3D Integration

3D INTEGRATION ARTICLES



KGD Packaging and Test Workshop keynote, panel on TSV, and more

09/01/2010 

KGD (Known Good Die) Packaging and Test Workshop 2010 will focus on semiconductor die products test, assembly, manufacturing, and business issues in the microelectronics industry. Bill Bottoms will keynote, covering deep submicron and 3D integration.

Fraunhofer's Ramm will open International Wafer-Level Packaging Conference

08/31/2010 

Peter Ramm, Fraunhofer EMFT, will be the Opening Speaker at the 7th Annual International Wafer-Level Packaging Conference (IWLPC). Ramm will present "The European 3D Technology Platform for Heterogeneous Systems" at the Kick-Off Reception.

TSV: Current challenges and solutions with Novellus

08/13/2010 

In this video interview, Sesha Varadarajan, Novellus, says that capacitance issues must be overcome, and the PVD step must provide good enough coverage to properly apply copper. CTE mismatch can also cause issues.

SMTA announces IWLPC featured tutorials

08/12/2010 

Tutorials at the October event will cover 3D packaging, future interconnects, WLP, flip chip, and more.

Si, glass interposers for 3D packaging: analysts' takes

08/10/2010 

Silicon interposers for advanced packaging Yole reportYole asks if next-generation package substrates are myth, niche, or high-volume necessity? Several companies are investigating silicon interposers and there is great interest in the topic, but there is no clear consensus on apps and timing for adoption, says TSI in its forecast for Si interposers. Both analyst forecasts are summarized.

Look for TSV to take off in 2012: Jan Vardaman

08/03/2010 

In this video interview from SEMICON West 2010, Jan Vardaman, president/founder of TechSearch International, discusses 3D technologies in the real engineering world. Especially for 300mm, work is being done on processes and yield. She points to 2012 for widespread adoption of TSV.

Henkel develops wafer backside coating for die attach

08/02/2010 

Henkel has extended its Wafer Backside Coating (WBC) portfolio to also include a solution for stacked-die packages. Ablestik WBC-8901UV has been designed to address the demanding requirements of multiple die stack applications for the memory market segment.

Process equipment readiness for through-silicon via technologies

08/01/2010  Unit processes, integration schemes, and equipment are in place to enable development and pilot production of TSV technologies and all parts of the value chain do exist today at 300mm to enable integration technology qualification, end-product samples, and limited pilot production. Sesh Ramaswami, Applied Materials, Santa Clara, CA USA

3D Integration: The Challenges Ahead

08/01/2010  The potential benefits of 3D integration -- where chips are thinned, stacked and electrically connected with through-silicon vias (TSVs)

Convergence of 3D integrated packaging and 3D TSV ICs

08/01/2010  As the need to integrate MEMS devices and advanced memory for sensor applications expands, work is underway to develop modules merging both mechanical and electrical devices into single, highly compact modules. Navjot Chhabra, Freescale Semiconductor, Austin, Texas, USA

Achieving cost and performance goals using 3D semiconductor packaging

08/01/2010  It has been proven that SoC and 3D multiple die packaging can significantly improve performance and the function-to-area ratio, however, one must look at the tradeoffs. Vern Solberg, STC-Madison, Madison, WI USA

Take the survey on PoP assembly

07/30/2010 

Package on package (PoP) stacking makes use of the vertical space available on electronics printed circuit boards (PCBs). It increases density, fitting more silicon into the same footprint. However, package stacking can be difficult, as fine pitches require placement accuracy, and taller stacks generally face reliability issues, especially if the stack is reflowed improperly. So where should PoP stacking take place?

Leveraging 3D packaging technologies: Tessera shares its latest work

07/30/2010 

In this video interview, Craig Mitchell, Tessera, comments on 3D packaging and interconnect. The chip industry is using packaging technologies to address miniaturization and density. Materials are posing a challenge.

Insights from SEMICON: Video interview with blogger Phil Garrou

07/28/2010 

In this video interview, Philip Garrou, microelectronics consultant and Advanced Packaging blogger, offers information on his blog, Insights from the leading edge, and summarizes reasonable roadmaps for 3D technology and TSV in particular. 2012 mainstream adoption seems too aggressive to Garrou.

SEMICON West Lesson #3: 3D and packaging are hot

07/26/2010 

Wrap-up of what we heard and saw at SEMICON West 2010. Lesson 3: Everything about 3D & packaging was hot, with suppliers jostling to get into this next high-growth market. But are they really prepared for what awaits them?

Research updates on EUV, mask, cleaning, etc from Leti

07/23/2010 

In these three video interviews from SEMICON West 2010, Leti research directors speak with senior technical editor Debra Vogler. Yannick Le Tiec discusses cleaning; Michel Brillouet speaks on 3D packaging work, and Didier Louis updates us on advanced lithography.

Video: Readiness of 3D technologies from a materials perspective

07/23/2010 

Mark Privett, Brewer Science, says that new technologies allow use of higher temperatures as well as room-temperature processes, such as wafer de-bonding. The 3D industry is nearly ready for high-volume, yet still without industry standards.

Gary Smith EDA market statistics 2010: Summary

07/22/2010 

The biggest change in 2009 was Mentor passing Cadence to become number two in product sales in EDA. This is an indication of the market shift caused by the move into the ESL Methodology. Synopsys remains a strong number one.

EDA in a 3D semiconductor world: Walden Rhines

07/20/2010 

In this video interview from SEMICON West 2010, Walden Rhines, Mentor Graphics, discusses 3D technologies. EDA tools need to be extended to meet the needs of 3D -- parasitic extraction and timing, place-and-route, and other steps are different with 3D. The tools are evolving for the various 3D technologies. He also touches on lithography evolution.

CEA-Leti building 300mm R&D line dedicated to 3D integration applications

07/13/2010 

The integration line includes lithography, metallization, deep etching, dielectric deposition, wet etching and packaging tools.




WEBCASTS



Environment, Safety & Health

Date and time TBD

The semiconductor industry is an acknowledged global leader in promoting environmental sustainability in the design, manufacture, and use of its products, as well as the health and safety of its operations and impacts on workers in semiconductor facilities (fabs). We will examine trends and concerns related to emissions, chemical use, energy consumption and worker safety and health.

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Wafer Processing

Date and time TBD

As the industry moves to 10nm and 7nm nodes, advances in wafer processing – etch, deposition, planarization, implant, cleaning, annealing, epitaxy among others – will be required. Manufacturers are looking for new solutions for sustained strain engineering, FinFETs, FDSOI and multi-gate technologies, 3D NAND, and high mobility transistors.

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