test coupon was pulled from cycling.

Table 1. Thermal shock failure data for daisy-chain wires.
Daisy-chain wire group  Cycles  Wire Group  Cycles
3,057  16  none
4,507  17  none
4,507  18  none
4,947  19  none
5,102  20  none
5,656  21  none
5,656  22  none
none  23  none
none  24  none
10  none  25  none
11  none  26  none
12  none  27  none
13  none  28  none
14 none  29  none
15  none  30  none

The failure data gathered from this test vehicle indicates that the material properties selected will provide the long-term reliability solution for critical military electronics hardware. Compliant die attach adhesive enables stress relief from thermal-induced stress in the silicon-die-to-substrate interface while the wire bonds, coupled with a compliant encapsulant, provide the stress relief from environmental-induced stress (thermal, shock, and vibration). This material set, in conjunction with the imbedding design guidelines, enables robust, reliable electronics assemblies.

Test vehicle 2. A mixed-signal test vehicle (Figure 4) was designed and assembled to serve as a technology demonstration for the Navy’s Standard Missile-2 (SM-2) program. The Navy’s SM Program Office used this prototype in a flight test to support a technology demonstration of the imbedded component/die technology, validating the electrical and mechanical performance. A prototype was designed with a mix of analog and RF circuitry using imbedded design practices with wire-bondable devices. The prototype circuit design was selected to address miniaturization, thermal dissipation, component obsolescence, and reliability.

Figure 4. Mixed-signal prototype to demonstrate IC/DT packaging technology’s capabilities.

Miniaturization objectives were largely achieved due to the ability to locate wire-bondable components for the circuit. All ICs were procured as unpackaged components (wire bond/face-up die), and passives with gold metallization were procured for imbedding into the prototype. Through elimination of the secondary packaging, a 66% reduction in surface area was achieved. This reduction enables the integration of future CCAs into a single assembly module (increased form, fit, and function through added capability within the same footprint).

All components, both actives and passives, were imbedded into cavities (Z direction) in the laminate substrate. Multiple tiers were exposed in the substrate with strategic placement of components to decrease interconnect length (component-to-component bonding and component-to-substrate bonding) and address power dissipation. Bonding high-power devices with thermally conductive adhesive directly to an imbedded thermal core in the substrate eliminates the need for external heat sinks and lowers the devices’ junction temperature.9

Flexible aluminum wire bonds (Figure 5) were used to electrically interconnect the devices (component-to-component for point-to-point) and circuit (component-to-substrate for multi-point nodes). These flexible interconnects are able to absorb the thermal and mechanical stresses created when operating in harsh environments. Elimination of secondary packaging, which facilitates bonding from component-to-component, also decreases the number of failure opportunities in the system.

Figure 5. Wire bonds to electrically interconnect components on the prototype.

The prototype was analyzed and tested by SM-2 prime contractor Raytheon Missile Systems, which approved the prototype as flight hardware for a flight test. This included finite element analysis (FEA) design modeling and prototype qualification testing per standard legacy performance requirements and overstress test requirements (e.g. temperature, humidity, vibration testing). In October 2007, the prototype’s performance and robustness were demonstrated through a successful SM-2 flight test. The imbedded product was given TRL 8 status, meaning that the technology has been proven to work in its final form and under expected conditions. Examples include developmental test and evaluation of the system in its intended weapon system to determine if it meets design specifications.10

Materials Analysis

Materials analysis was performed on the prototype to determine the effects of performance qualification and overstress testing on the prototype units. A cavity was removed from the prototype to perform surface and micro-section analysis of the physical (die attach and conformal coat) and electrical (bond wires) interconnects. Prior to surface analysis, an aggressive organic solvent removed the encapsulant from the cavity to enable visual analysis of the various surfaces (through the conformal coating).

A scanning electron microscope (SEM) exposed the component/substrate topology and wire interfaces. The backscattered electron imaging mode provided a high-magnification grayscale digital image of the device (Figure 6 and Figure 7). At high magnification, the substrate bond interfaces and die bond interfaces were inspected for signs of fatigue and stress fractures. However, the conformal coating remained over the die and wire surfaces, creating a monochromatic image around the components, bond wires, and substrate. Within this cavity, multiple component geometries and wire profiles are represented as well as multi-tier component placement (cavity within a cavity).

Figure 6. Micrograph SEM image (fisheye mode) of cavity with imbedded components and bond wires.
Figure 7. Micrograph SEM image of cavity-within-a-cavity (to thermal core) with imbedded components and bond wires.

