Tag Archives: future

Eloquent Executives Ecosystem Expositions

#cmc,#confab,#namedropping

With dimensional scaling reaching economic limits, each company in the IC fab industry must rely upon trusted connections with customers and suppliers to know which way to go, and the only way to gain trusted connections is through attending live events. Fortunately, whether you are an executive, and engineer, or an investor, there is at least one must-attend event happening these days to keep you informed.

We should always start with SEMI (sponsor of SemiMD, personal friends for many years) who has always represented the gold standard for trade-shows, executive events, and manufacturing symposia around the world. I attended my first SEMICON/West in 1988, and have since attended excellent SEMICONs in Europe, Japan, Korea, China, and Singapore. This year’s SEMICON gathering in San Francisco will feature a nearly 50% increase in the number of technical sessions.

SEMI ran another excellent Advanced Semiconductor Manufacturing Conference (ASMC) in Albany this month, featuring keynotes by visionaries such as “Nanoscale III-V CMOS” by MIT Professor Jesus A. del Alamo. The panel discussion “Moore’s Law Wall vs. Moore’s Wallet, and where do we grow from here,” was moderated by industry veteran Paul Werbaneth, now with Intevac. It is clear that we will reach economic limits of scaling well before the physical limits.

Materials technology and supply-chain solutions to extend economic limits were discussed by Intel’s VP of Technology and Manufacturing Tim Hendry in a keynote at the Critical Materials Conference (CMC) held this year in Oregon in early May, as produced by Techcet CA (I am also an analyst with Techcet and co-chair of this event, while Solid State Technology was a media sponsor). David Thompson, Senior Director, Center of Excellence in Chemistry, Applied Materials showed that despite the inherent “Agony in New Material Introductions – minimizing and correlating variabilities” is possible with improved collaboration throughout the supply-chain.

The Imec Technology Forum in Brussells this month (Solid State Technology was a media sponsor) could best be described with Lake Wobegone hyperbole that all the women were strong, the men were good-looking, and everyone was above average. The big news is imec acquiring iMinds for greater synergies when integrating the latter’s algorithms with imec-ecosystem hardware for application-specific solutions. Gary Patton, now CTO and SVP of Global R&D for GLOBALFOUNDRIES, reminded everyone at ITF of the inherent speed constraints of the copper wires and low-k dielectrics needed to connect IC transistors, “As I’ve often said, It’s like you have a Ferrari but you’re towing a boat if you don’t address the interconnect delay issues.” Regardless, Patton confidently declares that, “We will continue to provide value to our customers to be able to create new products, and we will innovate in ways other than simple scaling.”

At ITF, a video was shown of imec president Luc van den Hove interviewing Gordon Moore at his beachfront home in Hawaii. Moore has always been humble and claims no special ability to forecast trends. “It would not surprise me if we reached the end of scaling in the next decade,” said Moore. “I missed the importance of the PC, and I missed the importance of the internet. Predicting the future is a difficult job and I leave it to someone else.”

Wally Rhines seemed able to predict the future when he eloquent expounded upon Moore’s Law as a special-case learning-curve in his presentation at ITF. Rhines will provide one of the keynote addresses at the ConFab in Las Vegas this year (Solid State Technology’s home event, co-sponsored by SEMI and by IEEE-CPMT). Executives from the global industry will gather to hear insights and analysis on the challenges facing all companies in the ecosystem, as we search for profitable pathways in a more complex landscape.

—E.K.

EUV Cost at 1000 Daily Exposures

On October 14, 2015, ASML Holding N.V. (ASML) published its 2015 third-quarter results:  Q3 net sales of €1.55 billion with gross margin of 45.4% (in line with guidance), and guided Q4 2015 net sales at approximately €1.4 billion and a gross margin of around 45%. Due to mismatched financial analyst expectations, Bloomberg reported that ASML’s stock price dropped ~7% in a single day of trading, despite the company also reporting upgrades to both the TWINSCAN NXT 193nm-immersion (193i) and the NXE Extreme Ultraviolet (EUV) tools. In particular, a new record of 1000 wafer exposures in a single day was set by one EUV tool.

The science of controlling the 13.54nm wavelength electromagnetic radiation that we like to call “Extreme Ultra-Violet” or “EUV” (instead of the colloquial scientific term “soft x-ray”) is inherently challenging. The engineering of EUV Lithography is not just challenging but bordering on inherently impossible:  from exploding tin plasma source, to all-reflective lenses that absorb energy, to the trade-offs in mask pattern protection. The team at ASML working on the exposure tool—along with the different specialist organizations still working on improved sources, masks, and resists—deserve the industry’s unwavering admiration for the important work they do every day.

In a prepared statement, ASML President and Chief Executive Officer Peter Wennink said, “We have proven the capability both to expose 1,000 wafers per day and, in a manufacturing readiness test, to expose 15,000 wafers in four weeks. We have also achieved a four-week average availability of more than 70 percent  at multiple customer sites. The first shipment of our fourth-generation EUV lithography system, the NXE 3350B, is in progress, with two more expected to ship in Q4.”

Still, progress along desired EUV roadmaps continues to be slow, and the competitive target shifts when the 193i exposure tool gains a 10% throughput improvement to 275 wafer-passes/hour (wph). When the 193i tool gains a 30% overlay improvement, that means double-patterning based on litho-etch-litho-etch (LELE) process flows gain in pattern fidelity. Since ASML provides both technologies, delays in orders for EUV just means more sales of 193i tools.

Let’s play with the numbers here…275 wph x 20 hours x 30 days = 165k wafer-passes/month for the NXT:1980. The NXE:3350B can current handle 15k wafer-passes/month. So even if the tools were equally priced, just based on tool depreciation each EUV exposure today costs >10x that of a 193i exposure, which is why pitch-splitting multi-patterning 193i continues to dominate.

—E.K.