The cavity was then micro-sectioned to analyze component-to-substrate interfaces and bond wire interfaces. The component-to-substrate interface directly affects physical attachment of the device to the substrate (and also electrical connects IC bulk silicon potentials to the corresponding voltage, as required) and is critical to withstanding cyclic thermal stress and shock/vibration. The bond wire interfaces are paramount to function and performance of the circuit where any stress fractures or lifts directly affect contact resistance and can lead to high resistance connections (open).

The component-to-substrate interface (Figure 8) is continually stressed due to the significant difference in CTE of the substrate bond pad (laminate = 16-20ppm/°C, copper = 16 ppm/°C, and aluminum = 24 ppm/°C) and the low CTE of electrical devices (ICs: silicon = 3 ppm/°C, Passives: ceramics = ~6 ppm/°C). Many parameters should be considered in calculating the induced stress (per Hooke’s Law) in a component-to-substrate interface. A designer has little control over certain parameters (component CTE, ΔT, dimensional parameters), but proper selection of the die attach adhesive (modulus, CTE, Tg) can significantly reduce interfacial stresses. Micro-section analysis of one such interface revealed no delamination (separation of materials) or stress fractures between the component-to-die attach interface or substrate-to-die attach adhesive interface.

Figure 8. SEM micrograph of component-to-substrate interface with thin bond line thickness to decrease thermal resistance.

The bond wire interface (Figure 9) is also affected by CTE differences in substrate and component bond pad materials (thermal stress), in addition to use environment stresses such as vibration and shock. The use of flexible interconnects, such as aluminum/1%silicon wire, prevent stress fractures in the electrical connect due to expansion and contraction of the devices and substrate during cyclic temperature changes. However, repeated wire flexing (such as during multiple thermal shock cycles) can lead to failures. Preventive measures such as conformal coatings and encapsulants and bond parameters (such as loop height) can prevent failures related to thermal expansion.

Figure 9. SEM micrograph of a silicon die bond pad-to-wire (Al/1%Si) interface.

These preventive materials and process parameters also aid in eliminating wire failures due to vibration and shock. Low-stress encapsulants act as a shock absorber to reduce the amount of force transferred to the wire when exposed to mechanical shock and vibration. Reduced wire lengths and controlled loop heights (Figures 10 and 11) also prevent fatigue and breaking by altering the resonant frequency of the wire bond.11

Figure 10. SEM micrograph a low-profile bond wire (step down from die to substrate) with first bond on the die surface. No lifts or fatigue cracks along the interface.

Figure 11. SEM micrograph a low-profile bond wire (step down from die to substrate) with second bond on the substrate. No lifts or fatigue cracks along the interface.

Wire bonding electrical interconnects versus conventional processes such as soldering provides significant flexibility in interconnecting miniaturized components in odd form factor packages where access to create these interconnects is restricted. High power devices located in recessed cavities for improved heat transfer (bonded to an imbedded cooling core) limit access to the die surface. Configurable bonding parameters enable access to the die bond pads in these locations (Figure 12).

Figure 12. SEM micrograph of a die bonded to the thermal core (deep access) in a recessed cavity. No lifts or fatigue cracks along the interface.

Like any metallurgical interface, intermetallic compounds are formed and are subject to failure. For bond wire interfaces, the classical failure mode is Kirkendall voiding which is often referred to as the “purple plague”. The failure mode is a function of several parameters: metallurgical interfaces (wire and pad metal composition), metal impurities, ion diffusion rates (aluminum diffuses more rapidly into gold), and environment (time and temperature). The term “purple plague” is derived from the characteristic color of one of the five intermetallic compounds that is formed at high temperatures (above 150°C) over time in gold/aluminum (Au/Al) compounds (such as Au ball bond to Al bond pad). The intermetallic layers are more brittle than either Al or Au and are prone to crack during temperature cycles or stresses. Therefore, the room temperature wire bonding process using ultrasonic wedge bonds (Al/1%Si wire) is preferred due to the bonding method (ultrasonic bonding is room temp versus high temp thermosonic bonding) and metallurgical interfaces (die bond pad-to-wire: Al-Al and passive bond pad-to-wire: Au/Al).11 Due to the overstress testing performed on this prototype, bond interfaces were inspected at high magnification for indication of fatigue cracks at the Au/Al interfaces (Figure 13). No voids or fatigue cracks were detected in the Au/Al interfaces, e.g. passive end termination-to-wire or substrate bond pad-to-wire.

 

Figure 13. SEM micrograph a gold-plated capacitor end termination bond wire. No voids or fatigue cracks were detected along the interface.

Conclusion

The testing of the two test vehicles has demonstrated that imbedding components and die is a robust packaging technology for use in products that must operate in harsh environments. The two test vehicles discussed in this paper have proven that the design guidelines, materials, and process parameters used to manufacture imbedded package assemblies are capable of withstanding temperature, humidity, and shock stresses. Test Vehicle 1 (daisy-chain sample) survived over 3000 cycles of thermal shock exposure before a failure occurred. Test Vehicle 2 (mixed-signal prototype) was bench tested to meet and exceed legacy product performance specifications in order to qualify the prototypes as flight hardware. Lastly, a successful flight test in October of 2007 was paramount in demonstrating imbedded component packaging technologies’ ability to meet form, fit, and function requirements in a miniaturized robust package.

*The packaging technology described here is registered by STI as Imbedded Component/Die Technology (IC/DT).4

ACKNOWLEDGEMENTS
The findings of this study could not have been accomplished without the support of the STI Microelectronics Lab and the STI Analytical Lab under the direction of Mark McMeen. The author would like to acknowledge the efforts of Jonnie Johnson and David Robinson for support of the design, assembly, and test of the prototype assemblies as well as Aaron Olson and Bryan McMeen for the post-stress testing sample preparation and analysis.

REFERENCES
1. Greig, Bill, “New and Emerging Technologies,” Advanced Packaging, July 2002.
2. Cooper, C. and McMeen, M., “Effects of Process Parameters on the Material Characteristics of Die Attach Adhesives,” Pan Pacific Microelectronics Symposium, January 2007.
3. Hatcher, Casey, “Imbedded Component/Die Technology: An Innovative Packaging Solution for High Reliability,” Pan Pacific Microelectronics Symposium, February 2004.
4. Raby et al. "Imbedded component integrated circuit assembly and method of making same." U.S. Patent 7,116,557. 3 October 2006.
5. Naito, C. and Todd, M., “The effects of curing parameters on the properties development of an epoxy encapsulant material,” Microelectronics Reliability, Vol. 42(1), pp. 119-125, 2002.
6. Gilleo, K., “Introduction to Material Science: Polymers and Fillers,” W-25: Conductive Adhesives Workshop – APEX Conference, March 2003.
7. Wong, C.P. “Polymers for encapsulation: Materials Processes and Reliability,” Chip Scale Review, March 1998.
8. Virmani, N.V. and Shaw, J., “Critical Concerns, Solutions and Guidelines for Use of Plastic Encapsulated Microcircuits for Space Flight Applications,” Retrieved October 4, 2006, from the NASA, Technology Validation Assurance Web Site: http://misspiggy.gsfc.nasa.gov/tva/pems/esapems.htm
9. Santarini, Michael, “Thermal Integrity: A Must for Low-Power-IC Digital Design”, EDN, September 2005.
10. “Appendix B: Technology Readiness Level (TRL) Descriptions”, NASA SBIR Website: http://sbir.nasa.gov/SBIR/sbirsttr2007/solicitation/appendix_B.pdf
11. Harman, George, “Wire Bonding in Microelectronics: Materials, Processes, Reliability, and Yield,” New York, NY: McGraw Hill, 1997.

Casey H. Cooper, STI Electronics Inc., Madison, AL, may be contacted at [email protected].

Advanced Packaging, April 2010

April 23, 2010 – A seminar held at last month’s SEMICON China reiterated points made earlier in the year by an industry group that there are still questions about using copper bonding wire vs. gold in semiconductor packaging applications.

Feedback from participants at the seminar on wire bonding and wire bond reliability, which sponsored by the London-based World Gold Council — an organization focused on creating demand for gold — echo results from a SEMI survey in January that seemed to suggest reservations about Cu wire reliability and yield. "About 50% of the attendees at the event have encountered problems with copper wire bonding in production, including low production yields," according to Richard Holliday, director of the Council’s industrial interests.

Acknowledging that the high price of gold necessitates some kind of change in its use for packaging, he instead suggested that wire suppliers and their customers still leverage "the inherent reliability" of the metal, while seeking to offset gold costs in ways — e.g., minimize wire usage through optimizing the loop height, smaller diameters, and making design changes. The WGC’s message is that despite a fledgling industry migration to replacing gold wire bonds with copper, Cu is "a cost-effective choice in many applications," with "material properties [that] are best suited to the wire bonding process."

April 23, 2010 – Semiconductor equipment suppliers reported continued moderate growth that’s increasingly back in line with pre-downturn levels, according to the latest monthly data from SEMI.

North America-based semiconductor equipment suppliers reported $1.29B in orders during March 2010 (a three-month average), up 2.7% from February, and sales of $1.08B (up 6.4%), showing continued moderate growth and coming back in line with pre-downturn levels, according to the latest monthly data from SEMI. (Year-on-year comparisons are once again eye-popping — 423% bookings, 147% sales — since this time in 2009 was the deepest depths of the slowdown.) The book-to-bill ratio (B:B) of 1.19 means $119 worth of orders were received for every $100 shipped during the month.

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For its final February numbers, SEMI tacked on an extra $20M, bringing M/M growth up to 6.2% (vs. 4.5%); an extra $5M in billings inched up M/M growth to 6.1%.

Summarizing the numbers and trends:

  • Bookings are at their highest levels since Aug. 2007. And SEMI has added a final $20M-$50M to its preliminary tallies for the past three months.
  • Billings are also on a roll, now at their highest level since June 2008.
  • The B:B has stayed above the 1.0 parity mark for nine straight months, meaning more business continues to come in (orders) vs. go out (sales).
  • Bookings have increased sequentially in 11 of the past 12 months (with the only slide a -0.3% dip in Oct. 2009). For billings, the streak is 11 in a row dating to May 2009.
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"The steady and consistent rise in bookings and billings shows that the industry is on a well-managed growth path," stated SEMI president/CEO Stanley Myers.

In Japan — where March designates the fiscal year-end for many firms, and thus a final push in business — the news is even better. Japan-based manufacturers of semiconductor equipment posted ¥97.18B (US $1.045B) in orders, up nearly 13% sequentially and an unbelievable 617% from a year ago, according to the Semiconductor Equipment Association of Japan (SEAJ). Billings of ¥83.31B ($894.7M) were up nearly 30% M/M and 87% Y/Y. The B:B fell slightly but is still well above parity at 1.17, meaning $117 worth of orders is coming in for every $100 in sales billed for the month.

by Michael A. Fury, Techcet GroupClick to Enlarge

April 20, 2010 – The fifth and final day (Friday 4/9) of the MRS Spring 2010 meeting in San Francisco called for a stretch, as flexible and stretchable electronics provided a focal point for the day. Highlights included: Ge-Si integration, carbon nanotubes in organic photovoltaics, energy storage using paper, printable GaN semiconductors, and stretchable circuit boards and conductors.

(Underscored codes at the beginning of papers reviewed refer to the symposium, session and paper number; additional presentation details can be found in the MRS Spring 2010 program.)

I6.5. Krishna Saraswat at Stanford presented a scheme for germanium integration on silicon for high-performance MOSFETs and optical interconnects. The 4% lattice mismatch between Si and Ge allows defect free Ge layers on ~2nm thick to be grown on Si. By growing thin Ge layers at 400°C and annealing in H2 at 850°C, the defects can migrate to the surface and release. Growing the Ge between islands of SiO2 allows a defect-free Ge layer to be fabricated by repeating the growth/anneal cycle until the SiO2 has been over-filled and the individual Ge wells grow together on the surface. Using this substrate, candidate device structures were shown for light emitters, detectors and modulators, the design elements needed for integrated optical interconnects.

HH16.1. Teresa Barnes at NREL is developing flexible and solution-processible transparent carbon nanotube (CNT) contacts for organic photovoltaics (OPV), with the objective of replacing the glass/ITO/hole transport layers with polymer/SWNT. The CNT layers are deposited by ultrasonic spray coating and often out-perform ITO expectations for contact sheet resistance and transparency. The OPV device design is optimized around the CNT material, rather than attempting a drop-in substitution for the ITO film.

HH16.2. Ajay Virkar at Stanford described a hybrid organic-CNT composite material for transparent electrodes in OPV. Theoretically, a CNT monolayer can have a sheet resistance of 10 Ω/sq at 95% transmission, comparable to ITO with 10-40 Ω/sq at 95% T. In practice, the contact resistance between contiguous CNT is as high as 1GΩ, so the best observed CNT TCO films have been ~80 Ω/sq at 85% T. This group has developed an overcoat that acts as a nano-solder at the CNT contact points, enabling a lower resistance with thinner layers and ≥95% T.

Other MRS blogs:
Day 4: TSVs, wafer bonding, CNTs, ALD for rare-earth HK, graphene
Day 3: Nanoimprint litho, 32nm memories, FET/Si/CNT sensors
Day 2: CVD for Cu, low-k etch stop, future FETs, graphene "atom hopping"
Day 1: Charge-trapping NVM, organics, graphene, PV

HH16.3. Kamil Mielczarek at UT Dallas demonstrated a polymeric parallel tandem OPV with transparent MWCNT as the interlayer electrode. The MWCNT are drawn as free-standing ribbons, but morphologies with high optical transmission tend to have lower conductivity, and vice versa. The spectral efficiency of the MWCNT is superior to Ag and more cost-effective. Additional work is planned to optimize the MWCNT processes to better match the electrical performance of Ag, which is commonly used as the common interlayer electrode.

JJ6.1. Liangbing Hu at Stanford showed the latest work in paper energy storage devices. The Al and Cu metal current collectors account for 20%-30% of the weight in Li-ion batteries, designed for high energy density, and supercapacitors, designed for discharge power delivery. These metals can be replaced with CNT or Ag nanowires inks screen printed on paper. Ag is the better conductor, but can be matched if you use all metallic CNT. CNT supercapacitors show excellent performance with a specific capacitance of 200 F/g, a specific energy of 47 Wh/kg (comparable to that of rechargeable batteries), a specific power of 200,000 W/kg, and a stable cycling life over 40,000 cycles.

JJ6.2. Martin Kaltenbrunner at Johannes Kepler University showed a novel power supply for stretchable electronics based on Xanthan electrolyte gel power cells, in which the anode and cathode, each ~1cm2, are laid out with a lateral separation of 0.3cm rather than on top of each other in order to eliminate the risk of shorting over time. Open circuit voltages of 1.47V and short circuit currents of up to 40mA have been achieved, with a capacity of 3mAh/cm2 active cell area.

JJ6.5. Keyan Zang at IMRE in Singapore presented a simple release method for high-quality printable GaN semiconductors. The GaN device is fabricated on a substrate with an embedded SiO2 layer designed for ease of undercut and release. The finished device is overcoated with PDMS, the SiO2 is undercut with HF, and the PDMS/GaN device is transferred to a Si or flex substrate. This scheme is an extension of what is becoming a common strategy for fabricating high performance devices for flexible substrate applications.

JJ6.6. Wayne Chen at UCSD described a process for layer transfer of high quality, single crystalline (110) InP for flexible applications. The method uses an implanted H+ layer in a geometry that avoids critical device regions, as implant damage is difficult to anneal out. The resulting devices can be lifted off the donor substrate using a ‘smart cut’ process and dual flip transfer methods. Areas up to 2mm2 and 6μm thick have been transferred without introducing defects or degrading device performance.

JJ7.2. Darryl Cotton at Cambridge showed some multilayered gold-elastomer structures in PDMS for a stretchable circuit board. The 50nm Au layer is deposited on a 5nm Cr adhesion layer on the PDMS. At 20% strain the resistance rises 2×-5×, and increases ~10% after 1000 stretch cycles. Using a photo-patternable PDMS, one can fabricate sloped vias as small as 300μm square for multilayer interconnects. A four-level touch pad with contacts to a flex circuit element was demonstrated.

JJ7.3. Frederick Bossuyt, at U Gent & IMEC outlined a journey from single conductive layer to double conductive layer stretchable electronics. Single layer designs require a zero-resistance crossover resistor at every wiring intersection. Polyimide is used as the mechanical support for copper on one side and Ag flex paste on the other. This material set can accommodate vias <100μm in diameter, with a 200μm line/space minimum pitch. In meander areas, the PI base needs to be wider than the metal traces, in order to prevent Ag paste bleed over the edges and shorts after repeated flexing.

JJ7.4. Jaewook Jeong at Seoul National University showed a novel implementation of silver electrodes on elastomeric substrates for stretchable electronics applications. Ag 700nm thick was deposited on PDMS substrates with micro-roughness (1-1.5μm) and macro-waviness (200μm deep, 400μm p-p). The micro-roughness reduces mechanical stress as the substrate stretches, and the waviness allows the metal to flex rather than pull apart. With the waves, a 50% strain results in a 3× increase in resistance. Without the waves, the maximum strain possible without failure is 35%, with an 8x resistance increase.

JJ7.5. Adam Robinson, at Cambridge showed a method for printed stretchable conductors using silver-based ink compatible with PDMS substrates. An organometallic Ag ink was chosen for its cure temperature of 130°C. However, the ink dewets during the cure process. The PDMS surface wetting was modified by molding 2μm diameter pillars 2μm high into the PDMS surface as surface tension breaks. Pillar pitches of 20μm, 10μm and 6μm showed an increasing efficacy of line-width preservation for the SonoPlot-printed lines. This technique produced printed silver conducting features of >100nm thickness, which can be stretched up to strains of 20% over 1,000 cycles without loss of conductivity.


Michael A. Fury, Ph.D, is senior technology analyst at Techcet Group, LLC, P.O. Box 29, Del Mar, CA 92014; e-mail [email protected].